Results 221 to 230 of about 103,175 (263)

Clean Development Mechanism

2013
The Clean Development Mechanism (CDM) is one of three flexible mechanisms included in the Kyoto Protocol. It enables Annex I countries to finance emission reductions in developing (non-Annex I) countries and use the credits thus obtained to meet their emission reduction commitments under the Kyoto Protocol.
openaire   +2 more sources

Mechanism and Application of Laser Cleaning: A Review

Optics and Lasers in Engineering, 2022
Debin Shan, Bin Guo, Guodong Zhu
exaly  

Mechanical Cleaning Systems

1994
Abstract Mechanical cleaning systems are used to remove contaminants of work surface by propelling abrasive materials through any of these three principal methods: airless centrifugal blast blade- or vane-type wheels; compressed air, direct-pressure dry blast nozzle systems; or compressed-air, indirect-suction (induction) wet or dry ...
openaire   +1 more source

Mechanical cleaning of castings

Chemical and Petroleum Engineering, 1971
A. A. Karzhasov, P. A. Zimin
openaire   +1 more source

The Ultrasonic Cleaning Mechanism

1973
The choice of equipment and detergent media for ultrasonic cleaning depends first and foremost on the type of contaminant. Since mechanical destruction of the contaminant film under the action of cavitation and acceleration of the process of chemical interaction between the washing liquid and contaminant under the action of acoustic streaming occur ...
openaire   +1 more source

Removal Mechanism of Laser Cleaning for Inorganic Thermal Control Coatings on Aluminum Alloys

Applied Surface Science, 2023
Jinhao Nie, Donghe Zhang
exaly  

Identification of Cleaning Mechanism by Using Neural Networks

Food and Bioproducts Processing, 2023
Jochen Fröhlich
exaly  

Mechanical Tongue Cleaning

Dental Abstracts, 2021
openaire   +1 more source

Investigation on Mechanism of Oxide Removal and Plasma Behavior During Laser Cleaning on Aluminum Alloy

Applied Surface Science, 2020
Ye Huang, Xueming HUA
exaly  

Application of an Optimized Alkaline Cleaning Solution for Inhibitor Removal During the Post-CMP Process: Performance Evaluation and Mechanism Analysis

Journal of Molecular Liquids, 2023
Baohong Gao, Shihao Zhang, Baimei Tan
exaly