Results 11 to 20 of about 161,284 (157)
Particle Technology in Chemical Mechanical Planarization
KONA Powder and Particle Journal, 2014 In order to keep pace with Moore’s law, multilevel metallization has become the process of choice. Having a planar wafer surface before every successive step in multilevel metallization is important. The Chemical
Kalyan S. Gokhale, Brij M. Moudgil
doaj +1 more source
Linking component importance to optimisation of preventive maintenance policy [PDF]
, 2016 In reliability engineering, time on performing preventive maintenance (PM) on a component in a system may affect system availability if system operation needs stopping for PM.
Armstrong +27 more
core +1 more source
Common-reflection-surface imaging of shallow and ultrashallow reflectors [PDF]
, 2012 We analyzed the feasibility of the common-reflection-surface (CRS) stack for near-surface surveys as an alternative to the conventional common midpoint (CMP) stacking procedure.
BATTAGLIA E, DEIDDA G P, HEILMANN Z
core +1 more source
Energies, 2020 Perovskite solar cells (PSCs) are usually fabricated by using the spin coating method. During the fabrication process, the surface status is very important for energy conversion between layers coated in the substrate.
Sangmo Kim, Chung Wung Bark
doaj +1 more source
Filtering directory lookups in CMPs [PDF]
Microprocessors and Microsystems, 2010 Coherence protocols consume an important fraction of power to determine which coherence action should take place. In this paper we focus on CMPs with a shared cache and a directory-based coherence protocol implemented as a duplicate of local caches tags. We observe that a big fraction of directory lookups produce a miss since the block looked up is not
Bosque, Ana +3 more
openaire +4 more sources
Ciceroniana On Line, 2021 Cicerón, un autor y personaje histórico de fama universal, ha tenido gran influencia en escritores e intelectuales de todos los tiempos. Por su enorme importancia también ha sido retratado en escultura, pintura, manuscritos y otras disciplinas artísticas.
Cristina Martín Puente, CMP
doaj +1 more source
Crystal structure of [1-(3-chlorophenyl)- 5-hydroxy-3-methyl-1H-pyrazol-4-yl](p-tolyl) methanone [PDF]
, 2015 RK acknowledges the Department of Science & Technology for the single-crystal X-ray diffractometer sanctioned as a National Facility under Project No.
Gupta, V.K. +4 more
core +1 more source
Optical Characterization of Industrial Slurries
KONA Powder and Particle Journal, 2015 In this work we focus on the characterization of micro- and nano-powders typically adopted for chemical mechanical polishing, extensively used whenever the global and local planarization of surfaces is required as in nanoelectronic fabs.
Marco Potenza +2 more
doaj +1 more source
“To the Editor of the Journal of Pain Research” [Letter]
Journal of Pain Research, 2021 Caitlin MP Jones, Christopher G Maher The Institute for Musculoskeletal Health, The University of Sydney, Sydney, NSW, AustaliaCorrespondence: Caitlin MP Jones Level 10 North, King George V Building, Royal Prince Alfred Hospital (C39), PO Box 179 ...
Jones CMP, Maher CG
doaj
KONA Powder and Particle Journal, 2014 Chemical Mechanical Planarization (CMP) is a process that is now routinely used to planarize metal as well dielectric films during the fabrication of integrated circuits.
Srini Raghavan +2 more
doaj +1 more source