Results 211 to 220 of about 609,758 (267)
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IEEE Transactions on Electron Devices, 1983
A four-terminal microelectronic test structure and test method are described for electrically determining the degree of uniformity of the interfacial layer in metal-semiconductor contacts and for directly measuring the interfacial contact resistance.
S.J. Proctor, L.W. Linholm, J.A. Mazer
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A four-terminal microelectronic test structure and test method are described for electrically determining the degree of uniformity of the interfacial layer in metal-semiconductor contacts and for directly measuring the interfacial contact resistance.
S.J. Proctor, L.W. Linholm, J.A. Mazer
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Contact resistance of rectangular contact
Челябинский физико-математический журнал, 2021Summary: The conductive body is considered in the form of a parallelepiped, at the ends of which small contacts of the same rectangular shape are connected. The length and the width of these contacts is equal to the values \(\varepsilon\) and \(\mu \), considered below as small parameters.
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Contact immunotherapy of resistant warts
Journal of the American Academy of Dermatology, 1988Contact immunotherapy has been proved effective in the treatment of resistant warts. This report chronicles our experience with a new contact immunotherapy agent, diphenylcyclopropenone. We have achieved a cure rate of 62% in 45 patients with resistant warts of all types who came to our general dermatology clinic.
M F, Naylor +5 more
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Contact Resistance and Contact Resistivity
Journal of The Electrochemical Society, 1972This paper mainly offers guidance to the technologist who has to characterize metal‐semiconductor contacts for process development and production control. To abolish confusion clear definitions are proposed for the terms contact resistance and contact resistivity.
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Contact Resistance of a Square Contact
Proceedings of the Steklov Institute of Mathematics, 2018zbMATH Open Web Interface contents unavailable due to conflicting licenses.
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Contact resistance for small contacts (MOSFET)
IEEE Transactions on Electron Devices, 1991An asymptotic analysis for current flow to small contacts in MOSFET source/drain regions is obtained. The formula for end resistance is compared with numerical simulations. It shows good agreement for contacts whose width is smaller than half the diffusion width. >
E. Cumberbatch, G. Mahinthakumar
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Fluctuations of contact resistance in sliding contact
Wear, 1970Abstract Experiments were conducted with various metals of different properties in relative reciprocating linear sliding motion, which is important to sliding contacts used in electronic circuits, to examine noise due to irregular fluctuations of contact resistance caused by adhesive wear.
K. Tsuchiya, T. Tamai
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Metal/semiconductor contact resistivity and its determination from contact resistance measurements
Materials Science Reports, 1988In this paper the relation between contact resistivity and contact resistance is examined. The most widely used methods for contact resistance measurements and extraction of the contact resistivity are presented. Different types of approach, aimed to improve the accuracy and sensitivity of the various techniques are then extensively discussed.
SCORZONI, Andrea, Finetti M.
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Annealing nano-to-micro contacts for improved contact resistance
2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, 2010Nano-to-micro electrical contact resistance between carbon nanotubes (CNTs) and larger-scale silicon systems are investigated using both low-and high-power annealing techniques. Carbon nanotubes locally synthesized and suspended between two silicon microbridges are used as the test platform.
Heather Chiamori +4 more
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