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Chronic Diseases and Translational Medicine, EarlyView.
Serafino Fazio, Flora Affuso
wiley +1 more source
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TiN-CVD process optimization for integration with Cu-CVD
Microelectronic Engineering, 2000Abstract Integration of Cu-CVD as metallization for on-chip interconnect requires an efficient barrier to avoid any Cu diffusion in the insulating material. These barriers must also promote adhesion of Cu to the inter- and intra-metal level material, and have low resistivity to minimize level to level contact resistance.
Y Gobil, Y Morand, R Pantel
exaly +2 more sources
2021
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openaire +2 more sources
??????????. ?????????????????? ????????????????????, ???????? ???????????????????????????? ???? ???????????????????????????? ?????????????????????????? ??????????????, ?????????????? ???????????????????? ?????????????????? ?????? ???????????????????? ???????????????????? ???????????????? ???????????????????????????? ???????????????? ?????????????? ?????
openaire +2 more sources
1998
Instead of using thermal energy for decomposition and chemical reaction of the source gas, plasma CVD uses the glow discharge in non-equilibrium plasma to ionize and excite the source gas and generate ions and radicals. Plasma CVD utilizes their reactiveness for depositing thin films.
openaire +1 more source
Instead of using thermal energy for decomposition and chemical reaction of the source gas, plasma CVD uses the glow discharge in non-equilibrium plasma to ionize and excite the source gas and generate ions and radicals. Plasma CVD utilizes their reactiveness for depositing thin films.
openaire +1 more source
2014
?? ?????????? ???????????? ???????????????????????? ???????????????????? ???? ????????????????-???????????????????????????????????? ???????????????????????? ?????? ???????????? ?? ?????????????? ???????????????????????? ?????????????????????? CVD ???????????? ?????? ?????????????????? ???????????????????????????????? ???????????????? ?????????????? ????
openaire +3 more sources
?? ?????????? ???????????? ???????????????????????? ???????????????????? ???? ????????????????-???????????????????????????????????? ???????????????????????? ?????? ???????????? ?? ?????????????? ???????????????????????? ?????????????????????? CVD ???????????? ?????? ?????????????????? ???????????????????????????????? ???????????????? ?????????????? ????
openaire +3 more sources
Diamond and Related Materials, 2011
Abstract The ability to minimise, control and manipulate defects in CVD diamond has grown rapidly over the last ten years. The application which best illustrates this is probably that of quantum information processing (QIP) or ‘diamond spintronics’.
Markham, M. +6 more
openaire +2 more sources
Abstract The ability to minimise, control and manipulate defects in CVD diamond has grown rapidly over the last ten years. The application which best illustrates this is probably that of quantum information processing (QIP) or ‘diamond spintronics’.
Markham, M. +6 more
openaire +2 more sources

