Results 231 to 240 of about 52,617 (307)

Escaping the Scaling Relationships in Oxygen Reduction Catalysis: Implications for PEM Fuel Cells

open access: yesAdvanced Materials, EarlyView.
Escaping the scaling relationships of the oxygen reduction reaction is vital for hydrogen fuel cells. This outlook examines how interfacial heterogeneity, spanning the subsurface lattice, chemisorption layer, and near‐interface solvation volume, mechanistically decouples intermediate binding energetics.
Muhammad Bilal Wazir   +2 more
wiley   +1 more source

Observation of synthetic moving effect in metamaterials. [PDF]

open access: yesLight Sci Appl
Yang Q   +6 more
europepmc   +1 more source

Intrinsically Stretchable Piezoelectric Nanocomposites for Artificial Ultrasonic Sensory Synapse

open access: yesAdvanced Materials, EarlyView.
Applying ultrasonic stimulations to a soft‐stretchable underwater piezoelectric sensor based on the soft‐stretchable nanocomposite from the thermal cross‐linking between the ─C─F group of P(VDF‐TrFE) and the ─NH2 group of (PEG‐diamine) with incorporating amine‐terminated BTO@APTES nanofillers on the soft PDMS substrates generated high piezoelectric ...
Trung Dieu Do   +11 more
wiley   +1 more source

Establishing Atomic Coherence in Twisted Oxide Membranes Containing Volatile Elements

open access: yesAdvanced Materials, EarlyView.
Twisted oxide membranes containing volatile elements often suffer from amorphous interfacial dead layers that suppress coupling. An oxygen‐annealing strategy establishes atomically coherent and chemically bonded interfaces in twisted NaNbO3 membranes, enabling coherent oxide moiré architectures in volatile‐element‐containing systems.
Young‐Hoon Kim   +6 more
wiley   +1 more source

Barrier‐Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS2 Transistors

open access: yesAdvanced Materials, EarlyView.
Barrier‐assisted NH3 plasma doping enables damage‐free, spatially selective carrier modulation in monolayer MoS2 transistors. An ultrathin pV3D3/Al2O3 protective‐dielectric stack acts as a chemical filter that allows NHx radicals to reach the MoS2 surface while blocking plasma damage. This process achieves a high electron concentration of 4.3 × 1013 cm−
Inseong Lee   +15 more
wiley   +1 more source

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