Results 91 to 100 of about 5,338 (231)
Skin Impression Modeling Across Different Skin Types Under Different Scenes
How do Chinese perceive skin color of different ethnic groups under different shooting and viewing conditions (i.e., illuminance levels, CCTs, scenes and model‐observer familiarity)? ABSTRACT This paper presents a comprehensive study investigating how facial skin colors influence various impressions across different ethnicities and under different ...
Beijia Qin +2 more
wiley +1 more source
Wafer‐Scale Near‐Infrared Metalenses With High Performance and Low Cost
Widespread adoption of metalenses is constrained by prohibitive cost of wafer‐level fabrication. This work achieves 8‐inch wafer‐level fabrication with high uniformity (feature deviation < 5%) and reliable performance by step‐and‐repeat nanoimprint lithography.
Wanjiao Zhang +5 more
wiley +1 more source
Steffensen B. Politische Steuerung im Arbeitsschutz: Einsatzbedingungen der Lasertechnik in der industriellen Materialbearbeitung. DUV : Sozialwissenschaft. Wiesbaden: DUV, Dt.
Steffensen, Bernd
core
Tomographie de fluorescence DUV sur des systèmes d’intérêt biologique
L’utilisation de la lumière synchrotron en ultraviolet lointain (DUV, de longueur d’onde comprise entre 120 et 300 nm) pour exciter la fluorescence des molécules en microscopie, permet de s’affranchir de marqueurs de contrastes.
Buleon, Alain +7 more
core +1 more source
We report a numerical analysis of the variation of Aluminium (Al) composition in Al Gallium Nitride (AlGaN)-based Deep-Ultraviolet Light-Emitting Diode (DUV-LED) and its effects on the carrier concentration, radiative recombination, and photoluminescence
Hairol Aman, Mohammad Amirul +5 more
core +1 more source
Indications sur les mœurs du Foucartia Cremierei Duv. [Col. Curculionidae]
Buysson Henri du. Indications sur les mœurs du Foucartia Cremierei Duv. [Col. Curculionidae] . In: Bulletin de la Société entomologique de France, volume 19 (20-21),1914.
Buysson, Henri du
core +1 more source
Immersion Lithography Defectivity Analysis at DUV Inspection Wavelength [PDF]
Significant effort has been directed in recent years towards the realization of immersion lithography at 193nm wavelength. Immersion lithography is likely a key enabling technology for the production of critical layers for 45nm and 32nm design rule (DR ...
O Dassa +9 more
core
Nanostructuration by DUV photolithography of organic materials
L'objectif principal de ce travail de thèse a été de développer un montage de lithographie à 193 nm (Deep-UV, DUV), avec comme but d'obtenir des nanostructures de période l 00 nm sur des surfaces relativement importantes (cm2) dans différents matériaux ...
Dirani, Ali
core
Pathogens have emerged to become more virulent and common. This is evident as seen in the Covid-19 pandemic that happened in December 2019. Ultraviolet (UV) means of disinfection have been emerging as a promising source used to help combat these ...
Wong, Jing Yang
core
Innovationsnetzwerke: Technikentwicklung zwischen Nutzungsvisionen und Verwendungspraxis
Kowol U. Innovationsnetzwerke: Technikentwicklung zwischen Nutzungsvisionen und Verwendungspraxis. Studien zur Wissenschafts- und Technikforschung. Wiesbaden: DUV, Dt.
Kowol, Uli
core

