Electron beam lithography on nonplanar and irregular surfaces [PDF]
Microsystems & NanoengineeringE-beam lithography is a powerful tool for generating nanostructures and fabricating nanodevices with fine features approaching a few nanometers in size.
Chenxu Zhu +4 more
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Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate [PDF]
Micromachines, 2021 High-resolution metallic nanostructures can be fabricated with multistep processes, such as electron beam lithography or ice lithography. The gas-assisted direct-write technique known as focused electron beam induced deposition (FEBID) is more versatile ...
Luisa Berger +5 more
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Negative-tone molecular glass photoresist for high-resolution electron beam lithography [PDF]
Royal Society Open Science, 2021 A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability.
Yafei Wang +5 more
doaj +2 more sources
In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices [PDF]
Nanomaterials, 2020 The implementation of aberration-corrected electron beam lithography (AC-EBL) in a 200 keV scanning transmission electron microscope (STEM) is a novel technique that could be used for the fabrication of quantum devices based on 2D atomic crystals with ...
Naomi Mizuno, Fernando Camino, Xu Du
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Macrophage-compatible magnetic achiral nanorobots fabricated by electron beam lithography [PDF]
Scientific Reports, 2022 With the development and progress of nanotechnology, the prospect of using nanorobots to achieve targeted drug delivery is becoming possible. Although nanorobots can potentially improve nano-drug delivery systems, there remains a significant challenge to
Teng Jiang +3 more
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Two-dimensional Bragg grating lasers defined by electron-beam lithography [PDF]
, 2006 Two-dimensional Bragg grating (2DBG) lasers with two quarter-wave slip line defects have been designed and fabricated by electron-beam lithography and reactive ion etching.
Guy A. DeRose +5 more
openalex +4 more sources
Substrate Effect in Electron Beam Lithography
Advances in Electrical and Electronic Engineering, 2018 Electron Beam Lithography (EBL) process strongly depends on the type of the applied lithographic system, composed of electron sensitive polymers and the substrate. Moreover, applied acceleration voltage changes the volume of Backscattered Electrons (BSE)
Kornelia Indykiewicz +2 more
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Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved electron beam lithography overlay. [PDF]
Sci Rep, 2017 Nanofabrication techniques are essential for exploring nanoscience and many closely related research fields such as materials, electronics, optics and photonics.
Yoon G +5 more
europepmc +3 more sources
Polystyrene negative resist for high-resolution electron beam lithography [PDF]
Nanoscale Research Letters, 2011 We studied the exposure behavior of low molecular weight polystyrene as a negative tone electron beam lithography (EBL) resist, with the goal of finding the ultimate achievable resolution.
Ma Siqi +3 more
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Alignment verification for electron beam lithography [PDF]
Microelectronic Engineering, 2014 Alignment between lithography layers is essential for device fabrication. A minor defect in a single marker can lead to incorrect alignment and this can be the source of wafer reworks. In this paper we show that this can be prevented by using extra alignment markers to check the alignment during patterning, rather than inspecting vernier patterns after
Thoms, Stephen +3 more
openaire +5 more sources