Results 1 to 10 of about 117,202 (206)
From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography [PDF]
As EUV lithography becomes the new standard for electronic chip manufacturing, identifying suitable materials for higher resolution patterning stands out as a prominent challenge to reach future technology nodes.
Vockenhuber, M. (author) +4 more
core +1 more source
The Opto-Electronic Functional Devices Based on Three-Dimensional Lead Halide Perovskites
These days, opto-electronic functional devices based on three-dimensional lead halide perovskites (LHPs) are emerging. LHPs could be spin-coated to other materials, making it very convenient to combine LHPs with different categories of materials ...
Henan Liu +3 more
doaj +1 more source
Design concepts for broadband high–efficiency DOEs [PDF]
Several design–concepts are presented for so–called efficiency achromatized diffractive optical elements (EA–DOEs) possessing a diffraction efficiency larger than 97% over a broad spectral range.
Kleemann B. H., Seeßelberg M., Ruoff J.
doaj +1 more source
Chemically-amplified backbone scission (CABS) resist for EUV lithography. [PDF]
Polymeric materials with an imaging chemistry based on the main chain cleavage under the influence of photogenerated acid are a promising resist platform for EUV lithography.
Kazazis, Dimitrios (author) +2 more
core +1 more source
Mala'ik Al-Tuhfat; Study of the Angels' Presence in the Lithographed Copies of Tuhfat Al-Majalis [PDF]
Lithography was created as a result of the development of literacy and the need for access to cheap reading sources affordable to everyone. The illustrations of the lithographed books, as a medium for the portrayal of popular art, add social aspects to ...
Maryam Yaghmaeian
doaj +1 more source
A Simple Method for Fabricating Ink Chamber of Inkjet Printheads
The process of fabricating chambers is becoming more important for inkjet printheads. However, there are some problems with the majority of present fabrication methods, such as nozzle structural deformation, blocked chambers, and collapsed chambers.
Zheguan Huang +5 more
doaj +1 more source
Application of the three-state lithography model for grayscale lithography
In this work, we focus on the application of the "three-state lithography model" developed for the production of 3D-topographies in photoresist through grayscale lithography.
Badawi, Bassem, Kutter, Christoph
core +1 more source
Electrodeposition as a Tool for Nanostructuring Magnetic Materials
Electrodeposition has appeared in the last year as a non-expensive and versatile technique for the growth of nanomaterials. We review the main characteristics of electrodeposition that make this technique very suitable for its combination with different ...
Sandra Ruiz-Gómez +2 more
doaj +1 more source
The rapid miniaturization of devices and machines has fuelled the evolution of advanced fabrication techniques. However, the complexity and high cost of the state-of-the-art high-resolution lithographic systems are prompting unconventional routes for nanoscale patterning. Inspired by natural nanomachines, synthetic nanomotors have recently demonstrated
Li, Jinxing +5 more
openaire +3 more sources
This review summarises the work of the Durham-Sheffield, UK team working on Holographic Lithography over the last decade. It collates progress in 3D resolution and overall scale of the substrate wiring patterns designed and considers a range of approaches and applications.
Purvis, A. +7 more
openaire +3 more sources

