Results 1 to 10 of about 52,709 (261)
Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement
Photonics, 2023 As with the decreasing feature size prompted by Moore’s law and the continuous technological advancements in the semiconductor industry, the distortion of the projection lens is an important factor that affects the overlay.
Tian Li +8 more
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Design concepts for broadband high–efficiency DOEs [PDF]
Journal of the European Optical Society-Rapid Publications, 2008 Several design–concepts are presented for so–called efficiency achromatized diffractive optical elements (EA–DOEs) possessing a diffraction efficiency larger than 97% over a broad spectral range.
Kleemann B. H., Seeßelberg M., Ruoff J.
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Nature Communications, 2014 The rapid miniaturization of devices and machines has fuelled the evolution of advanced fabrication techniques. However, the complexity and high cost of the state-of-the-art high-resolution lithographic systems are prompting unconventional routes for nanoscale patterning. Inspired by natural nanomachines, synthetic nanomotors have recently demonstrated
Li, Jinxing +5 more
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Imaging and Applied Optics 2014, 2014 This review summarises the work of the Durham-Sheffield, UK team working on Holographic Lithography over the last decade. It collates progress in 3D resolution and overall scale of the substrate wiring patterns designed and considers a range of approaches and applications.
Purvis, A. +7 more
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STARTING POINT SELECTION IN GROUPING DESIGN METHOD FOR LITHOGRAPHIC OBJECTIVES [PDF]
Научно-технический вестник информационных технологий, механики и оптики, 2019 This work aims on method development for obtaining initial designs for ultraviolet (UV) and deep-ultraviolet (DUV) objectives through global search algorithm. We studied a global search based algorithm tending to obtain the feasible local minima of lens
Nenad D. Zoric +2 more
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Application of the three-state lithography model for grayscale lithography
, 2022 In this work, we focus on the application of the "three-state lithography model" developed for the production of 3D-topographies in photoresist through grayscale lithography.
Badawi, Bassem, Kutter, Christoph
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Process for the Fabrication of Nickel Material High Aspect-ratio Digital PCR Partition [PDF]
한국정밀공학회지This paper outlines the fabrication process of the partition component, a crucial element in digital PCR. The partition component consists of thousands of micro-wells capable of holding small volumes of reagents.
GeeHong Kim +3 more
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Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective
Nanomaterials, 2021 The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment.
Eleanor Mullen, Michael A. Morris
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Advanced mask aligner lithography (AMALITH)
, 2022 Paper 83261YMask aligners were the dominating lithography tool for the first 20 years of semiconductor industry. In the 1980s industry changed over to projection lithography.
Motzek, K. +9 more
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Advanced coatings for next generation lithography
, 2022 Paper 94221K, 7 S.Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To implement B-based mirrors and to enable their industrial application in lithography tools, a reflectivity level of > 70% has to be ...
Yulin, Sergiy A. +3 more
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