Results 1 to 10 of about 228,991 (341)

Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement

open access: yesPhotonics, 2023
As with the decreasing feature size prompted by Moore’s law and the continuous technological advancements in the semiconductor industry, the distortion of the projection lens is an important factor that affects the overlay.
Tian Li   +8 more
doaj   +1 more source

Rolling Nanoelectrode Lithography [PDF]

open access: yesMicromachines, 2020
Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between ...
Hasan, Rashed Md. Murad   +2 more
openaire   +5 more sources

Nanomotor lithography [PDF]

open access: yesNature Communications, 2014
The rapid miniaturization of devices and machines has fuelled the evolution of advanced fabrication techniques. However, the complexity and high cost of the state-of-the-art high-resolution lithographic systems are prompting unconventional routes for nanoscale patterning. Inspired by natural nanomachines, synthetic nanomotors have recently demonstrated
Li, Jinxing   +5 more
openaire   +3 more sources

Design concepts for broadband high–efficiency DOEs [PDF]

open access: yesJournal of the European Optical Society-Rapid Publications, 2008
Several design–concepts are presented for so–called efficiency achromatized diffractive optical elements (EA–DOEs) possessing a diffraction efficiency larger than 97% over a broad spectral range.
Kleemann B. H., Seeßelberg M., Ruoff J.
doaj   +1 more source

Holographic Lithography [PDF]

open access: yesImaging and Applied Optics 2014, 2014
This review summarises the work of the Durham-Sheffield, UK team working on Holographic Lithography over the last decade. It collates progress in 3D resolution and overall scale of the substrate wiring patterns designed and considers a range of approaches and applications.
Purvis, A.   +7 more
openaire   +3 more sources

STARTING POINT SELECTION IN GROUPING DESIGN METHOD FOR LITHOGRAPHIC OBJECTIVES [PDF]

open access: yesНаучно-технический вестник информационных технологий, механики и оптики, 2019
This work aims on method development for obtaining initial designs for ultraviolet (UV) and deep-ultraviolet (DUV) objectives through global search algorithm. We studied a global search based algorithm tending to obtain the feasible local minima of lens
Nenad D. Zoric   +2 more
doaj   +1 more source

Size-controlling of Cu2ZnSnS4 nanoparticles: Effects of stabilizing/reducing agents on material properties

open access: yesResults in Physics, 2020
In this study, Cu2ZnSnS4 (CZTS) nanoparticles with an average size in a range of 10–36 nm were synthesized via solvothermal synthesis using different amounts of polyvinylpyrrolidone (PVP, 3, 5, 7, and 9 mg/mL) stabilizing agent.
E.M. Mkawi   +3 more
doaj   +1 more source

Process for the Fabrication of Nickel Material High Aspect-ratio Digital PCR Partition [PDF]

open access: yes한국정밀공학회지
This paper outlines the fabrication process of the partition component, a crucial element in digital PCR. The partition component consists of thousands of micro-wells capable of holding small volumes of reagents.
GeeHong Kim   +3 more
doaj   +1 more source

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

open access: yesNanomaterials, 2021
The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment.
Eleanor Mullen, Michael A. Morris
doaj   +1 more source

Polymer Pen Lithography [PDF]

open access: yesScience, 2008
We report a low-cost, high-throughput scanning probe lithography method that uses a soft elastomeric tip array, rather than tips mounted on individual cantilevers, to deliver inks to a surface in a “direct write” manner. Polymer pen lithography merges the feature size control of dip-pen nanolithography with the large-area capability of contact printing.
Giam, Louise R.   +5 more
openaire   +4 more sources

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