Results 21 to 30 of about 52,709 (261)
DNA-Origami-Aided Lithography for Sub-10 Nanometer Pattern Printing
We report the first DNA-based origami technique that can print addressable patterns on surfaces with sub-10 nm resolution. Specifically, we have used a two-dimensional DNA origami as a template (DNA origami stamp) to transfer DNA with pre-programmed ...
Isaac Gállego +5 more
doaj +1 more source
Lithographic SERS Aptasensor for Ultrasensitive Detection of SARS-CoV-2 in Biological Fluids
In this paper, we propose a technology for the rapid and sensitive detection of the whole viral particles of SARS-CoV-2 using double-labeled DNA aptamers as recognition elements together with the SERS method for detecting the optical response.
Vladimir Kukushkin +12 more
doaj +1 more source
High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the ...
Sangeetha Hari +4 more
doaj +1 more source
Impressively printing patterns of gold and silver nanoparticles
The optical and chemical properties of gold and silver nanoparticles make them useful for many applications, including surface enhanced spectroscopy‐based biosensors, photostable colorants, enhanced photovoltaic, and nanoscale optical elements. We report
Fathima S. Ameer +10 more
doaj +1 more source
Manuscripts and rare books of Alisher Navoi in Almaty Library Founds
One of the most important topics is studying the works of the poet Mir Alisher Navoi common to the entire Turkic world and presenting them to today's Kazakhstan readers.
G. Kambarbekova, G. Abikova
doaj +1 more source
Extended Abbe approach for fast and accurate lithography imaging simulations
Paper 747007This paper presents an extended Abbe based imaging algorithm for faster and more accurate simulations of current and future projection lithography systems.
Evanschitzky, P. +2 more
core +1 more source
Optimized phase-shifting masks for high-resolution resist patterning by interference lithography
Paper 104502A, 12 S.The EUV laboratory exposure tool (EUV-LET) is a versatile stand-alone resist patterning tool. Main applications are resist characterization for industrial lithography as well as the patterning of high-resolution arrays over large ...
Juschkin, L. +5 more
core +1 more source
Comparative Study of the Art of Iconography in the Court of Dolatshah, the Ruler of Kermanshah, and the Works Created during the Fath Ali Shah Qajar’s Period (1203-1327) [PDF]
Mohammad Ali Dolatshah, the ruler of Kermanshah, is the eldest son of Fath Ali Shah Qajar. During his reign in Kermanshah, he left valuable services. In his court, art is as active as in the court of Tehran, and works of art such as lithography, painting,
Elaheh Panjehbashi
doaj +1 more source
Lithographic process window optimization for mask aligner proximity lithography
Paper 90520G, 11 S.We introduce a complete methodology for process window optimization in proximity mask aligner lithography. The commercially available lithography simulation software LAB from GenISys GmbH was used for simulation of light propagation ...
Hofmann, U. +9 more
core +1 more source
Bacterial cellulose (BC) has been widely used in tissue engineering due to its unique spatial structure and suitable biological properties. In this study, a small biologically active Arginine-Glycine-Aspartic acid-Serine (RGDS) tetrapeptide was ...
Haiyan Liu +4 more
doaj +1 more source

