Results 21 to 30 of about 67,280 (259)
Progress in EUV resist screening towards the deployment of high-NA lithography [PDF]
, 2021 The development of EUV resists is one of the major challenges for the deployment of high-NA EUV lithography, which is on the roadmap for high-volume manufacturing of future semiconductor technology nodes.
Vockenhuber, M. (author) +7 more
core +1 more source
Novel high-contrast phase-shifting masks for EUV interference lithography
, 2022 Paper 113231Q, 10 S.When it comes to the patterning of periodic structures like lines and spaces or contact hole arrays interference lithography can be effectively applied.
Lüttgenau, Bernhard +4 more
core +1 more source
Lithography-free directional control of thermal emission
, 2022 Blackbody thermal emission is spatially diffuse. Achieving highly directional thermal emission typically requires nanostructuring the surface of the thermally emissive medium. The most common configuration is a subwavelength grating that scatters surface
Mitradeep Sarkar (1653787) +3 more
core +1 more source
Cogent Engineering, 2018 Thin films of CuGaSe were deposited on n-Si (1 0 0) by rf magnetron sputtering from a stoichiometric CuGaSe2 target. The objective of this study was to characterize the thin film/Si heterojunction for potential photovoltaic applications, evaluate ...
M. A. Awaah +8 more
doaj +1 more source
FPGA based high-speed system solutions for innovative maskless lithography systems
, 2022 Paper 62832 KMaskless lithography is one of the possible solutions to manage the escalating mask costs and demands for faster production cycles. One of the major issues with the maskless lithography technology however is the management and transfer of ...
Talmi, M., Voss, S.-H.
core +1 more source
Solvent immersion nanoimprint lithography of fluorescent conjugated polymers [PDF]
, 2015 This work was supported by Engineering and Physical Sciences Research Council (EPSRC) Programme Grants: (EP1J01771X), (EP/K00042X), (EP/J5005491), and (EP/K503162).Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated
J. R. Y. Stevenson +11 more
core +1 more source
Journal of Microelectronic Manufacturing, 2019 As the process comes into 28nm node and below, lithography struggles stronger between high resolution (high NA) and enough process window especially for hole layers (Contacts and Vias). Taking more care of process window may result in lower image quality
Qingchen Cao +3 more
doaj +1 more source
Micro-Pattern of Graphene Oxide Films Using Metal Bonding
Micromachines, 2020 Recently, graphene has been explored in several research areas according to its outstanding combination of mechanical and electrical features. The ability to fabricate micro-patterns of graphene facilitates its integration in emerging technologies such ...
Heba Abunahla +3 more
doaj +1 more source
Rolling Nanoelectrode Lithography [PDF]
Micromachines, 2020 Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between ...
Hasan, Rashed Md. Murad +2 more
openaire +6 more sources
Extended Abbe approach for fast and accurate lithography imaging simulations
, 2022 Paper 747007This paper presents an extended Abbe based imaging algorithm for faster and more accurate simulations of current and future projection lithography systems.
Evanschitzky, P. +2 more
core +1 more source