Results 31 to 40 of about 228,991 (341)
Ga^+ beam lithography for nanoscale silicon reactive ion etching [PDF]
, 2010 By using a dry etch chemistry which relies on the highly preferential etching of silicon, over that of gallium (Ga), we show resist-free fabrication of precision, high aspect ratio nanostructures and microstructures in silicon using a focused ion beam ...
Chhim, B. +3 more
core +1 more source
Antibody-Integrated Solid-to-Gel Microfilm for Protection Against Botulinum Neurotoxin Type A
GelsAntibodies are indispensable for protection against biological toxins and pathogens, yet their conventional liquid formulations impose severe constraints, including dosing inaccuracy caused by residual fluid remaining in the syringe and limited user ...
Ji-Hwan Ha +9 more
doaj +1 more source
Teuken Bidikay, Revista Latinoamericana de Investigación en Organizaciones Ambiente y Sociedad, 2019 Aunque la investigación que sustenta este trabajo se centra en la faceta de contador y custodio de recursos públicos de Antonio Nariño, este artículo es una aportación a la polémica histórica sobre la supuesta infidelidad de Magdalena Ortega de Nariño ...
Jesús Alberto Suárez Pineda
doaj +1 more source
Dose influence on the PMMA e-resist for the development of high-aspect ratio and reproducible sub-micrometric structures by electron beam lithography [PDF]
, 2016 In this work, a statistical process control method is presented showing the accuracy and the reliability obtained with of PMMA E-resist AR-P 672, using an Elphy Quantum Electron Beam Lithography module integrated on a FE-SEM Zeiss Auriga instrument ...
Balucani, Marco +3 more
core +1 more source
Generative Learning in VLSI Design for Manufacturability: Current Status and Future Directions
Journal of Microelectronic Manufacturing, 2019 With the continuous scaling of integrated circuit technologies, design for manufacturability (DFM) is becoming more critical, yet more challenging. Alongside, recent advances in machine learning have provided a new computing paradigm with promising ...
Mohamed Baker Alawieh +3 more
doaj +1 more source
The Opto-Electronic Functional Devices Based on Three-Dimensional Lead Halide Perovskites
Applied Sciences, 2021 These days, opto-electronic functional devices based on three-dimensional lead halide perovskites (LHPs) are emerging. LHPs could be spin-coated to other materials, making it very convenient to combine LHPs with different categories of materials ...
Henan Liu +3 more
doaj +1 more source
Beilstein Journal of Nanotechnology, 2022 Metallic nanostructures are applied in many fields, including photonics and plasmonics, due to their ability to absorb or emit light at frequencies which depend on their size and shape.
Jānis Sniķeris +3 more
doaj +1 more source
Nonlinear optical properties of photoresists for projection lithography [PDF]
, 1996 Optical beams are self-focused and self-trapped upon initiating crosslinking in photoresists. This nonlinear optical phenomenon is apparent only for low average optical intensities and produces index of refraction changes as large as 0.04.
Kewitsch, Anthony S., Yariv, Amnon
core +1 more source
An Experimental High‐Throughput Approach for the Screening of Hard Magnet Materials
Advanced Engineering Materials, EarlyView.An entire workflow for the high‐throughput characterization and analysis of compositionally graded magnetic films is presented. Characterization protocols, data management tools and data analysis approaches are illustrated with test case Sm(Fe, V)12 based films.
William Rigaut +16 more
wiley +1 more source
DMD-based adaptive lithography system for real-time substrate deformation compensation
International Journal of OptomechatronicsThis article presents a novel DMD-based adaptive lithography system enabling real-time compensation for substrate deformation during patterning. The system integrates conventional DMD lithography with optical measurement capabilities to quantify ...
Jinsu Choi +5 more
doaj +1 more source