Results 31 to 40 of about 67,280 (259)
Bubble‐pen lithography: Fundamentals and applications
Aggregate, 2022 Developing on‐chip functional devices requires reliable fabrication methods with high resolution for miniaturization, desired components for enhanced performance, and high throughput for fast prototyping and mass production.
Pavana Siddhartha Kollipara +3 more
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Imaging and Applied Optics 2014, 2014 This review summarises the work of the Durham-Sheffield, UK team working on Holographic Lithography over the last decade. It collates progress in 3D resolution and overall scale of the substrate wiring patterns designed and considers a range of approaches and applications.
Purvis, A. +7 more
openaire +3 more sources
Optimized phase-shifting masks for high-resolution resist patterning by interference lithography
, 2022 Paper 104502A, 12 S.The EUV laboratory exposure tool (EUV-LET) is a versatile stand-alone resist patterning tool. Main applications are resist characterization for industrial lithography as well as the patterning of high-resolution arrays over large ...
Juschkin, L. +5 more
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Molecules, 2013 In this article we present several developed and improved combinatorial techniques to optimize processing conditions and material properties of organic thin films. The combinatorial approach allows investigations of multi-variable dependencies and is the
Hans-Werner Schmidt +4 more
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Lithographic process window optimization for mask aligner proximity lithography
, 2022 Paper 90520G, 11 S.We introduce a complete methodology for process window optimization in proximity mask aligner lithography. The commercially available lithography simulation software LAB from GenISys GmbH was used for simulation of light propagation ...
Hofmann, U. +9 more
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Learning Synchronous Control Based on Intelligent Methods for Ultra-Precision Stage Systems
IEEE AccessWith the increasing demands on equipment accuracy, synchronous performance becomes more and more significant for ultra-precision systems. In order to achieve nanometer-level accuracy and millisecond synchronization in practice, a learning synchronous ...
Xin Zhou +4 more
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Advancements in EUV photoresists for high-NA lithography
, 2023 EUV resist materials play a vital role in enabling advanced lithographic technologies for high-volume manufacturing (HVM) targeting nodes below 5 nm. In this study, we report an extensive performance characterization of available EUV photoresists for ...
Develioglu, Aysegul (author) +5 more
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An ice lithography instrument [PDF]
Review of Scientific Instruments, 2011 We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice.
Han, Anpan +3 more
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Antibody-Integrated Solid-to-Gel Microfilm for Protection Against Botulinum Neurotoxin Type A
GelsAntibodies are indispensable for protection against biological toxins and pathogens, yet their conventional liquid formulations impose severe constraints, including dosing inaccuracy caused by residual fluid remaining in the syringe and limited user ...
Ji-Hwan Ha +9 more
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Improving the Consistency of Nanoscale Etching for Atomic Force Microscopy Tomography Applications
Frontiers in Materials, 2019 The atomic force microscope (AFM) empowers research into nanoscale structural and functional material properties. Recently, the scope of application has broadened with the arrival of conductance tomography, a technique for mapping current in three ...
Mark Buckwell +5 more
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