Results 51 to 60 of about 228,991 (341)

Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments

open access: yesQuantum Beam Science, 2020
Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) chemically modified by electron beam (EB) irradiation, which is composed of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT). Irradiating a NPHT by EB could successfully induce the
Hiroki Yamamoto   +3 more
doaj   +1 more source

Dual field alignment display and control for electron micropattern generator [PDF]

open access: yes, 1972
Application of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described.
Malmberg, P. R., Okeeffe, T. W.
core   +1 more source

Overlay Accuracy Limitations of Soft Stamp UV Nanoimprint Lithography and Circumvention Strategies for Device Applications

open access: yes, 2018
In this work multilevel pattering capabilities of Substrate Conformal Imprint Lithography (SCIL) have been explored. A mix & match approach combining the high throughput of nanoimprint lithography with the excellent overlay accuracy of electron beam ...
Bolten, Jens   +7 more
core   +1 more source

Substrate Stress Relaxation Regulates Cell‐Mediated Assembly of Extracellular Matrix

open access: yesAdvanced Functional Materials, EarlyView.
Silicone‐based viscoelastic substrates with tunable stress relaxation reveal how matrix mechanics regulates cellular mechanosensing and cell‐mediated matrix remodelling in the stiff regime. High stress relaxation promotes assembly of fibronectin fibril‐like structures, increased nuclear localization of YAP and formation of β1 integrin‐enriched ...
Jonah L. Voigt   +2 more
wiley   +1 more source

Simple ultraviolet-based soft-lithography process for fabrication of low-loss polymer polysiloxanes-based waveguides [PDF]

open access: yes, 2011
A simple ultraviolet (UV)-based soft-lithography process is used for fabrication of polymer polysiloxanes (PSQ-L) waveguides. The imprint process is first done on the cladding PSQ-LL layer and is followed by a spin-coating step to fill the imprinted ...
Li, L   +5 more
core   +2 more sources

3D‐Printed Sulfur‐Derived Polymers With Controlled Architectures for Lithium‐Sulfur Batteries

open access: yesAdvanced Functional Materials, EarlyView.
Rheology‐guided formulation design for direct ink writing enables the fabrication of 3D sulfur copolymer cathodes with controlled architectures for lithium‐sulfur batteries. The printed electrodes exhibit multiscale porosity and high sulfur utilization, delivering enhanced electrochemical performance compared to conventional cast electrodes.
Bin Ling   +7 more
wiley   +1 more source

3D Stretchable Arch Ribbon Array Fabricated via Grayscale Lithography. [PDF]

open access: yes, 2016
Microstructures with flexible and stretchable properties display tremendous potential applications including integrated systems, wearable devices and bio-sensor electronics.
Deng, Ningqin   +9 more
core   +2 more sources

Circular‐Polarization‐Sensitive Organic Photodetectors with a Chiral Nanopatterned Electrode Inverse‐Designed by Genetic Algorithm

open access: yesAdvanced Functional Materials, EarlyView.
A chiral photodetector capable of selectively distinguishing left‐ and right‐handed circularly polarized light is experimentally demonstrated. The device, which features a nanopatterned electrode inverse‐designed by a genetic algorithm within a metal–dielectric–metal nanocavity that incorporates a vacuum‐deposited small‐molecule multilayer, exhibits ...
Kyung Ryoul Park   +3 more
wiley   +1 more source

A Simple Method for Fabricating Ink Chamber of Inkjet Printheads

open access: yesMicromachines, 2022
The process of fabricating chambers is becoming more important for inkjet printheads. However, there are some problems with the majority of present fabrication methods, such as nozzle structural deformation, blocked chambers, and collapsed chambers.
Zheguan Huang   +5 more
doaj   +1 more source

On the efficiency of quantum lithography

open access: yes, 2011
Quantum lithography promises, in principle, unlimited feature resolution, independent of wavelength. However, in the literature at least two different theoretical descriptions of quantum lithography exist. They differ in to which extent they predict that
Born M   +9 more
core   +1 more source

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