Results 51 to 60 of about 117,202 (206)
Ice Lithography for Nanodevices [PDF]
We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication.
Branton, Daniel +4 more
openaire +5 more sources
This paper presents a microlens fabrication process using the timed-development-and-thermal-reflow process, which can fabricate various types of aperture geometry with a parabolic profile on a single substrate in the same batch of the process.
Jun Ying Tan +2 more
doaj +1 more source
Metamorphose of Demons in Lithograph Illustrations of Iskandarnāma Naghali (1856-57 AD) [PDF]
Since the curios and creative mind of the human always attracts to unknowns and wonders, issues of this kind are interesting all the time. Thus, the footprint of the supernatural creatures and humans can be found in the beliefs, legends and folk tales ...
nima adham, Mehdi Hosseini
doaj +1 more source
Simulation of polychromatic effects in high NA EUV lithography
Paper 1185405, 13 S.State-of-the-art EUV exposure systems utilize EUV radiation around 13.52 nm with a full band spectrum extend- ing from 13.2 nm to 13.8 nm. The variation of the wavelength in this range modifies the diffraction angles with an impact on
Erdmann, Andreas +23 more
core +1 more source
First generation laser-produced plasma source system for HVM EUV lithography
Paper 763608The 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography is under development. We report latest status of the device which consists of the original concepts (1) CO2 laser driven Sn plasma, (2) Hybrid CO2 laser ...
Hori, T. +13 more
core +1 more source
Ленинградский художник Павел Иванович Басманов (1906–1993), родившийся на Алтае и воспевший Алтай в десятках сотен своих произведений, известен также как коллекционер русской и советской графики.
Сидорова, О.В.
doaj +1 more source
STARTING POINT SELECTION IN GROUPING DESIGN METHOD FOR LITHOGRAPHIC OBJECTIVES [PDF]
This work aims on method development for obtaining initial designs for ultraviolet (UV) and deep-ultraviolet (DUV) objectives through global search algorithm. We studied a global search based algorithm tending to obtain the feasible local minima of lens
Nenad D. Zoric +2 more
doaj +1 more source
FIRM: a new software tool for calibration of lithography simulation
S.161-173In general, simulation requires a thorough understanding of the physics and/or chemistry of the processes. This should lend itself to models which can be used to establish simulation software.
Feike, A. +5 more
core
Updates in Advanced Lithography [PDF]
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device.
core +1 more source
Robust and adjustable C-shaped electron vortex beams
Wavefront engineering is an important quantum technology, often applied to the production of states carrying orbital angular momentum (OAM). Here, we demonstrate the design and production of robust C-shaped beam states carrying OAM, in which the usual ...
M Mousley +3 more
doaj +1 more source

