Results 51 to 60 of about 117,202 (206)

Ice Lithography for Nanodevices [PDF]

open access: yesNano Letters, 2010
We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication.
Branton, Daniel   +4 more
openaire   +5 more sources

Microfabrication of Microlens by Timed-Development-and-Thermal-Reflow (TDTR) Process for Projection Lithography

open access: yesMicromachines, 2020
This paper presents a microlens fabrication process using the timed-development-and-thermal-reflow process, which can fabricate various types of aperture geometry with a parabolic profile on a single substrate in the same batch of the process.
Jun Ying Tan   +2 more
doaj   +1 more source

Metamorphose of Demons in Lithograph Illustrations of Iskandarnāma Naghali (1856-57 AD) [PDF]

open access: yesنگره, 2017
Since the curios and creative mind of the human always attracts to unknowns and wonders, issues of this kind are interesting all the time. Thus, the footprint of the supernatural creatures and humans can be found in the beliefs, legends and folk tales ...
nima adham, Mehdi Hosseini
doaj   +1 more source

Simulation of polychromatic effects in high NA EUV lithography

open access: yes, 2021
Paper 1185405, 13 S.State-of-the-art EUV exposure systems utilize EUV radiation around 13.52 nm with a full band spectrum extend- ing from 13.2 nm to 13.8 nm. The variation of the wavelength in this range modifies the diffraction angles with an impact on
Erdmann, Andreas   +23 more
core   +1 more source

First generation laser-produced plasma source system for HVM EUV lithography

open access: yes, 2022
Paper 763608The 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography is under development. We report latest status of the device which consists of the original concepts (1) CO2 laser driven Sn plasma, (2) Hybrid CO2 laser ...
Hori, T.   +13 more
core   +1 more source

Графика из коллекции П.И. Басманова в собрании Государственного художественного музея Алтайского края

open access: yesИскусство Евразии, 2016
Ленинградский художник Павел Иванович Басманов (1906–1993), родившийся на Алтае и воспевший Алтай в десятках сотен своих произведений, известен также как коллекционер русской и советской графики.
Сидорова, О.В.
doaj   +1 more source

STARTING POINT SELECTION IN GROUPING DESIGN METHOD FOR LITHOGRAPHIC OBJECTIVES [PDF]

open access: yesНаучно-технический вестник информационных технологий, механики и оптики, 2019
This work aims on method development for obtaining initial designs for ultraviolet (UV) and deep-ultraviolet (DUV) objectives through global search algorithm. We studied a global search based algorithm tending to obtain the feasible local minima of lens
Nenad D. Zoric   +2 more
doaj   +1 more source

FIRM: a new software tool for calibration of lithography simulation

open access: yes, 2022
S.161-173In general, simulation requires a thorough understanding of the physics and/or chemistry of the processes. This should lend itself to models which can be used to establish simulation software.
Feike, A.   +5 more
core  

Updates in Advanced Lithography [PDF]

open access: yes, 2013
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device.

core   +1 more source

Robust and adjustable C-shaped electron vortex beams

open access: yesNew Journal of Physics, 2017
Wavefront engineering is an important quantum technology, often applied to the production of states carrying orbital angular momentum (OAM). Here, we demonstrate the design and production of robust C-shaped beam states carrying OAM, in which the usual ...
M Mousley   +3 more
doaj   +1 more source

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