«Черно-белое и цветное». Заметки с персональной выставки Татьяны Ашкинази
Искусство Евразии, 2017 Татьяна Ашкинази – известный в Сибири художник-график. Профессиональное мастерство она совершенствовала в художественной студии В.Ф. Рублёва, в Домах творчества СХ СССР.
Сидорова, О.В.
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AFM lithography and fabrication of multifunctional nanostructures with perovskite oxides
, 2009 Recent progress on atomic force microscopy (AFM) lithography on perovskite oxides, including doped SrTiO3 single crystalline substrates and artificial perovskite manganite films, are reviewed systematically. SrTiO3 is the commercial substrate extensively
Li RW, Run Wei Li
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EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology
Applied Sciences, 2019 After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades.
Job Beckers +4 more
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Large-area metasurface on CMOS-compatible fabrication platform: driving flat optics from lab to fab
Nanophotonics, 2020 A metasurface is a layer of subwavelength-scale nanostructures that can be used to design functional devices in ultrathin form. Various metasurface-based optical devices – coined as flat optics devices – have been realized with distinction performances ...
Li Nanxi +7 more
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Lightweight Hotspot Detection Model Fusing SE and ECA Mechanisms
MicromachinesIn this paper, we propose a lightweight lithography machine learning-based hotspot detection model that integrates the Squeeze-and-Excitation (SE) attention mechanism and the Efficient Channel Attention (ECA) mechanism.
Yanning Chen +8 more
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The Draughtsman’s Contacts: Robert Seymour and the Humorous Periodical Press in the 1830s
Journal of European Periodical Studies, 2016 Robert Seymour was celebrated enough in his day to become one of very few late Regency and early Victorian comic and satirical draughtsmen sufficiently visible to be traced through the magazines of the 1830s.
Jasper Schelstraete
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Multi-trigger resist for electron beam and extreme ultraviolet lithography [PDF]
, 2018 The multi-trigger resist (MTR) is a new negative tone molecular resist platform for electron beam lithography, as well as extreme ultraviolet and optical lithography.
Ekinci, Y. +23 more
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Optimized phase-shifting masks for high-resolution resist patterning by interference lithography
, 2022 Paper 104502A, 12 S.The EUV laboratory exposure tool (EUV-LET) is a versatile stand-alone resist patterning tool. Main applications are resist characterization for industrial lithography as well as the patterning of high-resolution arrays over large ...
Juschkin, L. +5 more
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, 2014 A fast rigorous model is developed for the simulation of mask diffraction spectrum in EUV lithography. It combines a modified thin mask model and an equivalent layer method and provides an analytical expression of the diffraction spectrum of mask.
Li, Sikun +14 more
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Study Of Archaism in the Illustrations of the Lithographic Version of Amir Bahadori’s Shahnameh [PDF]
نگرهIranian archaism pursues a nationalist, patriotic, and identity-oriented perspective, and celebrates the Persian language, the components of national identity, and Iranian culture.
Farzane Fallahi, Abolghasem Dadvar
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