Results 61 to 70 of about 52,709 (261)
Solvent immersion nanoimprint lithography of fluorescent conjugated polymers
This work was supported by Engineering and Physical Sciences Research Council (EPSRC) Programme Grants: (EP1J01771X), (EP/K00042X), (EP/J5005491), and (EP/K503162).Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated
J. R. Y. Stevenson +11 more
core +1 more source
Simulation of polychromatic effects in high NA EUV lithography
Paper 1185405, 13 S.State-of-the-art EUV exposure systems utilize EUV radiation around 13.52 nm with a full band spectrum extend- ing from 13.2 nm to 13.8 nm. The variation of the wavelength in this range modifies the diffraction angles with an impact on
Erdmann, Andreas +15 more
core +1 more source
Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee +16 more
wiley +1 more source
Moiré band engineering in graphene/hexagonal boron nitride–based superlattices unlocks van Hove singularities (VHSs) for terahertz (THz) optoelectronics. Tuning the Fermi level near these singularities, associated with secondary neutrality points (SNPs), enhances the photothermoelectric response.
Leonid Elesin +16 more
wiley +1 more source
In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix “Cryo” is used here for ...
José María De Teresa +3 more
doaj +1 more source
A Simple Method for Fabricating Ink Chamber of Inkjet Printheads
The process of fabricating chambers is becoming more important for inkjet printheads. However, there are some problems with the majority of present fabrication methods, such as nozzle structural deformation, blocked chambers, and collapsed chambers.
Zheguan Huang +5 more
doaj +1 more source
Optoelectronic synaptic devices based on solution‐processed molecular telluride GST‐225 phase‐change inks are demonstrated for three‐factor learning. A global optical signal broadcast through a silicon waveguide induces non‐volatile conductance updates exclusively in locally electrically flagged memristors.
Kevin Portner +14 more
wiley +1 more source
Electrodeposition as a Tool for Nanostructuring Magnetic Materials
Electrodeposition has appeared in the last year as a non-expensive and versatile technique for the growth of nanomaterials. We review the main characteristics of electrodeposition that make this technique very suitable for its combination with different ...
Sandra Ruiz-Gómez +2 more
doaj +1 more source
Oxygen‐tunnel (OT) indium tin oxide (ITO) vertical channel transistors (VCTs) enable reliable, high‐density gain‐cell memory for monolithic 3D integration. A sandwiched SiN/SiO2/SiN OT stack selectively regulates oxygen transport, suppressing parasitic electrode oxidation while stabilizing channel oxygen vacancies, thereby suppressing carrier injection
Hyeonho Gu +17 more
wiley +1 more source
Versatile water-floated nanostructures for three-dimensional nanotransfer printing
Integrating functional nanostructures onto diverse three-dimensional surfaces is important for a wide range of applications, including holography, sensors, and extended reality.
Byung-Ho Kang +9 more
doaj +1 more source

