Results 61 to 70 of about 228,991 (341)

Patterned Nanomagnetic Films [PDF]

open access: yes, 2006
Nano-fabrication technologies for realising patterned structures from thin films are reviewed. A classification is made to divide the patterning technologies in two groups namely with and without the use of masks. The more traditional methods as well as
Lodder, J.C.
core   +2 more sources

Intermediate Resistive State in Wafer‐Scale Vertical MoS2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications

open access: yesAdvanced Functional Materials, EarlyView.
In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa   +19 more
wiley   +1 more source

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

open access: yesMicromachines, 2019
In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix “Cryo” is used here for ...
José María De Teresa   +3 more
doaj   +1 more source

Electrodeposition as a Tool for Nanostructuring Magnetic Materials

open access: yesMicromachines, 2022
Electrodeposition has appeared in the last year as a non-expensive and versatile technique for the growth of nanomaterials. We review the main characteristics of electrodeposition that make this technique very suitable for its combination with different ...
Sandra Ruiz-Gómez   +2 more
doaj   +1 more source

Controlled light-matter coupling for a single quantum dot embedded in a pillar microcavity using far-field optical lithography

open access: yes, 2009
Using far field optical lithography, a single quantum dot is positioned within a pillar microcavity with a 50 nm accuracy. The lithography is performed in-situ at 10 K while measuring the quantum dot emission.
Bloch, J.   +9 more
core   +1 more source

Alignment issues in photonic crystal device fabrication [PDF]

open access: yes, 2004
An important requirement in the fabrication of photonic crystal structures is the correct relative alignment of structural elements. Accuracy should be in the order of some tens of nanometres. Some of the options for providing such accuracy are discussed.
Bostan, Cazimir G.   +3 more
core   +4 more sources

Bio‐Inspired Molecular Events in Poly(Ionic Liquids)

open access: yesAdvanced Functional Materials, EarlyView.
Originating from dipolar and polar inter‐ and intra‐chain interactions of the building blocks, the topologies and morphologies of poly(ionic liquids) (PIL) govern their nano‐ and micro‐processibility. Modulating the interactions of cation‐anion pairs with aliphatic dipolar components enables the tunability of properties, facilitated by “bottom‐up ...
Jiahui Liu, Marek W. Urban
wiley   +1 more source

Two-dimensional Nanolithography Using Atom Interferometry

open access: yes, 2004
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system.
A. C. Doherty   +9 more
core   +1 more source

Domain Decomposition Method for Maxwell's Equations: Scattering off Periodic Structures [PDF]

open access: yes, 2006
We present a domain decomposition approach for the computation of the electromagnetic field within periodic structures. We use a Schwarz method with transparent boundary conditions at the interfaces of the domains.
Achim Schädle   +28 more
core   +2 more sources

Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips

open access: yesAdvanced Functional Materials, EarlyView.
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee   +16 more
wiley   +1 more source

Home - About - Disclaimer - Privacy