Results 41 to 50 of about 42,088 (263)

DMD-based adaptive lithography system for real-time substrate deformation compensation

International Journal of Optomechatronics
This article presents a novel DMD-based adaptive lithography system enabling real-time compensation for substrate deformation during patterning. The system integrates conventional DMD lithography with optical measurement capabilities to quantify ...
Jinsu Choi, Won-Sup Lee, Geehong Kim, Hyunmin Cho, Won Seok Chang, Hongki Yoo   +5 more
doaj   +1 more source

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

Beilstein Journal of Nanotechnology, 2022
Metallic nanostructures are applied in many fields, including photonics and plasmonics, due to their ability to absorb or emit light at frequencies which depend on their size and shape.
Jānis Sniķeris, Vjačeslavs Gerbreders, Andrejs Bulanovs, Ēriks Sļedevskis   +3 more
doaj   +1 more source

Ice Lithography for Nanodevices [PDF]

Nano Letters, 2010
We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication.
Branton, Daniel, Han, Anpan, Vlassarev, Dimitar Mihaylov, Wang, Jenny Yingzi, Golovchenko, Jene   +4 more
openaire   +5 more sources

Rolling Nanoelectrode Lithography [PDF]

Micromachines, 2020
Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between ...
Hasan, Rashed Md. Murad, Luo, Xichun, Sun, Jining   +2 more
openaire   +6 more sources

Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips

Advanced Functional Materials, EarlyView.
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee, Sofía Cruces, Xiaohua Liu, Yang Chen, Vasilis A. Maroufidis, Janghyun Jo, Lukas Völkel, Dennis Braun, Michael Möller, Leon Brackmann, Holger Kalisch, Michael Heuken, Andrei Vescan, Rafal E. Dunin‐Borkowski, Joachim Mayer, Stefan Wiefels, Max C. Lemme   +16 more
wiley   +1 more source

Mechanically Tunable Mechanochromic Device with Covert‐Overt Structural Color and Modulation of its Transparency

Advanced Materials Interfaces
In this study, A novel mechanically responsive optical device (MROD) is introduced which is capable of modulating light transmission and produces iridescent structural colors under reflection.
Nguyen Hoang Minh, Kwanoh Kim, Do Hyun Kang, Yeong‐Eun Yoo, Jae Sung Yoon   +4 more
doaj   +1 more source

Optoelectronic Synaptic Devices Using Molecular Telluride Phase‐Change Inks for Three‐Factor Learning

Advanced Functional Materials, EarlyView.
Optoelectronic synaptic devices based on solution‐processed molecular telluride GST‐225 phase‐change inks are demonstrated for three‐factor learning. A global optical signal broadcast through a silicon waveguide induces non‐volatile conductance updates exclusively in locally electrically flagged memristors.
Kevin Portner, Dhananjeya Kumaar, Giacomo Torti, Killian Keller, Till Zellweger, Florian M. Schenk, Christoph Weilenmann, Daniel Chelladurai, Vara Prasad Jonnalagadda, Ghazi Sarwat Syed, Vanessa Wood, Jürg Leuthold, Alexandros Emboras, Maksym Yarema, Mathieu Luisier   +14 more
wiley   +1 more source

Synthesis and characterization of TeO2-B2O3-CaO-ZnO glass systems for improved radiation shielding performance

Journal of Radiation Research and Applied Sciences
This study aims to develop glass materials with enhanced radiation shielding properties with better attenuation performance by combining B2O3-TeO2-ZnO-CaO glasses with a fixed TeO2 content and varying concentrations of B2O3, ZnO, and CaO.
Reem Darwesh, M.I. Sayyed, Yas Al-Hadeethi, Jawza Sayef Alotaibi   +3 more
doaj   +1 more source

Experiment Research on Micro-/Nano Processing Technology of Graphite as Basic MEMS Material

Applied Sciences, 2019
Graphite is expected to be a common choice for basic microelectromechanical-system (MEMS) material in the future. However, in order to become a basic MEMS material, it is very important for graphite to be adapted to the commonly-used micro ...
Cheng Zhang, Yijin Liu, Mingge Wu, Ningbo Liao   +3 more
doaj   +1 more source

Mala'ik Al-Tuhfat; Study of the Angels' Presence in the Lithographed Copies of Tuhfat Al-Majalis [PDF]

Jilvah-i hunar, 2019
Lithography was created as a result of the development of literacy and the need for access to cheap reading sources affordable to everyone. The illustrations of the lithographed books, as a medium for the portrayal of popular art, add social aspects to ...
Maryam Yaghmaeian
doaj   +1 more source