Results 41 to 50 of about 67,280 (259)

Micromagnetic Simulation of Vortex Development in Magnetic Bi-Material Bow-Tie Structures

Condensed Matter, 2020
Magnetic vortex structures are of high technological relevance due to their possible application in magnetic memory. Moreover, investigating magnetization reversal via vortex formation is an important topic in basic research. Typically, such vortices are
Devika Sudsom, Irén Juhász Junger, Christoph Döpke, Tomasz Blachowicz, Lothar Hahn, Andrea Ehrmann   +5 more
doaj   +1 more source

Polymer Pen Lithography [PDF]

Science, 2008
We report a low-cost, high-throughput scanning probe lithography method that uses a soft elastomeric tip array, rather than tips mounted on individual cantilevers, to deliver inks to a surface in a “direct write” manner. Polymer pen lithography merges the feature size control of dip-pen nanolithography with the large-area capability of contact printing.
Giam, Louise R., Mirkin, Chad A., Huo, Fengwei, Zheng, Zijian, Zheng, Gengfeng, Zhang, Hua   +5 more
openaire   +4 more sources

Microfluidic–optical integrated portable platform with handheld pump for wash-free plasmonic detection of thrombin and SARS-CoV-2 spike protein

Microsystems & Nanoengineering
Point-of-care testing (POCT) requires rapid, quantitative results without the complexity of laboratory instrumentation. Conventional assays like ELISA and PCR are often limited by long processing times, multiple washing procedures, and a dependence on ...
Da-In Kwon, Yeong-Eun Yoo, Jae-Ho Jin, Ji Hyo Park, Ga Eun Han, Kwanoh Kim, Jae Sung Yoon, Seong Min Kang, Do Hyun Kang   +8 more
doaj   +1 more source

First generation laser-produced plasma source system for HVM EUV lithography

, 2022
Paper 763608The 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography is under development. We report latest status of the device which consists of the original concepts (1) CO2 laser driven Sn plasma, (2) Hybrid CO2 laser ...
Hori, T., Abe, T., Kakizaki, K., Endo, A., Fujimoto, J., Sumitani, A., Kurosu, A., Watanabe, Y., Mizoguchi, H., Ohta, T., Ishihara, T., Wakabayashi, O., Nakarai, H., Komori, H.   +13 more
core   +1 more source

Intermediate Resistive State in Wafer‐Scale Vertical MoS2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications

Advanced Functional Materials, EarlyView.
In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa, Milan Buttberg, Ke Ran, Rana Walied Ahmad, Dennis Braun, Lukas Völkel, Jimin Lee, Sofía Cruces, Bart Macco, Bárbara Canto, Holger Lerch, Thorsten Wahlbrink, Holger Kalisch, Michael Heuken, Andrei Vescan, Joachim Mayer, Zhenxing Wang, Ilia Valov, Stephan Menzel, Max C. Lemme   +19 more
wiley   +1 more source

Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips

Advanced Functional Materials, EarlyView.
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee, Sofía Cruces, Xiaohua Liu, Yang Chen, Vasilis A. Maroufidis, Janghyun Jo, Lukas Völkel, Dennis Braun, Michael Möller, Leon Brackmann, Holger Kalisch, Michael Heuken, Andrei Vescan, Rafal E. Dunin‐Borkowski, Joachim Mayer, Stefan Wiefels, Max C. Lemme   +16 more
wiley   +1 more source

DMD-based adaptive lithography system for real-time substrate deformation compensation

International Journal of Optomechatronics
This article presents a novel DMD-based adaptive lithography system enabling real-time compensation for substrate deformation during patterning. The system integrates conventional DMD lithography with optical measurement capabilities to quantify ...
Jinsu Choi, Won-Sup Lee, Geehong Kim, Hyunmin Cho, Won Seok Chang, Hongki Yoo   +5 more
doaj   +1 more source

Wearable Smart Patches on Sustainable Chitosan With Reversible Microbial Growth‐Inhibitory Properties

Advanced Functional Materials, EarlyView.
ABSTRACT Chitosan, a polysaccharide upcycled from biowaste, has long promised sustainable, biocompatible, and antimicrobial films and devices, an appeal reinforced by its recent regulatory recognition, with several chitosan‐based antibacterial dressings gaining clearance through the Food and Drug Administration's 510(k) pathway.
Jacopo Nicoletti, Kubra Kocak, Andrea Michel, Enrico Cavarzerani, Ali Raza, Petr Rohzin, Nouha Loudhaief, Saimir Frroku, Nicolò Baldovin, Hazrat Bilal, Alvise Perosa, Maurizio Selva, Flavio Rizzolio, Luca Sbuelz, Sabrina Tamburini, Domenico De Fazio, Giovanni Antonio Salvatore   +16 more
wiley   +1 more source

FIRM: a new software tool for calibration of lithography simulation

, 2022
S.161-173In general, simulation requires a thorough understanding of the physics and/or chemistry of the processes. This should lend itself to models which can be used to establish simulation software.
Feike, A., Krüger, D., Erdmann, A., Friedrich, C., Kalus, C.K., Käsmaier, R.   +5 more
core   +1 more source

Mechanically Tunable Mechanochromic Device with Covert‐Overt Structural Color and Modulation of its Transparency

Advanced Materials Interfaces
In this study, A novel mechanically responsive optical device (MROD) is introduced which is capable of modulating light transmission and produces iridescent structural colors under reflection.
Nguyen Hoang Minh, Kwanoh Kim, Do Hyun Kang, Yeong‐Eun Yoo, Jae Sung Yoon   +4 more
doaj   +1 more source