Results 41 to 50 of about 117,202 (206)
DMD-based adaptive lithography system for real-time substrate deformation compensation
International Journal of OptomechatronicsThis article presents a novel DMD-based adaptive lithography system enabling real-time compensation for substrate deformation during patterning. The system integrates conventional DMD lithography with optical measurement capabilities to quantify ...
Jinsu Choi +5 more
doaj +1 more source
Rolling Nanoelectrode Lithography [PDF]
Micromachines, 2020 Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between ...
Hasan, Rashed Md. Murad +2 more
openaire +6 more sources
Extended Abbe approach for fast and accurate lithography imaging simulations
, 2022 Paper 747007This paper presents an extended Abbe based imaging algorithm for faster and more accurate simulations of current and future projection lithography systems.
Evanschitzky, P. +2 more
core +1 more source
Advanced Materials InterfacesIn this study, A novel mechanically responsive optical device (MROD) is introduced which is capable of modulating light transmission and produces iridescent structural colors under reflection.
Nguyen Hoang Minh +4 more
doaj +1 more source
COPYRIGHT PROTECTED PLASTIC ARTWORK IN THE LIGHT OF THE EUROPEAN AND ROMANIAN LAWS AND THE ARTWORK VALUE RELEVANCE [PDF]
Challenges of the Knowledge Society, 2018 The plastic artwork, as a species of the "work of art" genre, is subjected to copyright. However, the law does not define plastic artworks, which are generally included in non-exhaustive listings, in phrases of the types: "plastic or graphical artworks,
Mihai OLARIU
doaj
Science, 2008 We report a low-cost, high-throughput scanning probe lithography method that uses a soft elastomeric tip array, rather than tips mounted on individual cantilevers, to deliver inks to a surface in a “direct write” manner. Polymer pen lithography merges the feature size control of dip-pen nanolithography with the large-area capability of contact printing.
Giam, Louise R. +5 more
openaire +4 more sources
Accurate determination of 3D PSF and resist effects in grayscale laser lithography
, 2022 Paper 107750I, 7 S.Accurate calibration of the optical and resist parameters is invaluable for the computation of the dose distribution needed to fabricate a desired non-binary photoresist topography. This paper presents a method for precisely evaluating
Erdmann, A. +3 more
core +1 more source
Journal of Radiation Research and Applied SciencesThis study aims to develop glass materials with enhanced radiation shielding properties with better attenuation performance by combining B2O3-TeO2-ZnO-CaO glasses with a fixed TeO2 content and varying concentrations of B2O3, ZnO, and CaO.
Reem Darwesh +3 more
doaj +1 more source
Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network
Journal of Microelectronic Manufacturing, 2018 In the advanced semiconductor lithography manufacturing process, the sub-wavelength lithography gap may cause lithographic error and the difference between the wafer pattern and mask pattern which may cause wafer defects in the later process.
Xingyu Zhou, Youling Yu
doaj +1 more source
Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement
Photonics, 2023 As with the decreasing feature size prompted by Moore’s law and the continuous technological advancements in the semiconductor industry, the distortion of the projection lens is an important factor that affects the overlay.
Tian Li +8 more
doaj +1 more source