Results 41 to 50 of about 52,709 (261)
Generative Learning in VLSI Design for Manufacturability: Current Status and Future Directions
Journal of Microelectronic Manufacturing, 2019 With the continuous scaling of integrated circuit technologies, design for manufacturability (DFM) is becoming more critical, yet more challenging. Alongside, recent advances in machine learning have provided a new computing paradigm with promising ...
Mohamed Baker Alawieh +3 more
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, 2014 The properties of graphene nanoribbons are dependent on both the nanoribbon width and the crystallographic orientation of the edges. Scanning tunneling microscope lithography is a method which is able to create graphene nanoribbons with well defined edge
Dobrik, G. +7 more
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Mask absorber for next generation EUV lithography
, 2022 Paper 1151706, 15 S.Novel mask absorber designs are calling attention of the EUVL community due to their ability to mitigate mask 3D effects. Material selection is part of such optimization [1].
Thakare, D. +13 more
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Beilstein Journal of Nanotechnology, 2022 Metallic nanostructures are applied in many fields, including photonics and plasmonics, due to their ability to absorb or emit light at frequencies which depend on their size and shape.
Jānis Sniķeris +3 more
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The Opto-Electronic Functional Devices Based on Three-Dimensional Lead Halide Perovskites
Applied Sciences, 2021 These days, opto-electronic functional devices based on three-dimensional lead halide perovskites (LHPs) are emerging. LHPs could be spin-coated to other materials, making it very convenient to combine LHPs with different categories of materials ...
Henan Liu +3 more
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Nanoimprint Lithography Technology and Applications [PDF]
, 2022 Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D ...
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Near‐Field Electrospinning Micro‐Printhead Achieves Precise Control of Nanofiber Deposition
Advanced Engineering Materials, EarlyView.A micro‐printhead for near‐field electrospinning enables reproducible deposition of polymer nanofibers with diameters below 50 nm. Systematic parameter studies uncover the mechanisms linking operating conditions to fiber morphology, paving the way for precise and low‐cost nanoscale 3D manufacturing.As a high‐resolution, cost‐effective, and rapid ...
Han Xu, Dario Mager, Jan G. Korvink
wiley +1 more source
DMD-based adaptive lithography system for real-time substrate deformation compensation
International Journal of OptomechatronicsThis article presents a novel DMD-based adaptive lithography system enabling real-time compensation for substrate deformation during patterning. The system integrates conventional DMD lithography with optical measurement capabilities to quantify ...
Jinsu Choi +5 more
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, 2022 Paper 90483E, 10 S.A fast rigorous model is developed for the simulation of mask diffraction spectrum in EUV lithography. It combines a modified thin mask model and an equivalent layer method and provides an analytical expression of the diffraction ...
Li, S. +4 more
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An Experimental High‐Throughput Approach for the Screening of Hard Magnet Materials
Advanced Engineering Materials, EarlyView.An entire workflow for the high‐throughput characterization and analysis of compositionally graded magnetic films is presented. Characterization protocols, data management tools and data analysis approaches are illustrated with test case Sm(Fe, V)12 based films.
William Rigaut +16 more
wiley +1 more source