Results 11 to 20 of about 117,202 (206)

Lithography-Based Fabricated Capacitive Pressure Sensitive Touch Sensors for Multimode Intelligent HMIs

IEEE Access, 2023
Interdigitated capacitive (IDC) sensors have been extensively researched for human-machine interfaces (HMIs) due to consistent response and easy manufacturing.
Muhammad Qasim Mehmood, Muhammad Hamza Zulfiqar, Amit Kumar Goyal, Muhammad Shumail Malik, Wasif Tanveer Khan, Muhammad Atif Khan, Muhammad Zubair, Yehia Massoud   +7 more
doaj   +1 more source

Advancements in EUV photoresists for high-NA lithography [PDF]

, 2023
EUV resist materials play a vital role in enabling advanced lithographic technologies for high-volume manufacturing (HVM) targeting nodes below 5 nm. In this study, we report an extensive performance characterization of available EUV photoresists for ...
Develioglu, Aysegul (author), Van Lent-Protasova, Lidia (author), Vockenhuber, Michaela (author), Kazazis, Dimitrios (author), Mochi, Iacopo (author), Ekinci, Yasin (author)   +5 more
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Detection of environmental nanoplastics via surface-enhanced Raman spectroscopy using high-density, ring-shaped nanogap arrays

Frontiers in Bioengineering and Biotechnology, 2023
Micro- and nano-plastics (MNPs) are global contaminants of growing concern to the ecosystem and human health. In-the-field detection and identification of environmental micro- and nano-plastics (e-MNPs) is critical for monitoring the spread and effects ...
Sihai Luo, Junjie Zhang, John C. de Mello   +2 more
doaj   +1 more source

Advanced mask aligner lithography (AMALITH)

, 2022
Paper 83261YMask aligners were the dominating lithography tool for the first 20 years of semiconductor industry. In the 1980s industry changed over to projection lithography.
Motzek, K., Zoberbier, R., Zeitner, U.D., Hornung, M., Erdmann, A., Bramati, A., Weichelt, T., Völkel, R., Vogler, U., Stürzebecher, L.   +9 more
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Progress in EUV resist screening towards the deployment of high-NA lithography [PDF]

, 2021
The development of EUV resists is one of the major challenges for the deployment of high-NA EUV lithography, which is on the roadmap for high-volume manufacturing of future semiconductor technology nodes.
Vockenhuber, M. (author), Yeh, C.-K. (author), Wang, X. (author), Mochi, I. (author), Santaclara, J.G. (author), Allenet, T. (author), Van Lent-Protasova, L. (author), Ekinci, Y. (author)   +7 more
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Innovative design of a transmission mechanism for variable speed wind turbines

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2015
An innovative transmission mechanism, referred to here as an independently controllable transmission (ICT), for application in variable speed wind turbines is described.
Guan-Shyong HWANG, Chung-Chi LIN
doaj   +1 more source

Temperature Fluctuation Attenuation of Circulating Cooling Water Using Dynamic Thermal Filtering

Applied Sciences, 2020
The Demand for circulating cooling water (CCW) with high temperature stability and a quick response to temperature control is essential for precision engineering, so a dynamic thermal filtering method is proposed in this paper.
Yesheng Lu, Junning Cui, Jiubin Tan, Xingyuan Bian, Yamin Zhao   +4 more
doaj   +1 more source

Charge storage in mesoscopic graphitic islands fabricated using AFM bias lithography [PDF]

, 2011
Electrochemical oxidation and etching of highly oriented pyrolytic graphite (HOPG) has been achieved using biased atomic force microscopy (AFM) lithography, allowing patterns of varying complexity to be written into the top layers of HOPG.
G U Kulkarni, Prakash, Gyan, Kurra, Narendra, Fisher, Timothy S., Ronald G Reifenberger, Reifenberger, Ronald G., Gyan Prakash, Timothy S Fisher, Narendra Kurra, S Basavaraja, Basavaraja, S., Kulkarni, G. U.   +11 more
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Advanced photomask fabrication by e-beam lithography for mask aligner applications

, 2022
Paper 1003204Photomasks contain geometric information that will be transferred to substrates or pre-structured surfaces. Conventional mask aligner lithography in the sense of shadow printing of the photomask suffers from limited achievable resolution ...
Zeitner, U.D., Banasch, M., Bourgin, Y., Weichelt, T.   +3 more
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Lithography-free directional control of thermal emission

, 2022
Blackbody thermal emission is spatially diffuse. Achieving highly directional thermal emission typically requires nanostructuring the surface of the thermally emissive medium. The most common configuration is a subwavelength grating that scatters surface
Mitradeep Sarkar (1653787), Maxime Giteau (13021251), Michael Enders (7484513), Georgia T. Papadakis (14361330)   +3 more
core   +1 more source