From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography [PDF]
, 2021 As EUV lithography becomes the new standard for electronic chip manufacturing, identifying suitable materials for higher resolution patterning stands out as a prominent challenge to reach future technology nodes.
Vockenhuber, M. (author) +4 more
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Chemically-amplified backbone scission (CABS) resist for EUV lithography. [PDF]
, 2021 Polymeric materials with an imaging chemistry based on the main chain cleavage under the influence of photogenerated acid are a promising resist platform for EUV lithography.
Kazazis, Dimitrios (author) +2 more
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Application of the three-state lithography model for grayscale lithography
, 2022 In this work, we focus on the application of the "three-state lithography model" developed for the production of 3D-topographies in photoresist through grayscale lithography.
Badawi, Bassem, Kutter, Christoph
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Advanced mask aligner lithography (AMALITH)
, 2022 Paper 83261YMask aligners were the dominating lithography tool for the first 20 years of semiconductor industry. In the 1980s industry changed over to projection lithography.
Motzek, K. +9 more
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Charge storage in mesoscopic graphitic islands fabricated using AFM bias lithography [PDF]
, 2011 Electrochemical oxidation and etching of highly oriented pyrolytic graphite (HOPG) has been achieved using biased atomic force microscopy (AFM) lithography, allowing patterns of varying complexity to be written into the top layers of HOPG.
G U Kulkarni +11 more
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Progress in EUV resist screening by interference lithography for high-NA lithography [PDF]
, 2021 The introduction of novel photoresists is a critical enabler of future technology nodes, including the upcoming high-NA EUVL deployment. The development of EUV materials is investigated within the scope of a resist screening program between ASML and PSI.
Vockenhuber, M. (author) +6 more
core +1 more source
Advanced coatings for next generation lithography
, 2022 Paper 94221K, 7 S.Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To implement B-based mirrors and to enable their industrial application in lithography tools, a reflectivity level of > 70% has to be ...
Yulin, Sergiy A. +3 more
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Graphene nanoribbons with zigzag and armchair edges prepared by scanning tunneling microscope lithography on gold substrates [PDF]
, 2014 The properties of graphene nanoribbons are dependent on both the nanoribbon width and the crystallographic orientation of the edges. Scanning tunneling microscope lithography is a method which is able to create graphene nanoribbons with well defined edge
Dobrik, G. +7 more
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Advanced photomask fabrication by e-beam lithography for mask aligner applications
, 2022 Paper 1003204Photomasks contain geometric information that will be transferred to substrates or pre-structured surfaces. Conventional mask aligner lithography in the sense of shadow printing of the photomask suffers from limited achievable resolution ...
Zeitner, U.D. +3 more
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Temperature Fluctuation Attenuation of Circulating Cooling Water Using Dynamic Thermal Filtering
Applied Sciences, 2020 The Demand for circulating cooling water (CCW) with high temperature stability and a quick response to temperature control is essential for precision engineering, so a dynamic thermal filtering method is proposed in this paper.
Yesheng Lu +4 more
doaj +1 more source