Results 141 to 150 of about 21,175 (304)
High‐Performance Air‐Stable Polymer Monolayer Transistors for Monolithic 3D CMOS logics
A fibrillar polymer monolayer with a self‐confinement effect is demonstrated, in which aligned chains parallel the nanofiber axis. Employing a top‐gate CYTOP dielectric, this monolayer transistor achieves high mobility (7.12 cm2 V−1 s−1) and exceptional stability over 1260 days in air.
Miao Cheng +13 more
wiley +1 more source
Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution. [PDF]
Mao Q, Zhu J, Cheng X, Wang Z.
europepmc +1 more source
Universal Conductance Fluctuations in Quantum Anomalous Hall Insulators
Universal conductance fluctuations are observed in mesoscopic quantum anomalous Hall insulators. Two distinct fluctuation patterns are identified, arising from different interference processes of bulk and chiral edge states, respectively. These findings unveil rich quantum interference phenomena in quantum anomalous Hall insulators and provide insights
Peng Deng +11 more
wiley +1 more source
Enhanced photon-extraction efficiency from InGaAs/GaAs quantum dots in deterministic photonic structures at 1.3 μm fabricated by in-situ electron-beam lithography [PDF]
N. Srocka +10 more
openalex +1 more source
Two‐Photon 3D Printing of Functional Microstructures Inside Living Cells
This study demonstrates 3D printing inside living cells by using two‐photon photo‐lithography. A bio‐compatible photoresist is injected into cells and selectively polymerized with a femtosecond laser, creating custom‐shaped intracellular structures with submicron resolution.
Maruša Mur +4 more
wiley +1 more source
Tuning Surface Adhesion Using Grayscale Electron-beam Lithography. [PDF]
Pradhan A +4 more
europepmc +1 more source
The tear‐and‐stack method enables the creation of twisted SrTiO3 bilayers with accurate twist‐angle control, which yield atomically sharp oxide moiré superlattices with emergent exotic topological polar vortices, thereby opening a new pathway for twistronics based on 2D‐like non‐van der Waals oxides.
Yingli Zhang +13 more
wiley +1 more source
Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography. [PDF]
Cong X +10 more
europepmc +1 more source

