Results 31 to 40 of about 81,341 (318)

Inverse design of high-NA metalens for maskless lithography

Nanophotonics, 2023
We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry.
Chung Haejun, Zhang Feng, Li Hao, Miller Owen D., Smith Henry I.   +4 more
doaj   +1 more source

The Validation of Various Technological Factors Impact on the Electron Beam Lithography Process

Advances in Electrical and Electronic Engineering, 2021
One of the most significant processes in micro- and nanoelectronics technology is Electron Beam Lithography (EBL). This technique maintains a leading role in extremely high-resolution structures fabrication process with micro- and nanometer dimensions ...
Agnieszka Zawadzka, Kornelia Indykiewicz, Regina Paszkiewicz   +2 more
doaj   +1 more source

Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses

, 2018
Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios.
Belkhou, Rachid, Bosgra, Jeroen, David, Christian, Döring, Florian, Fink, Rainer H., Guzenko, Vitaliy A., Kirk, Eugenie, Koch, Frieder, Meyer, Markus, Ornelas, Joshua L., Raabe, Jörg, Rösner, Benedikt, Stanescu, Stefan, Swaraj, Sufal, Watts, Benjamin   +14 more
core   +1 more source

Charged particle single nanometre manufacturing

Beilstein Journal of Nanotechnology, 2018
Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject
Philip D. Prewett, Cornelis W. Hagen, Claudia Lenk, Steve Lenk, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Ivo W. Rangelow, Xiaoqing Shi, Stuart A. Boden, Alex P. G. Robinson, Dongxu Yang, Sangeetha Hari, Marijke Scotuzzi, Ejaz Huq   +14 more
doaj   +1 more source

Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2016
Roll-to-roll nanoimprint lithography (RTR-NIL) has received considerable attention because it permits large-area nanopatterning with both high resolution and high throughput.
Kai OJIMA, Masashi SAITO, Noriyuki UNNO, Jun TANIGUCHI   +3 more
doaj   +1 more source

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Nanomaterials, 2023
Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes.
Taewoo Ko, Samir Kumar, Sanghoon Shin, Dongmin Seo, Sungkyu Seo   +4 more
doaj   +1 more source

Nanometer-spaced platinum electrodes with calibrated separation

, 2002
We have fabricated pairs of platinum electrodes with separation between 20 and 3.5 nm. Our technique combines electron beam lithography and chemical electrodeposition. We show that the measurement of the conductance between the two electrodes through the
Gurevich, L., Kervennic, Y. -V., Kouwenhoven, L. P., Morpurgo, A. F., Van der Zant, H. S. J.   +4 more
core   +3 more sources

Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing [PDF]

, 2015
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Review of Scientific Instruments 86, 073903 (2015) and may be found at https://doi.org/10.1063/1 ...
Gschrey, Manuel, Heindel, Tobias, Kaganskiy, Arsenty, Reitzenstein, Stephan, Rodt, Sven, Schlehahn, Alexander, Schmidt, Ronny, Schulze, Jan-Hindrik, Strittmatter, André   +8 more
core   +1 more source

Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82

Micro and Nano Engineering, 2020
In the past 2 decades silsesquioxane has gained attention in the Electron Beam Lithography community as a negative tone electron-sensitive resist (HSQ) whose advantages (sub-20 nm resolution, high contrast, low Line Edge Roughness, good shape fidelity ...
Th. Mpatzaka, G. Zisis, I. Raptis, V. Vamvakas, C. Kaiser, T. Mai, M. Schirmer, M. Gerngroß, G. Papageorgiou   +8 more
doaj   +1 more source

Enhanced Resolution of Poly-(Methyl Methacrylate) Electron Resist by Thermal Processing

, 2009
Granular nanostructure of electron beam resist had limited the ultimate resolution of electron beam lithography. We report a thermal process to achieve a uniform and homogeneous amorphous thin film of poly methyl methacrylate electron resist.
Broers, Gustaaf Borghs, Liesbet Lagae, Nima Arjmandi   +3 more
core   +1 more source