Results 41 to 50 of about 81,341 (318)

Patterned Nanomagnetic Films [PDF]

open access: yes, 2006
Nano-fabrication technologies for realising patterned structures from thin films are reviewed. A classification is made to divide the patterning technologies in two groups namely with and without the use of masks. The more traditional methods as well as
Lodder, J.C.
core   +2 more sources

Dual field alignment display and control for electron micropattern generator [PDF]

open access: yes, 1972
Application of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described.
Malmberg, P. R., Okeeffe, T. W.
core   +1 more source

Microphotonic parabolic light directors fabricated by two-photon lithography [PDF]

open access: yes, 2011
We have fabricated microphotonic parabolic light directors using two-photon lithography, thin-film processing, and aperture formation by focused ion beam lithography. Optical transmission measurements through upright parabolic directors 22 μm high and 10 
Atwater, H. A.   +8 more
core   +1 more source

Optimized Strategy for Fabricating High‐Aspect‐Ratio Periodic Structures Over Large Areas Using ps‐Direct Laser Interference Patterning

open access: yesAdvanced Engineering Materials, EarlyView.
Picosecond direct laser interference patterning (DLIP) enables precise microstructure fabrication on stainless steel. Using a multiscan approach, high‐aspect‐ratio patterns are achieved. Fluence influences structure growth and homogeneity, with smaller periods yielding better uniformity.
Fabian Ränke   +5 more
wiley   +1 more source

Through-membrane electron-beam lithography for ultrathin membrane applications

open access: yes, 2017
We present a technique to fabricate ultrathin (down to 20 nm) uniform electron transparent windows at dedicated locations in a SiN membrane for in situ transmission electron microscopy experiments.
Dekker, C.   +8 more
core   +2 more sources

Nano‐Patterned CuO Nanowire Nanogap Hydrogen Gas Sensor with Voids

open access: yesAdvanced Functional Materials, Volume 35, Issue 12, March 18, 2025.
Sub‐5‐ppb hydrogen (H2) detection and sub‐10‐s response and recovery times are achieved based on nano‐patterned polycrystalline CuO nanowires nanogap gas sensors with voids using electron‐beam lithography and unique annealing processes. Pre‐H2 annealing, void‐generating oxidation, and downscaled nanogap electrodes are key to improving the sensing ...
Muqing Zhao   +4 more
wiley   +1 more source

Structurally Colored Physically Unclonable Functions with Ultra‐Rich and Stable Encoding Capacity

open access: yesAdvanced Functional Materials, Volume 35, Issue 12, March 18, 2025.
This study reports a design strategy for generating bright‐field resolvable physically unclonable functions with extremely rich encoding capacity coupled with outstanding thermal and chemical stability. The optical response emerges from thickness‐dependent structural color formation in ZnO features, which are fabricated by physical vapor deposition ...
Abidin Esidir   +8 more
wiley   +1 more source

Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil mask

open access: yesAIP Advances, 2014
Two-dimensional (2D) atomic crystals and their hybrid structures have recently attracted much attention due to their potential applications. The fabrication of metallic contacts or nanostructures on 2D materials is very common and generally achieved by ...
Fu-Yu Shih   +7 more
doaj   +1 more source

Nanopillar and nanohole fabrication via mixed lithography

open access: yesMaterials Research Express, 2020
We report a fabrication method for the production of nanopillar (NP) or nanohole (NH) arrays together with a micrometer-sized structure within a single layer.
Seung Hee Baek   +7 more
doaj   +1 more source

A simple electron-beam lithography system

open access: yesUltramicroscopy, 2005
A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM).
Dorte Nørgaard Madsen   +2 more
openaire   +4 more sources

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