Results 41 to 50 of about 21,175 (304)
Peptide Sequencing With Single Acid Resolution Using a Sub‐Nanometer Diameter Pore
To sequence a single molecule of Aβ1−42–sodium dodecyl sulfate (SDS), the aggregate is forced through a sub‐nanopore 0.4 nm in diameter spanning a 4.0 nm thick membrane. The figure is a visual molecular dynamics (VMD) snapshot depicting the translocation of Aβ1−42–SDS through the pore; only the peptide, the SDS, the Na+ (yellow/green) and Cl− (cyan ...
Apurba Paul +8 more
wiley +1 more source
Strain‐Activated Photo‐Dehalogenation Unlocks Low‐Energy One and Two‐Photon 3D Microfabrication
5,14‐NMI‐Cz acts, conversely to its 7,10‐NMI‐Cz(7,10‐'dibromo‐2‐(2,6‐diisopropylphenyl)‐1H‐benzo[lmn]carbazolo[9,1‐bc][2,8]phenanthroline‐1,3(2H)‐dione) counterpart, as modular photoinitiator with panchromatic photoactivity, featuring a weak C–Br bond from geometric strain for efficient Type I & II initiation. These studies demonstrate applicability of
Kacper Piskorz +10 more
wiley +1 more source
Complementary Logic Driven by Dielectrophoretic Assembly of 2D Semiconductors
Scalable, parallel fabrication of complementary logic gates is demonstrated using electric‐field‐driven deterministic assembly of electrochemically exfoliated 2D n‐type MoS2 and p‐type WSe2 nanosheets. This strategy yields MoS2 and WSe2 transistors featuring average mobilities of 4.3 and 3.0 cm2 V−1 s−1, respectively, and on/off ratios of > 104 ...
Dongjoon Rhee +10 more
wiley +1 more source
Neurolithography: Lithography as an enabling technology in neurology and neuroscience
Modern lithography, which enables the fabrication of complex structures in biomedical devices with exceptional precision, is a potentially transformative force in the neural sciences.
Kevin Zhai
doaj +1 more source
Proximity Effect Aware Detailed Placement in Electron Beam Lithography
Proximity effect is one of the most tremendous consequences that produces unacceptable exposures during electron beam lithography (EBL), and thus distorting the layout pattern. In this paper, we propose the first work which considers the proximity effect
Chen Yuhang +4 more
doaj +1 more source
The incorporation of interface passivation structures in ultrathin Cu(In,Ga)Se2 based solar cells is shown. The fabrication used an industry scalable lithography technique—nanoimprint lithography (NIL)—for a 15 × 15 cm2 dielectric layer patterning ...
T. S. Lopes +23 more
doaj +1 more source
Two‐photon lithography (TPL) enables 3D magnetic nanostructures with unmatched freedom in geometry and material choice. Advances in voxel control, deposition, and functionalization open pathways to artificial spin ices, racetracks, microrobots, and a number of additional technological applications.
Joseph Askey +5 more
wiley +1 more source
A simple electron-beam lithography system
A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM).
Kristian, Mølhave +2 more
openaire +3 more sources
Well‐structured graphene hybrid architectures featuring spatially resolved fluorescent properties represent a promising but so‐far elusive synthetic target. A robust and straightforward method for fabricating well‐organized graphene‐dye hybrid nanoassemblies through a combination of reductive patterning and conventional click chemistry is presented ...
Sabrin Al‐Fogra +12 more
wiley +1 more source
Dielectric metasurfaces are a class of flat‐optical elements that provide new ways to manipulate light. Irrespective of the underlying operation principle, the realization of such nanometer‐sized structures requires a high fabrication accuracy, e.g., to ...
Giulia Prone +8 more
doaj +1 more source

