Results 71 to 80 of about 81,341 (318)

Soft and Stiff 3D Microstructures by Step‐Growth Photopolymerization Using a Single Photoresin and Multi‐Photon Laser Printing

open access: yesAdvanced Functional Materials, EarlyView.
An additive and initiator‐free photoresin based on a prepolymer decorated with photoreactive step‐growth units as crosslinkers allows for the fabrication of 3D microstructures with strongly disparate mechanical properties ranging from stiff to soft. Abstract Manufacturing three‐dimensional (3D) microstructures with multi‐material properties via two ...
Tugce Nur Eren   +7 more
wiley   +1 more source

Proximity Effect Aware Detailed Placement in Electron Beam Lithography

open access: yesMATEC Web of Conferences, 2018
Proximity effect is one of the most tremendous consequences that produces unacceptable exposures during electron beam lithography (EBL), and thus distorting the layout pattern. In this paper, we propose the first work which considers the proximity effect
Chen Yuhang   +4 more
doaj   +1 more source

Modeling approaches for electron beam lithography

open access: yesJournal of Physics: Conference Series, 2018
In this paper, a study based on the mathematical modelling, applying different process simulation tools (CASINO, TREM, SELID) for characterization of PMMA resist and for the improvement of the resolution concerning the critical dimensions of nano-patterning by electron beam lithography (EBL) is presented.
Koleva E.   +5 more
openaire   +3 more sources

Two-dimensional structures of ferroelectric domain inversion in LiNbO3 by direct electron beam lithography

open access: yes, 2003
We report on the fabrication of domain-reversed structures in LiNbO3 by means of direct electron beam lithography at room temperature without any static bias.
C. H. Kang   +8 more
core   +1 more source

Reversible writing of high-mobility and high-carrier-density doping patterns in two-dimensional van der Waals heterostructures [PDF]

open access: yes, 2020
A key feature of two-dimensional materials is that the sign and concentration of their carriers can be externally controlled with techniques such as electrostatic gating.
Crommie, MF   +10 more
core  

Versatile Green Transfer of Magnetoelectronics with Loss‐Free Performance and High Adhesion for Interactive Electronics

open access: yesAdvanced Functional Materials, EarlyView.
An environmentally friendly transfer printing method of nm‐thick giant magnetoresistive (GMR) sensors is demonstrated. This method, relying on water and biocompatible polyvinyl alcohol (PVA) polymer without the need of complex treatments, allows transferring thin films to a wide range of biological, organic, and inorganic substrates.
Olha Bezsmertna   +7 more
wiley   +1 more source

Design and fabrication of densely integrated silicon quantum dots using a VLSI compatible hydrogen silsesquioxane electron beam lithography process

open access: yes, 2012
Hydrogen silsesquioxane (HSQ) is a high resolution negative-tone electron beam resist allowing for direct transfer of nanostructures into silicon-on-insulator.
A.J. Ferguson   +21 more
core   +1 more source

Quantum shot noise in mesoscopic superconductor-semiconductor heterostructures [PDF]

open access: yes, 2004
Shot noise in a mesoscopic electrical conductor have become one of the most attentiondrawing subject over the last decade. This is because the shot-noise measurements provide a powerful tool to study charge transport in mesoscopic systems [1].
Choi, Bong-Ryoul Peter
core   +1 more source

Deterministic Writing of Field‐Free and Unipolar Spin‐Transfer Torque Magnetic Random‐Access Memory

open access: yesAdvanced Functional Materials, EarlyView.
Deterministic unipolar‐switching STT‐MRAM with field‐free operation is experimentally demonstrated. The device features a compact 4F2 cell architecture using a diode as the access device and a single magnetic tunneling junction. Unlike conventional bipolar switching STT‐MRAM requiring a three‐terminal access transistor in the array, this design offers ...
Ming‐Chun Hong   +22 more
wiley   +1 more source

Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale [PDF]

open access: yes, 2010
Exploring the resolution limit of electron-beam lithography is of great interest both scientifically and technologically. However, when electron-beam lithography approaches its resolution limit, imaging and metrology of the fabricated structures by using
Berggren, Karl K.   +5 more
core   +1 more source

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