Results 81 to 90 of about 21,175 (304)

Review of Directed Self-Assembly Material, Processing, and Application in Advanced Lithography and Patterning

Micromachines
Directed self-assembly (DSA) lithography, a cutting-edge technology based on the self-assembly of block copolymers (BCPs), has received significant attention in recent years.
Xiuyan Cheng, Di Liang, Miao Jiang, Yufei Sha, Xiaonan Liu, Jinlai Liu, Qingchen Cao, Jiangliu Shi   +7 more
doaj   +1 more source

Fabrication of a Highly NO₂-Sensitive Gas Sensor Based on a Defective ZnO Nanofilm and Using Electron Beam Lithography. [PDF]

Micromachines (Basel), 2023
Feng Z, Giubertoni D, Cian A, Valt M, Ardit M, Pedrielli A, Vanzetti L, Fabbri B, Guidi V, Gaiardo A.   +9 more
europepmc   +1 more source

Recomposable Layered Metasurfaces for Wavelength‐Multiplexed Optical Encryption via Modular Diffractive Deep Neural Networks

Advanced Functional Materials, EarlyView.
Modular diffractive deep neural network metasurfaces encode and reconstruct holograms across layer combinations and wavelengths, enabling secure, multifunctional operation. Each layer acts independently yet composes jointly, yielding up to m(2N −1) channels for m wavelengths and N layers.
Cherry Park, Youngsun Jeon, Seokho Lee, Yeseul Kim, Junsuk Rho   +4 more
wiley   +1 more source

A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography. [PDF]

ACS Omega, 2023
Wang Y, Yuan J, Chen J, Zeng Y, Yu T, Guo X, Wang S, Yang G, Li Y.   +8 more
europepmc   +1 more source

Some limitations on electron beam lithography [PDF]

, 1979
A. V. Crewe
openalex   +1 more source

Chiral Nanohoops as an Efficient Spin Polarization System

Advanced Functional Materials, EarlyView.
Chiral conjugated nanohoops with a central dibenzopentalene unit exhibit 90% spin polarization at low voltage and high conductivity. These properties make them ideal components in molecular spintronics applications. Abstract A central challenge in molecular spintronics is to achieve a high spin polarization at low operating voltages and ambient ...
Anu Gupta, Philipp Seitz, Mathias Hermann, Birgit Esser, Ron Naaman   +4 more
wiley   +1 more source

Analysis and applications of a heralded electron source

New Journal of Physics
We analytically describe the noise properties of a heralded electron source made from a standard electron gun, a weak photonic coupler, a single photon counter, and an electron energy filter.
Stewart A Koppell, John W Simonaitis, Maurice A R Krielaart, William P Putnam, Karl K Berggren, Phillip D Keathley   +5 more
doaj   +1 more source

Influence of MeV H+ ion beam flux on cross-linking and blister formation in PMMA resist [PDF]

Maejo International Journal of Science and Technology, 2012
In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam.
Somrit Unai
doaj  

Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography. [PDF]

ACS Omega, 2023
Zhang S, Chen L, Gao J, Cui X, Cong X, Guo X, Hu R, Wang S, Chen J, Li Y, Yang G.   +10 more
europepmc   +1 more source

Dopant Driven Electron Beam Lithography [PDF]

, 2012
The scanning electron microscope (SEM) can be used for far more than just obtaining images. It has a long tradition of being used to directly manipulate a sample to create various surface structures. The scanning coils within the microscope can be utilized for directing the electron beam in a controlled manner rather than simply raster across the ...
openaire   +2 more sources