Results 271 to 280 of about 245,592 (331)

Focused electron beam induced deposition of rhodium containing composite nanostructures

, 2002
F. Cicoira, Ivo Utke, G. Jaenchen, P. Hoffmann, B. Dwir, Klaus Leifer, E. Kapon, D. Laub, P. A. Buffat, N. Xanthopoulos, H. J. Mathieu   +10 more
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Water-Assisted Process for Purification of Ruthenium Nanomaterial Fabricated by Electron Beam Induced Deposition

ACS Applied Nano Materials, 2020
The purity of nanomaterials fabricated by focused electron beam induced deposition (FEBID) is often not high enough for the desired application.
Markus Rohdenburg, R. Winkler, D. Kuhness, H. Plank, P. Swiderek   +4 more
semanticscholar   +1 more source

Electron-Induced Reactions of Ru(CO)4I2: Gas Phase, Surface, and Electron Beam-Induced Deposition

, 2020
The reactions of low energy (
R. M. Thorman, P. A. Jensen, Jo-Chi Yu, S. Matsuda, L. McElwee‐White, O. Ingólfsson, D. Fairbrother   +6 more
semanticscholar   +1 more source

Electron Beam Induced Film Deposition

Microphysics of Surfaces, Beams and Adsorbates, 1989
A novel method for directly applying material on only a very small area of a substrate (selective deposition) at low temperature has been reported by applying a gas-substrate interface1-7). When an electron beam is irradiated onto a substrate in electron beam Chemical Vapor Deposition (CVD), source gas molecules, adsorbed on a substrate, are ...
Shinji Matsui, Toshinari Ichihashi, Masanobu Mito   +2 more
openaire   +1 more source

Nanoscale lithography via electron beam induced deposition

Nanotechnology, 2008
We demonstrate the resolution and characteristics of a nanolithography process utilizing electron beam induced deposition (EBID) of W(CO)(6) and C(10)H(8) to define the imaging and masking layers. Lines and dot matrices were defined/written with various electron beam doses onto both polymethylmethacrylate (PMMA) coated silicon substrates (PMMA-Si) and ...
Yingfeng, Guan, Jason D, Fowlkes, Scott T, Retterer, Michael L, Simpson, Philip D, Rack   +4 more
openaire   +2 more sources

Electron beam-induced deposition of tungsten

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1994
Tungsten films were deposited by decomposing films of frozen tungsten hexafluoride (WF6) with an electron beam and then warming the substrate to remove unreacted WF6. Deposition rates increase with increasing beam intensity.
David A. Bell, John L. Falconer, Zhiming Lü, Carol M. McConica   +3 more
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Electron beam induced deposited etch masks

Microelectronic Engineering, 2009
In this paper we present a method based on electron beam induced deposition (EBID) to fabricate small electrodes with sub-10nm gaps as required e.g. in single electron devices. EBID provides nanometer resolution combined with a relatively high throughput and reproducibility. Some known drawbacks of EBID are the limited choice of materials, inclusion of
C.Th.H. Heerkens, M.J. Kamerbeek, W.F. van Dorp, C.W. Hagen, J. Hoekstra   +4 more
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High-resolution electron-beam induced deposition

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1988
A finely focused electron beam is used as a source of energy to decompose molecules, e.g., organometallics or hydrocarbons, adsorbed on the surface of a substrate. Films deposited by these means can be used as etch mask for reactive ion etching, as an absorber for various types of radiation, or directly as part of a device structure.
H. W. P. Koops, R. Weiel, D. P. Kern, T. H. Baum   +3 more
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