Results 111 to 120 of about 81,648 (296)

Clean Up Behind You ‐ Novel Patterning Approach for Solid Immersion Lenses

Advanced Functional Materials, EarlyView.
A focused ion beam (FIB) milling strategy enables rapid fabrication of solid immersion lenses (SILs) with smooth, debris‐free surfaces eliminating the need for post‐processing. The optimized pattern improves efficiency and surface quality. SILs containing NV centers are also investigated, confirming the technique's suitability for quantum and photonic ...
Aleksei Tsarapkin, Stefan Facsko, Wentao Zhang, Anna Mogilatenko, Kilian Unterguggenberger, Bailiang Li, Cem Güney Torun, Gerhard Hobler, Tommaso Pregnolato, Tim Schröder, Katja Höflich   +10 more
wiley   +1 more source

Raster-Atomic force nanolithography: New insights towards the fabrication of 3D nanostructures on PMMA and Silicon Nitride

Nano Trends
The rapid advancement of nanoscience has driven significant interest in manipulating materials at the nanoscale, a capability critical to diverse High-tech fields.
Lorenzo Vincenti, Paolo Pellegrino, Isabella Farella, Mariafrancesca Cascione, Valeria De Matteis, Fabio Quaranta, Rosaria Rinaldi   +6 more
doaj   +1 more source

Fabrication of a Highly NO₂-Sensitive Gas Sensor Based on a Defective ZnO Nanofilm and Using Electron Beam Lithography. [PDF]

Micromachines (Basel), 2023
Feng Z, Giubertoni D, Cian A, Valt M, Ardit M, Pedrielli A, Vanzetti L, Fabbri B, Guidi V, Gaiardo A.   +9 more
europepmc   +1 more source

Contacting individual Fe(110) dots in a single electron-beam lithography step

, 2009
We report on a new approach, entirely based on electron-beam lithography technique, to contact electrically, in a four-probe scheme, single nanostructures obtained by self-assembly. In our procedure, nanostructures of interest are localised and contacted
Cheynis, Fabien, Fournier, Thierry, Fruchart, Olivier, Haas, Helge, Ranno, Laurent, Toussaint, Jean-Christophe, Wernsdorfer, Wolfgang   +6 more
core   +3 more sources

Atomic Layer Deposition in Transistors and Monolithic 3D Integration

Advanced Functional Materials, EarlyView.
Transistors are fundamental building blocks of modern electronics. This review summarizes recent progress in atomic layer deposition (ALD) for the synthesis of two‐dimensional (2D) metal oxides and transition‐metal dichalcogenides (TMDCs), with particular emphasis on their enabling role in monolithic three‐dimensional (M3D) integration for next ...
Yue Liu, Taoyu Zou, Cheng‐Yan Xu, Liang Zhen, Yang Li, Yong‐Young Noh   +5 more
wiley   +1 more source

A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography. [PDF]

ACS Omega, 2023
Wang Y, Yuan J, Chen J, Zeng Y, Yu T, Guo X, Wang S, Yang G, Li Y.   +8 more
europepmc   +1 more source

Dopant Driven Electron Beam Lithography [PDF]

, 2012
The scanning electron microscope (SEM) can be used for far more than just obtaining images. It has a long tradition of being used to directly manipulate a sample to create various surface structures. The scanning coils within the microscope can be utilized for directing the electron beam in a controlled manner rather than simply raster across the ...
openaire   +2 more sources

Thermal Processing Creates Water‐Stable PEDOT:PSS Films for Bioelectronics

Advanced Materials, Volume 37, Issue 13, April 2, 2025.
Instead of using chemical cross–linkers, it is shown that PEDOT:PSS thin films for bioelectronics become water‐stable after a simple heat treatment. The heat treatment is compatible with a range of rigid and elastomeric substrates and films are stable in vivo for >20 days.
Siddharth Doshi, Margaux O. A. Forner, Pingyu Wang, Salim El Hadwe, Amy T. Jin, Gerwin Dijk, Kenneth Brinson, Juhwan Lim, Antonio Dominguez‐Alfaro, Carina Yi Jing Lim, Alberto Salleo, Damiano G. Barone, Guosong Hong, Mark L. Brongersma, Nicholas A. Melosh, George G. Malliaras, Scott T. Keene   +16 more
wiley   +1 more source

Analysis and applications of a heralded electron source

New Journal of Physics
We analytically describe the noise properties of a heralded electron source made from a standard electron gun, a weak photonic coupler, a single photon counter, and an electron energy filter.
Stewart A Koppell, John W Simonaitis, Maurice A R Krielaart, William P Putnam, Karl K Berggren, Phillip D Keathley   +5 more
doaj   +1 more source

Review of Directed Self-Assembly Material, Processing, and Application in Advanced Lithography and Patterning

Micromachines
Directed self-assembly (DSA) lithography, a cutting-edge technology based on the self-assembly of block copolymers (BCPs), has received significant attention in recent years.
Xiuyan Cheng, Di Liang, Miao Jiang, Yufei Sha, Xiaonan Liu, Jinlai Liu, Qingchen Cao, Jiangliu Shi   +7 more
doaj   +1 more source