Results 11 to 20 of about 150,683 (215)
Frontiers in Physics, 2022 Helicon plasma sources produce high-density discharges without the need of electrodes in direct contact with the plasma, which is thought to provide them with long operational lifetimes.
Juan I. Del Valle +4 more
doaj +1 more source
The growth of Nd:CaWO4 single crystals [PDF]
Journal of the Serbian Chemical Society, 2003 CaWO4 doped with 0.8 % at. Nd (Nd:CaWO4) single crystals were grown from the melt in air by the Czochralski technique. The critical diameter dc = 1.0 cm and the critical rate of rotation ωc = 30 rpm were calculated from hydrodynamic equations for ...
Golubović Aleksandar V. +4 more
doaj +1 more source
Atomic Layer Etching: Rethinking the Art of Etch [PDF]
The Journal of Physical Chemistry Letters, 2018 Atomic layer etching (ALE) is the most advanced etching technique in production today. In this Perspective, we describe ALE in comparison to long-standing conventional etching techniques, relating it to the underlying principles behind the ancient art of etching.
Keren J. Kanarik +2 more
openaire +2 more sources
naitsok/ultimate-psi-etching: Ultimate PSi Etching 2.0.2.5
, 2022 A NI LabVIEW-based software for electrochemical anodization of Si wafers. Features: Preistalled etching cells. Three different etching regimes: constant current, pulsed etching, and non-linear current. Preinstalled wafer liftoff pulses.
Konstantin Tamarov
core +1 more source
Rapid fabrication of superhydrophobic high-silicon aluminum alloy surfaces with corrosion resistance
Results in Physics, 2019 High-silicon aluminum alloy (high-Si Al alloy) usually used as the electronic packaging materials on the radar on ships have a susceptibility to corrosion, reducing the life of radar on ships. How to improve the corrosion-resistance ability of high-Si Al
Yankui Sun +7 more
doaj +1 more source
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma [PDF]
Materials Research, 2014 Plasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood.
Carlos Eduardo Farias +6 more
doaj +2 more sources
Dry etching and sputtering [PDF]
, 2003 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W. +3 more
core +1 more source
Искусство Евразии, 2023 Статья посвящена одному из примеров научно-исследовательской работы Приморской государственной картинной галереи с предметами музейных коллекций — атрибуции гравированного «Портрета Д.А. Ровинского», выполненного В.Е. Маковским.
Визиряка, А.С.
doaj +1 more source
ICP Etching of Silicon for Micro and Nanoscale Devices [PDF]
, 2010 The physical structuring of silicon is one of the cornerstones of modern microelectronics and integrated circuits. Typical structuring of silicon requires generating a plasma to chemically or physically etch silicon.
Henry, Michael David
core +1 more source
Robotic Sponge and Watercolor Painting Based on Image-Processing and Contour-Filling Algorithms
Actuators, 2022 In this paper, the implementation of a robotic painting system using a sponge and the watercolor painting technique is presented. A collection of tools for calibration and sponge support operations was designed and built.
Lorenzo Scalera +4 more
doaj +1 more source