Results 31 to 40 of about 336,560 (297)
Orientation Dependence of a Dislocation Etch for Zinc [PDF]
, 1966 The dislocation etch for (101-[bar]0] surfaces of zinc reported by Brandt, Adams, and Vreeland have been further explored. Additional surface orientations have been found where dislocation etching takes place.
Adams, K. H. +2 more
core +2 more sources
Manipulating etch selectivities in XeF2 vapour etching [PDF]
, 2021 The vapour etching of silicon sacrificial layers is often a critical process in the fabrication of micro/nanosystems. This method has a number of attractive features, in particular, high etch rates of sacrificial silicon layers and good selectivities associated with photoresist, SiO₂, stoichiometric Si₃N₄ and a number of regularly used metal films ...
Rondé, Markus +2 more
openaire +1 more source
Plasma Processing of Large Curved Surfaces for SRF Cavity Modification [PDF]
, 2014 Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which ...
Im, Do +5 more
core +4 more sources
Resistance abilities of （100）/（111）-faceted diamond films against oxygen plasma etching
Journal of Aeronautical Materials, 2019 The resistance abilities of (100) and (111)-faceted diamond films against oxygen plasma, 100 μm as film thickness, were investigated by the microwave power chemical vapor deposition (MPCVD) technique.
SUN Qi +6 more
doaj +1 more source
Atomic process of oxidative etching in monolayer molybdenum disulfide
, 2017 The microscopic process of oxidative etching of two-dimensional molybdenum disulfide (2D MoS2) at an atomic scale is investigated using a correlative TEM-etching study.
Jin, Chuanhong +7 more
core +1 more source
Frontiers in Chemistry, 2019 Metal-assisted catalytic etching (MACE) using Ag nanoparticles as catalysts and H2O2 as oxidant has been performed on single-crystal Si wafers, single-crystal electronics grade Si powders, and polycrystalline metallurgical grade Si powders.
Kurt W. Kolasinski +3 more
doaj +1 more source
Metal etching composition [PDF]
, 1991 The present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol, and an oxidizing agent.
Foster, Robert E. +2 more
core +1 more source
Plasma removal of Parylene C [PDF]
, 2008 Parylene C, an emerging material in microelectromechanical systems, is of particular interest in biomedical and lab-on-a-chip applications where stable, chemically inert surfaces are desired.
Li, Po-Ying, Meng, Ellis, Tai, Yu-Chong
core +1 more source
Advanced Engineering Materials, EarlyView.Predicting extreme defects in additive manufacturing remains a key challenge limiting its structural reliability. This study proposes a statistical framework that integrates Extreme Value Theory with advanced process indicators to explore defect–process relationships and improve the estimation of critical defect sizes. The approach provides a basis for
Muhammad Muteeb Butt +8 more
wiley +1 more source
Iodide Salt Surface Etching Reduces Energy Loss in CdTe Nanocrystal Solar Cells
NanomaterialsCdTe nanocrystals (NCs) have emerged as a promising active layer for efficient thin-film solar cells due to their outstanding optical properties and simple processing techniques.
Jielin Huang +6 more
doaj +1 more source