Results 241 to 250 of about 189,870 (274)

Lithography and Reactive Ion Etching in Microfabrication

1995
The term “microfabrication” has been used to denote the technology for manufacturing integrated micro-circuits and microsystems. During the last 30 years the advanced micro-electronics could not maintain its place without microfabrication technology and this is also the case for the present and for the future.
Peter Hudek, Ivo W. Rangelow
openaire   +2 more sources

Microfabrication of Thermoelectric Hydrogen Sensor Using KOH Solution Etching

Key Engineering Materials, 2006
Micromachined sensors are a new generation of sensor technology combining existing integrated circuit fabrication technology with novel deposition and etching processing. In the viewpoint of low-power operation, high sensitivity and fast response speed of thermoelectric hydrogen sensor (THS), we prepared the micromachined thermoelectric hydrogen sensor
Norimitsu Murayama, Woosuck Shin, Kazuki Tajima, Yeong Soo Choi, Ichiro Matsubara, Noriya Izu   +5 more
openaire   +2 more sources

Gas-assisted focused ion beam etching for microfabrication and inspection

Microelectronic Engineering, 1990
Abstract A focused ion beam system has been applied to the etching of semiconductor materials. The etching can be carried out by sputtering with the ion beam alone or by a combination of the ion beam and a reactive gas, in this case chlorine. The flexibility of the system allows beam currents from 5.10 -7 to 5.10 -12 A to be used, with a typical ...
J. R. A. Cleaver, R. J. Young, Haroon Ahmed   +2 more
openaire   +2 more sources

Microfabricated Deep-Etched Structures for ICF and Equation-of-State Targets

Fusion Science and Technology, 2009
Microfabrication techniques, derived from the semiconductor industry, can be used to make a variety of useful mechanical components for targets.
Tim Graff, Julie Hamilton, Susan Ratti, Jim Trevino, Cheryl Stockton, Christopher D. Harvey, Robin Miles, Jackie Crawford   +7 more
openaire   +2 more sources

Direct writing for three-dimensional microfabrication using synchrotron radiation etching

Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308), 2001
This paper presents rapid three-dimensional microfabrication technologies for PTFE by direct writing with the TIEGA process, a LIGA-like process which replaces hard X-ray lithography with synchrotron radiation (SR) direct photo-etching. The etching rates of this process are of the order of 6-100 /spl mu/m/min, depending on the photon flux of the SR ...
Susumu Sugiyama, Hiroshi Ueno, N. Nishi, M. Fukagawa, Takanori Katoh   +4 more
openaire   +2 more sources

Microfabrication of LiNbO₃ by Reactive Ion-Beam Etching

Japanese Journal of Applied Physics, 1980
The ratio of the etching rate of LiNbO3 to AZ1350 at normal incidence for CHF3 ion is about 5 times as large as that for Ar ion. This high ratio is utilized to fabricate LiNbO3 blazed gratings and also LiNbO3 guided wave optical elements such as grating couplers to demonstrate that reactive ion-beam etching is a very useful microfabrication ...
Toshiya Yamato, Susumu Namba, Shinji Matsui, Hiroaki Aritome   +3 more
openaire   +2 more sources

Silicon Microfabrication: Laser Ablation vs. Inductively Coupled Plasma (ICP) Etch [PDF]

MRS Proceedings, 2001
AbstractMechanical prototypes of a silicon interposer device, having high-aspect ratio straight walls, were required for experiments to qualify various packaging assembly options. The ideal solution would yield expendable, quickly made, and relatively inexpensive replica parts.This need led to the investigation of micromachining of silicon via laser ...
Joseph W. Soucy, Thomas F. Marinis, Megan M. Owens   +2 more
openaire   +1 more source

Microfabrication of Magnetic Tunnel Junctions Using CH$_{3}$OH Etching

IEEE Transactions on Magnetics, 2007
The 100-nm-scale CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) were fabricated using a CH3OH etching process. These MTJs have steep side walls and show clear MR loops. The distributions of magnetic properties of CH3OH etched MTJs were smaller than those of conventional Ar ion etched ...
Akio Fukushima, T. Osada, H. Maehara, Shinji Yuasa, Y. Otani, K. Ando, Hitoshi Kubota   +6 more
openaire   +2 more sources

New microfabrication technique on a submicrometer scale by synchrotron radiation-excited etching

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1995
Synchrotron radiation-excited etching of Si, SiC, and WO3 has been investigated using a noncontact mask with a pattern of submicrometer scale. The blank pattern of the mask was replicated on the etched surface, and highly area-selective etching was realized at the size of ∼0.4 μm.
Kazuhiro Kaneda, Shigeo Suzuki, Osamu Kitamura, Shingo Terakado, Masayoshi Ogura, Masao Nakao, Kenichiro Tanaka, Takashi Goto   +7 more
openaire   +2 more sources

Wafer-scale silicon microfabrication technology toward realization of low-cost sub-THz waveguide devices

Journal of Micromechanics and Microengineering
This paper presents a wafer-scale silicon microfabrication technology for the sub-terahertz (sub-THz) waveguide device mass production. Based on the effective scheme, a WR-5 (140–220 GHz) straight rectangular waveguide and a WR-2.8 (260–400 GHz ...
Xinghai Zhao, Peng Wu, Fei Liu
semanticscholar   +1 more source