Extreme-ultraviolet refractive optics [PDF]
Nature, 2018 8 pages, 4 ...
L Drescher +2 more
exaly +5 more sources
Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity [PDF]
Molecules, 2023 Predicting photolithography performance in silico for a given materials combination is essential for developing better patterning processes. However, it is still an extremely daunting task because of the entangled chemistry with multiple reactions among ...
Ji Young Park +10 more
doaj +2 more sources
Material-specific high-resolution table-top extreme ultraviolet microscopy [PDF]
Light: Science & Applications, 2022 The combination of a state-of-the-art high harmonic source, structured EUV light, and advanced ptychography reconstruction algorithms enables material-specific high-contrast and high-resolution imaging on the nanoscale.
Wilhelm Eschen +11 more
doaj +2 more sources
Epsilon-near-zero nonlinearity enhancement in the extreme ultraviolet [PDF]
Light: Science & ApplicationsMaterials with a vanishing dielectric constant provide an ideal platform for achieving plasmon-enhanced light-matter interactions and are widely employed in various cutting-edge nonlinear photonics applications.
Carino Ferrante +11 more
doaj +2 more sources
Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study [PDF]
Micromachines, 2021 Although extreme ultraviolet lithography (EUVL) has potential to enable 5-nm half-pitch resolution in semiconductor manufacturing, it faces a number of persistent challenges.
Sang-Kon Kim
doaj +2 more sources
Extreme Ultraviolet Lighting Using Carbon Nanotube-Based Cold Cathode Electron Beam [PDF]
Nanomaterials, 2022 Laser-based plasma studies that apply photons to extreme ultraviolet (EUV) generation are actively being conducted, and studies by direct electron irradiation on Sn for EUV lighting have rarely been attempted.
Sung Tae Yoo, Kyu Chang Park
doaj +2 more sources
Crystalline Phase-Dependent Emissivity of MoSi2 Nanomembranes for Extreme Ultraviolet Pellicle Applications [PDF]
NanomaterialsExtreme ultraviolet (EUV) pellicles must withstand intense thermal stress during exposure due to their limited heat dissipation, which results from their ultrathin geometry and the vacuum environment within EUV scanners.
Haneul Kim +4 more
doaj +2 more sources
Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy [PDF]
Sensors, 2020 Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions.
Mabel Ruiz-Lopez +7 more
doaj +2 more sources
Ti:Sa Crystal Geometry Variation vs. Final Amplifiers of CPA Laser Systems Parameters
Crystals, 2022 In this paper, the different Ti:Sapphire crystal configurations of the final amplifiers, depending on the Chirped Pulse Amplification laser system parameters, such as the repetition rates and pulse energy, are discussed.
Vladimir Chvykov
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Ti:Sa Crystals in Ultra-High Peak and Average Power Laser Systems
Crystals, 2021 In this paper, Ti:Sa amplifiers with crystals of the different geometries are discussed. Benefits of using this active medium for a thin disk (TD) and slab amplifiers are evaluated numerically and tested experimentally.
Vladimir Chvykov
doaj +1 more source