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Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams. [PDF]
Pelekanidis A +3 more
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Photometric evolution unveils debris generation process of rocket bodies in geostationary transfer orbits. [PDF]
Qiao Q, Ping Y.
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Laser excitation of the 1S-2S transition in singly-ionized helium. [PDF]
Gründeman EL +8 more
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Ultra-broadband ptychography for dispersive samples. [PDF]
Lin H +9 more
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A progressive wafer scale approach for Sub-10 nm nanogap structures. [PDF]
Cha J, Lee G, Lee D, Kim DS, Kim S.
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Aspheric grating for extreme ultraviolet astronomy
Applied Optics, 1978A family of plane curves is developed which can diffract incident parallel rays to a point focus. These curves, termed diffractoidal curves, are rotated around an axis to produce surfaces of revolution correspondingly termed diffractoids, whose imaging properties for sources at infinity are studied by ray tracing in a few examples.
S O Kastner
exaly +3 more sources
SPIE Proceedings, 1994
This paper briefly reviews the more traditional materials that have been used for Soft X-Ray (SXR) and Extreme Ultraviolet (EUV) filters and then discusses several applications where new multilayer combinations of materials are being employed. The new applications include projection lithography and the detection of Energetic Neutral Atom (ENA ...
Forbes R Powell +2 more
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This paper briefly reviews the more traditional materials that have been used for Soft X-Ray (SXR) and Extreme Ultraviolet (EUV) filters and then discusses several applications where new multilayer combinations of materials are being employed. The new applications include projection lithography and the detection of Energetic Neutral Atom (ENA ...
Forbes R Powell +2 more
exaly +2 more sources
The Design Of An Echelle Spectrometer For Diffuse Extreme Ultraviolet/Far Ultraviolet Astronomy
Proceedings of SPIE, 1986The novel, relatively high-resolution nebular spectrometer design presented incorporates a mechanical precollimator with an objective echelle grating that proceeds to a cross-dispensing Wadsworth configuration; the minimum feasible number of reflections is employed in order to maximize EUV sensitivity. The configuration, which is noted to be capable of
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