An ultra energy-efficient hardware platform for neuromorphic computing enabled by 2D-TMD tunnel-FETs. [PDF]
Pal A +6 more
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Highly Selective Isotropic Etching of Si to SiGe Using CF<sub>4</sub>/O<sub>2</sub>/N<sub>2</sub> Plasma for Advanced GAA Nanosheet Transistor. [PDF]
Li J, Sun X, Huang Z, Zhang DW.
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A Review of Reliability in Gate-All-Around Nanosheet Devices. [PDF]
Wang M.
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Anisotropic exchange interaction of two hole-spin qubits. [PDF]
Geyer S +9 more
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CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology. [PDF]
Radamson HH +30 more
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Two-Dimensional Materials, the Ultimate Solution for Future Electronics and Very-Large-Scale Integrated Circuits. [PDF]
Qin L, Wang L.
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New structure transistors for advanced technology node CMOS ICs. [PDF]
Zhang Q, Zhang Y, Luo Y, Yin H.
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Recent progress on field-effect transistor-based biosensors: device perspective. [PDF]
Smaani B +7 more
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High-density via RRAM cell with multi-level setting by current compliance circuits. [PDF]
Hsieh YC +6 more
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