Results 151 to 160 of about 350,088 (334)

Pioneering Carboxylated Zirconium Oxo Cluster Resist for Precision Nanoscale Patterning

open access: yesAdvanced Materials Technologies, EarlyView.
This study presents zirconium oxo cluster bonded with benzoic acid (Zr‐OCB) as organic–inorganic hybrid photoresist for electron beam lithography (EBL). High resolution patterns with a feature size of sub‐40 nm, a sensitivity of 1905 µC cm−2, a low line edge roughness of 3.1 nm, and excellent solution stability for up to six months are demonstrated for
Seong‐Ji Ha   +6 more
wiley   +1 more source

MODERN APPROACHES TO DECISION-MAKING BASED ON FUZZY SETS [PDF]

open access: diamond, 2019
Ghazi Shakah   +1 more
openalex   +1 more source

Programmable Dimensional Lithography with Digital Micromirror Devices for Multifunctional Microarchitectures

open access: yesAdvanced Materials Technologies, EarlyView.
This review explores recent advances in digital micromirror device (DMD)‐based lithography, focusing on its programmable light modulation, multi‐material compatibility, and dimensional patterning strategies. It highlights innovations from optical system design to materials integration and multifunctional applications, positioning DMD lithography as a ...
Yubin Lee   +5 more
wiley   +1 more source

Molecular Layer Deposited Aluminum‐Based Hybrid Resist for High‐Resolution Nanolithography and Direct Ultra‐High Aspect Ratio Pattern Transfer

open access: yesAdvanced Materials Technologies, EarlyView.
This study demonstrates an aluminum‐based hybrid photoresist synthesized via molecular layer deposition (MLD) using trimethylaluminum and hydroquinone. The resist achieves sub‐20 nm resolution and virtually infinite silicon etch selectivity, enabling 40 nm‐wide, micrometer‐tall nanostructures.
Won‐Il Lee   +8 more
wiley   +1 more source

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