Results 211 to 220 of about 10,735 (250)
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Insulating gallium oxide layer produced by thermal oxidation of gallium‐polar GaN
physica status solidi c, 2014AbstractThe benefits of dry oxidation of n ‐GaN for the fabrication of metal‐oxide‐semiconductor structures are reported. GaN thin films grown on sapphire by MOCVD were thermally oxidized for 30, 45 and 60 minutes in a pure oxygen atmosphere at 850 °C to produce thin, smooth GaOx layers.
T. Hossain +10 more
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Physical Review, 1934
The spectrum of gallium oxide has been photographed with a 21-foot grating. A band system lying in the region 3800-4200A has been identified as a $^{2}\ensuremath{\Sigma}\ensuremath{\rightarrow}^{2}\ensuremath{\Sigma}$ transition and a vibrational quantum analysis is given.
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The spectrum of gallium oxide has been photographed with a 21-foot grating. A band system lying in the region 3800-4200A has been identified as a $^{2}\ensuremath{\Sigma}\ensuremath{\rightarrow}^{2}\ensuremath{\Sigma}$ transition and a vibrational quantum analysis is given.
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Hydrogen Chemisorption on Gallium Oxide Polymorphs
Langmuir, 2004The chemisorption of H(2) over a set of gallia polymorphs (alpha-, beta-, and gamma-Ga(2)O(3)) has been studied by temperature-programmed adsorption equilibrium and desorption (TPA and TPD, respectively) experiments, using in situ transmission infrared spectroscopy.
Sebastián E, Collins +2 more
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Chemischer Informationsdienst, 1981
AbstractMit Hilfe der Raman‐Streuung und von ternären Phasendiagrammen wird für die Reaktionen zwischen Oxid und Substrat in wännebehandelten anodischen Filmen auf GaSb und GaAs ein fundamentales Schema identifiziert.
G. P. SCHWARTZ +4 more
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AbstractMit Hilfe der Raman‐Streuung und von ternären Phasendiagrammen wird für die Reaktionen zwischen Oxid und Substrat in wännebehandelten anodischen Filmen auf GaSb und GaAs ein fundamentales Schema identifiziert.
G. P. SCHWARTZ +4 more
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Gallium oxide buffer layers for gallium nitride epitaxy
2013OPTICA APPLICATA; 01/2013; ISSN 1429 ...
Korbutowicz, Ryszard +4 more
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Semiconductors, 2019
The influence of the substrate material on the properties of gallium-oxide films formed on sapphire and n(p)-GaAs semiconductor wafers by high-frequency magnetron-assisted deposition is studied. The films grown on insulating substrates, as a rule, are of the n type and possess a high resistance.
V. M. Kalygina +3 more
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The influence of the substrate material on the properties of gallium-oxide films formed on sapphire and n(p)-GaAs semiconductor wafers by high-frequency magnetron-assisted deposition is studied. The films grown on insulating substrates, as a rule, are of the n type and possess a high resistance.
V. M. Kalygina +3 more
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Thermal oxidation of gallium arsenide
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1989Here we present some results of transmission electron microscopy and secondary ion mass spectroscopy of thermally oxidized gallium arsenide with different types of dopants. At temperatures below 400 °C an amorphous oxide is formed. Oxidation at temperatures between 500 and 600 °C initially produces an epitaxial film of γ-Ga2O3. As the reaction proceeds,
Othon R. Monteiro, James W. Evans
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Physica Scripta
Abstract This study investigated the structural, optical, and electrical properties of a new gallium cerium oxide ternary film over gallium oxide and phase separated cerium gallium oxide films. Annealing in a nitrogen-oxygen-nitrogen ambient formed a stable single-phase structure.
Puteri Haslinda Megat Abdul Hedei +3 more
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Abstract This study investigated the structural, optical, and electrical properties of a new gallium cerium oxide ternary film over gallium oxide and phase separated cerium gallium oxide films. Annealing in a nitrogen-oxygen-nitrogen ambient formed a stable single-phase structure.
Puteri Haslinda Megat Abdul Hedei +3 more
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Gallium Oxide Film by Anodic Oxidization of Gallium
Japanese Journal of Applied Physics, 1977Norio Suzuki +4 more
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Phase Transformations in Gallium Oxide Layers
Technical Physics Letters, 2023Osipov A. V. +5 more
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