Results 131 to 140 of about 1,501,488 (203)
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The localisation of the discharge channel in a glow discharge
Proceedings of the Indian Academy of Sciences - Section A, 1957The localisation of the discharge channel under the conditions of a glow discharge in air, at different distances from the cathode and at various points in the cathode dark space for different voltages, has been studied by measuring the radial distribution of the light intensity in the discharge channel.
V. T. Chiplonkar +2 more
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Journal of the Optical Society of America, 1955
The characteristics of glow discharges in argon and other rare gases excited by an audio-frequency alternating potential and by a direct potential modulated with an audio-frequency signal are described. When the frequency of the alternating potential is of the same order of magnitude as the frequency of the spontaneous oscillations present in these ...
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The characteristics of glow discharges in argon and other rare gases excited by an audio-frequency alternating potential and by a direct potential modulated with an audio-frequency signal are described. When the frequency of the alternating potential is of the same order of magnitude as the frequency of the spontaneous oscillations present in these ...
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Journal of Electroanalytical Chemistry (1959), 1964
Abstract The methods and results of glow-discharge electrolysis have been reviewed and an attempt has been made to pick out the essential features of the process. It is interpreted as a form of electrolysis in which energy transfer as well as charge transfer is involved, and this serves to break up solvent molecules into reactive radicals which ...
A. Hickling, M.D. Ingram
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Abstract The methods and results of glow-discharge electrolysis have been reviewed and an attempt has been made to pick out the essential features of the process. It is interpreted as a form of electrolysis in which energy transfer as well as charge transfer is involved, and this serves to break up solvent molecules into reactive radicals which ...
A. Hickling, M.D. Ingram
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Progress in Surface Science, 1976
4. Arrival at Substrate A. Deposition rates and uniformity (i) Inert gas discharges (ii) Effect of residual gases (iii) Reactive sputtering (iv) Multi-element targets B. Substrate temperature C. Nucleation and growth (i) Nucleation (ii) Epitaxy (iii) Morphology (iv) Reactively sputtered film growth D.
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4. Arrival at Substrate A. Deposition rates and uniformity (i) Inert gas discharges (ii) Effect of residual gases (iii) Reactive sputtering (iv) Multi-element targets B. Substrate temperature C. Nucleation and growth (i) Nucleation (ii) Epitaxy (iii) Morphology (iv) Reactively sputtered film growth D.
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Contact Glow Discharge Electrolysis: A Novel Tool for Manifold Applications
Plasma chemistry and plasma processing, 2017S. K. Sen Gupta
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Talanta: The International Journal of Pure and Applied Analytical Chemistry, 2017
Jie Yu +6 more
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Jie Yu +6 more
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Talanta: The International Journal of Pure and Applied Analytical Chemistry, 2017
Jie Yu +7 more
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Jie Yu +7 more
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