Results 101 to 110 of about 276 (148)
Interatomic potentials for Zirconium Diboride and Hafnium Diboride
We report on the first interatomic potentials for Zirconium Diboride and Hafnium Diboride. The potentials are of the Tersoff form, and are obtained by fitting to a first-principles database of basic properties of elemental Zr, Hf, B, and the compounds ZrB2 and HfB2. Two variants of the Zr–B potentials have been obtained, and one for Hf–B.
Murray S Daw +2 more
exaly +3 more sources
Corrosion behaviour of hafnium diboride in aqueous solutions
A dense HfB(2) ceramic material was prepared by hot pressing in the presence of 2.5 wt.% Si(3)N(4), as a sintering aid. The microstructure consisted of a fine HfB2 matrix with refractory secondary phases (BN, HfO(2), Hf(C,N,O)) and Si, mainly located at the triple points.
C Monticelli, A Bellosi
exaly +4 more sources
Comparison of the Hafnium Diboride(0001) and Hafnium(0001) Surfaces
AbstractThe surface properties of the (0001) surfaces of single crystals of hafnium and hafnium diboride are compared with a boride film deposited on the Hf(0001) surface. The surfaces were characterized with X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED).
M. Belyansky +3 more
openaire +2 more sources
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Comparison of the surface chemical reactivity of hafnium diboride and hafnium
Inorganica Chimica Acta, 1999Abstract The surface chemistry of the Hf terminated hafnium diboride surface is compared with the surface chemistry of Hf metal. The HfB2 surface was prepared by growing an epitaxial film of HfB2 on top of a Hf(0001) single crystal substrate. Previous experiments demonstrated that the epitaxial film has the same surface properties as a HfB2(0001 ...
Michael Belyansky, Michael Trenary
exaly +2 more sources
Ceramics International, 2020
Abstract This study reports on the sintering and oxidation behaviors of Hafnium Diboride (HfB2) and Hafnium Carbide (HfC) based ultra-high temperature ceramic (UHTC) composites. Pure Hafnium Diboride, Hafnium Carbide, and HfB2-50 vol% HfC composite were consolidated using spark plasma sintering (SPS) without the use of sintering aids.
Catalina Young +2 more
exaly +2 more sources
Abstract This study reports on the sintering and oxidation behaviors of Hafnium Diboride (HfB2) and Hafnium Carbide (HfC) based ultra-high temperature ceramic (UHTC) composites. Pure Hafnium Diboride, Hafnium Carbide, and HfB2-50 vol% HfC composite were consolidated using spark plasma sintering (SPS) without the use of sintering aids.
Catalina Young +2 more
exaly +2 more sources
Tribological behavior of hafnium diboride thin films
Surface and Coatings Technology, 2006Abstract Transition metal diborides and their coatings offer an excellent combination of high hardness, high chemical stability and high thermal conductivity, thus they are excellent candidates for a wide range of tribological applications. In this work, stoichiometric hafnium diboride films were grown by chemical vapor deposition from a single ...
Pascal Bellon
exaly +2 more sources
Characterization of Hafnium Diboride, HfB2 (0001), by XPS
Surface Science Spectra, 2000X-ray photoelectron spectra of a clean, well-ordered HfB2 (0001) single crystal surface are reported. A survey spectrum covering a binding energy range of 0 to 1000 eV is shown, which reveals the presence of minor amounts of oxygen and zirconium. Spectra over narrower binding energy ranges are also shown for the Hf 4f, B 1s, and Hf 4s/O 1s regions.
C. L. Perkins +3 more
exaly +2 more sources
Nanowear of Hafnium Diboride Thin Films
Chemical Vapor Deposition-grown HfB2 films were subjected to nanowear testing at normal loads of 50–500 μN. The material response was investigated by measuring residual wear depths and wear scar roughness and by calculating wear rates and specific energies.
Abhishek Chatterjee +4 more
openaire +2 more sources
Direct Writing of Sub-5 nm Hafnium Diboride Metallic Nanostructures
ACS Nano, 2010Sub-5 nm metallic hafnium diboride (HfB(2)) nanostructures were directly written onto Si(100)-2 × 1:H surfaces using ultrahigh vacuum scanning tunneling microscope (UHV-STM) electron beam induced deposition (EBID) of a carbon-free precursor molecule, tetrakis(tetrahydroborato)hafnium, Hf(BH(4))(4).
Wei Ye, Scott R Daly, Angus Rockett
exaly +3 more sources

