Results 241 to 250 of about 1,864,457 (289)
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High Aspect Ratio Wrinkles via Substrate Prestretch
Advanced Materials, 2014A non-fractured, high aspect ratio wrinkled surface is successfully fabricated. Building upon recently developed models of the localization transition and the current knowledge of surface failures, the wrinkling mode is stabilized at high strain, doubling the accessible wrinkling aspect ratio to the currently reported value.
Yu-Cheng, Chen, Alfred J, Crosby
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High aspect ratio nanoparticles in nanotoxicology
Integrated Environmental Assessment and Management, 2007In this Learned Discourse, we introduce nanotoxicology and note that little information is available on the role of aspect ratio in nanomaterial toxicity. Aspect ratio has implications for clearance from the lungs and for phagocytic cells such as the macrophage.
W Shane, Journeay +3 more
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High aspect-ratio holographic photoresist gratings
Applied Optics, 1988Holographic gratings with periods as small as 700 nm, rectangular profiles with linewidths of
S H, Zaidi, S R, Brueck
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Simulations of high‐aspect‐ratio jets
International Journal for Numerical Methods in Fluids, 2002AbstractThere are many practical situations when jets are emanating from non‐axis‐symmetric apertures, yet numerical simulations of such three‐dimensional jets are scarce and most of them have failed to reproduce some of the unique flow features. Examples of this type of jets are gas leaks from flanges.
Holdø, A. E., Simpson, B. A. F.
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Aspect-ratio-controlled synthesis of high-aspect-ratio gold nanorods in high-yield
Current Applied Physics, 2009Abstract We describe a modified seed-mediated synthesis of high-aspect-ratio gold nanorods controlling the aspect ratio with variation of pH in the growth solution. By adding various amounts of sodium hydroxide, pH in the growth solution was controlled from 1.29 to 7.06 in the presence of nitrate anions.
Park, WM Park, Won Min +2 more
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2017
The development of silicon microcomponents and microsystems, being an outgrowth of the processing techniques commonly used for the fabrication of integrated circuits, was constrained to mostly planar dimensions. This was because optical lithography and most photoresists were developed for this specific purpose.
Friedrich, C. R. +13 more
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The development of silicon microcomponents and microsystems, being an outgrowth of the processing techniques commonly used for the fabrication of integrated circuits, was constrained to mostly planar dimensions. This was because optical lithography and most photoresists were developed for this specific purpose.
Friedrich, C. R. +13 more
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Controlled Collapse of High‐Aspect‐Ratio Nanostructures
Small, 2011AbstractCapillary‐force‐induced collapse of high‐aspect‐ratio (HAR) micro‐ and nanostructures is common in the evaporation–drying process and a number of applications based on the collapse have been proposed. However, the collapse of small HAR structures is usually uncontrollable, which has prevented it from being used in engineering applications. Here,
Huigao, Duan +2 more
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A high aspect-ratio holey metalens
Conference on Lasers and Electro-Optics, 2021We design and fabricate metalenses comprising substrateless ultra-deep via-holes in silicon with aspect ratios exceeding 30:1. Deep holes allow us to circumvent fabrication and fragility constraints which limit the aspect ratios of free-standing meta-atoms.
Soon Wei Daniel Lim +2 more
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High-aspect-ratio bulk micromachining of titanium
Nature Materials, 2004Recent process developments have permitted the highly anisotropic bulk micromachining of titanium microelectromechanical systems (MEMS). By using the metal anisotropic reactive ion etching with oxidation (MARIO) process, arbitrarily high-aspect-ratio structures with straight sidewalls and micrometre-scale features have been bulk micromachined into ...
Marco F, Aimi +4 more
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Self-masked high-aspect-ratio polymer nanopillars
Nanotechnology, 2008In this paper, a simple, cost effective, and potentially universal method is proposed for the formation of high-aspect-ratio nanopillars on various polymers. Our method involves direct reactive ion etching (RIE) using self-formed nanomasks oriented from a dummy material (cover glass).
Ming-Hung, Chen +2 more
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