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High-Aspect Ratio Nanofabrication by Femtosecond Irradiation
2005 Pacific Rim Conference on Lasers & Electro-Optics, 2006We report on three-dimensional (3D) recording of the high-aspect ratio (far = 18) structures by holographic exposure using femtosecond pulses in a SU8 resist. Thickness of free standing planes was approximately 100 nm.
Juodkazis, Saulius +2 more
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High Aspect Ratio Silicon Etch
ECS Meeting Abstracts, 2012Abstract not Available.
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High Aspect Ratio Plasmonic Nanostructures for Sensing Applications
ACS Nano, 2011We present an experimental and theoretical study of plasmonic modes in high aspect ratio nanostructures in the visible wavelength region and demonstrate their high performance for sensing applications. Ordered and well-defined plasmonic structures with various cross-sectional profiles and heights are obtained using a top-down fabrication process.
Päivänranta, Birgit +9 more
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High Aspect Ratio, High Resolution Ceramic MEMS
Micro-Electro-Mechanical Systems (MEMS), 2000Abstract Harsh application environments represent a dual challenge for MEMS. Not only are materials with high thermal, chemical, and mechanical stability required, but they should be also micromachinable at the 1 to 1000 micrometer scale.
Dmitri Routkevitch +2 more
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High Aspect Ratio Piezoelectric Bimorph Transducer
ECS Meeting Abstracts, 2006Abstract not Available.
Jonathan Foster, Richard White
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Fabrication of high-aspect-ratio lightpipes
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2011The authors report the development of two fabrication processes for creating high-aspect-ratio lightpipes in a 10 μm thick SiO2 layer, with smooth, uniform, and straight vertical sidewalls. Both processes require only standard optical lithography, without the need for advanced electron beam or deep-UV lithography.
Winnie N. Ye +3 more
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High-Aspect Ratio Metallic Nano Grippers
2006 1st IEEE International Conference on Nano/Micro Engineered and Molecular Systems, 2006We report the fabrication and characterization of a submicron metallic electrothermal gripper using a combination of electron beam (e-beam) lithography and electroplating techniques. An SU-8 layer was used as a sacrificial layer and polymethyl methacrylate (PMMA) resist was patterned using e-beam lithography to create ~3:1 aspect ratio (1 mum thick ...
Jeongsoo Lee +5 more
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Challenges with high aspect ratio nanoimprint
Microsystem Technologies, 2013When nanoimprint is not used for lithography purposes (NIL), but for the direct patterning of polymeric layers, high aspect ratio patterns may be of interest for a number of applications. The definition of such patterns in a nanoimprint process deals with two aspects, a successful filling of the high aspect ratio cavities of the stamp used, followed by
Hella-Christin Scheer +4 more
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Aspect Ratio Influence at High Subsonic Speeds
Journal of the Aeronautical Sciences, 1956The velocity induced by the thickness of a thin infinite wing in a parallel flow can be calculated, at some distance from the wing, by linearized subsonic compressible flow theory. If now, a portion of the infinite wing is removed from the flow, the velocity at any point on the wing will be less by the velocity induced by the portion of the wing which ...
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Integration of High Aspect Ratio Structures
ECS Meeting Abstracts, 2006Abstract not Available.
Gurtej Sandhu, F. Gonzalez
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