Results 21 to 30 of about 1,420,538 (112)
Chemical mechanical polishing (CMP) technology is one of the key technologies to realize the global planarization of semiconductor wafer surfaces. With the increasing popularity and universality of its application, more and higher requirements are put ...
Haixu Liu +4 more
core +1 more source
Given that PEEK chest wall implants induce shear force at the soft tissue‐implant interface due to respiratory motion in the early in vivo post‐implantation stage. We confirmed that this mechanical stimulus triggers the PIEZO1/ITGB1/YAP1 signalling axis in L929 and the STAT6/p‐STAT6 pathway in RAW264.7, which in turn mediates adhesion and migration of ...
Rou Huang +14 more
wiley +1 more source
Abrasive machining with MQSL. [PDF]
Grinding and polishing of engineered components are critical aspects of the precision manufacturing of high performance, quality assured products. Elevated process temperatures, however, are a common and for the most part undesirable feature of the ...
Morris, Tom
core +5 more sources
Wafer‐Scale Dendritic Nanoporous Platinum Films for Neural Electrodes
Wafer‐scale dendritic nanoporous platinum films with intrinsic nanoscale porosity are synthesized by suraface‐confined wet chemistry and transferred onto flexible substrates to create tissue‐conformal neural electrodes. The ultrathin films combine mechanical flexibility with electrochemical stability, enabling low‐impedance, high‐capacitance interfaces
Kyeongbin Kang +14 more
wiley +1 more source
Dissecting the dissection laboratory: Elements for designing a human anatomy laboratory
Abstract The human anatomy dissection laboratory is a critical component of anatomical and medical education. Development, maintenance, and stocking of these laboratory spaces have unique demands, with all of the challenges in running a laboratory with Biosafety Laboratory Level 2 (BSL‐2) classification, housing a large volume of tissues saturated with
Rhiannon E. Robinson +13 more
wiley +1 more source
Fixed abrasive chemical–mechanical polishing (CMP) is an efficient surface finishing method. The non-uniformity of substrates after polishing is one of the most interesting things in current trends in research.
Zhong, Zhao Wei +2 more
core +1 more source
Scheme 1. Schematic illustration of the synthesis and therapeutic evaluation of PLA‐g‐PAO microspheres (PLA‐g‐PAO‐Ms). Monodisperse PLA microspheres (PLA‐Ms) were initially fabricated via microfluidic technology. Surface grafting of acrylonitrile monomers was subsequently achieved through radiation‐induced graft polymerization, followed by ...
Xingliang Liu +7 more
wiley +1 more source
Corrective Abrasive Polishing Processes for Freeform Surface [PDF]
Traditionally, abrasive finishing process only focused on producing excellent surface finish on regular form shapes. Ever increasing demands in freeform features in aerospace, energy and medicine applications require abrasive finishing technology not ...
Chen, Xun
core +1 more source
Nanopore technology has revolutionized single‐molecule sensing, yet it suffers from an inherent interpretive challenge. Molecular dynamics has emerged as a go‐to method for determining the relationship between the structure of translocating molecules and the nanopore current signals.
Behzad Mehrafrooz +5 more
wiley +1 more source
Nonthermal plasma approaches for combating implant‐associated infections: A compendious review
Implant‐associated infections pose serious clinical challenges. Non‐thermal plasma (NTP) modifications overcome this bottleneck in distinct ways relative to traditional sterilization methods. Gas‐phase plasmas generate highly energetic species, UV radiation and reactive oxygen/nitrogen species (RONS), which alter the implant surface properties.
A. M. Trimukhe +8 more
wiley +1 more source

