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PáSoNetka - a Brief Reflection from the Weekend Conference "By Young for Young" Doctors
Josef Vošmik +2 more
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Modification of heterojunction band offsets at III–V/IV/III–V interfaces
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1993III–V/IV semiconductor heterojunctions (with IV=Si, Ge, and III–V=GaAs, AlAs) as well as III–V/IV/III–V single and multiple quantum well structures have been synthesized by molecular beam epitaxy and characterized by a variety of in situ and ex situ characterization techniques.
A Franciosi +3 more
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Oxidation of III–V semiconductors
Corrosion Science, 2007Abstract This paper focuses on the characterization of anodic films (formed in aqueous electrolytes) and thermal oxides (formed at ∼500 °C) on GaAs, InP, AlGaAs, InAlAs, InAlP and heterostructures for GaAs- and InP-based devices. Emphasis is placed on Al-containing oxides, particularly on InAlP which possess good insulating properties.
Graham, M. J. +8 more
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Channeling studies of III–V/III–V and IV/III–V semiconductor modulated structures
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1983He+-ion channeling spectrometry has been used to study the lattice crystallinity and interface structures of two different types of semiconductor superlattices: InAs–GaSb and Ge–GaAs, both (100)-oriented and grown by molecular beam epitaxy (MBE). The channeling measurements indicate good epitaxy, low density of defects, and very interesting interface ...
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Microscopic capacitors and neutral interfaces in III-V/IV/III-V semiconductor heterostructures
Physical Review Letters, 1992We examined band discontinuities in AlAs-Ge-GaAs(001) and GaAs-Ge-AlAs(001) single-quantum-well structures, as well as individual isolated Ge-GaAs(001), Ge-AlAs(001), GaAs-Ge(001), and AlAs-Ge(001) heterojunctions. We found that well-defined in- equivalent neutral interfaces are established in III-V/IV/III-V structures for Ge coverages as low as 1--2 ...
G. Biasiol +8 more
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Fundamental studies of III–V surfaces and the (III–V)-oxide interface
Thin Solid Films, 1979Work using photoemission with synchrotron radiation (8 eV < hv < 300 eV) to investigate chemisorption and the formation of thin oxide layers on GaAs is reviewed and preliminary correlations with thick oxides are made. An advantage of synchrotron radiation is that it allows examination of both core and valence electrons of the last few molecular layers ...
W.E. Spicer +4 more
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Microwave III-V semiconductors for telecommunications and prospective of the III-V industry
Proceedings International Symposium on Quality Electronic Design, 2003The microwave III-V semiconductor IC technology (primarily GaAs) has emerged as a powerful enabling technology for wireless and optical communications in the past 5 years. It has been dominating, or making substantial penetration into, the market for handset power amplifiers and switches, advanced wireless LAN RF front-ends and various other key RF ...
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Epitaxial Growth of III-V Materials on Implanted III-V Substrates
1988In conjunction with ion implantation, the epitaxial processes can be very attractive technologies for achieving monolithic integration of microwave and electro-optical devices. We present results on the epitaxial growth of III-V compounds, molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MO - CVD), on III-V substrates previously
P. N. Favennec +7 more
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2008
When he returned she was dressed as usual. ‘Now could I get out without anybody seeing me?’ she asked. ‘The town is not yet astir.’ ‘But you have had no breakfast.’ ‘O, I don’t want any!
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When he returned she was dressed as usual. ‘Now could I get out without anybody seeing me?’ she asked. ‘The town is not yet astir.’ ‘But you have had no breakfast.’ ‘O, I don’t want any!
openaire +1 more source

