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Inductively coupled plasma-mass spectrometry
1987The inductively coupled plasma-mass spectrometer combines two analytical facilities to produce an instrument with powerful potential in the field of multi-element trace analysis. The inductively coupled argon plasma is used, not as a source for optical emission measurements (as in ICP-atomic emission spectrometry, Chapter 5), but rather as a source of ...
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Induction coupled plasma processing
IEE Colloquium on Recent Advances in Micromaching Techniques, 1997Summary form only given. Low pressure plasma micro-machining etches require rates and mask selectivities far greater than those normally associated with microelectronic device fabrication. Induction coupled plasma generation with separate rf bias applied to the substrate is an appropriate strategy for process pressures around 1 Pa.
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Inductively-Coupled MEMS Pressure Sensor
2023 IEEE Biomedical Circuits and Systems Conference (BioCAS), 2023Sneh Patel +3 more
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