Results 91 to 100 of about 246,221 (232)

Effect of Inductively Coupled Plasma Etching Parameters on n-Al_0.5Ga_0.5N Ohmic Contact

IEEE Photonics Journal
High-Al-content n-AlGaN ohmic contact is very important for deep ultraviolet optoelectrical devices. However, it often suffers from the etching damages formed in inductively coupled plasma (ICP) etching.
Shanshan Yang, Meixin Feng, Yuzhen Liu, Wenjun Xiong, Biao Deng, Yingnan Huang, Chuanjie Li, Qiming Xu, Yanwei Shen, Qian Sun, Hui Yang   +10 more
doaj   +1 more source

Analysis of Laboratory Animal Feed for Toxic and Essential Elements by Atomic Absorption and Inductively Coupled Argon Plasma Emission Spectrometry [PDF]

, 1981
William M. Blakemore, Stanley M. Billedeau   +1 more
openalex   +1 more source

Application of Inductively-Coupled Plasma Excitation Sources to the Determination of Trace Metals in Microliter Volumes of Biological Fluids

, 1973
Richard N. Kniseley, Velmer A. Fassel, Constance C. Butler   +2 more
openalex   +1 more source

INDUCTIVELY COUPLED PLASMA AND ATOMIC FLUORESCENCE SPECTROMETRY

Reviews in Analytical Chemistry, 1981
Omenetto, N., Cavalli, P., Rossi, G.
doaj   +1 more source

Excitation temperature and electron number density distributions experienced by analyte species in an inductively coupled argon plasma

, 1977
Dennis J. Kalnicky
openalex   +2 more sources

Simultaneous determination of trace elements in shells by inductively coupled plasma-optical emission spectrometry

, 1979
Masataka Hirano, Naoki Onuma, Fujio Masuda   +2 more
openalex   +2 more sources

Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography

Advanced Materials Interfaces
Ultrafine semiconductor fabrication by lithography has undergone a significant transition from deep ultraviolet (DUV) to extreme ultraviolet (EUV) processes, which presents new challenges.
Eun‐Seok Choe, Seungwook Choi, Ansoon Kim, Kwan‐Yong Kim, Hee‐Jung Yeom, Min Young Yoon, Seongwan Hong, Dong‐Wook Kim, Jung‐Hyung Kim, Hyo‐Chang Lee   +9 more
doaj   +1 more source

Excitation temperature and electron number density distributions experienced by analyte species in an inductively coupled argon plasma

, 1976
Dennis J. Kalnicky
openalex   +1 more source

CURRENT AND POTENTIAL APPLICATIONS OF INDUCTIVELY COUPLED PLASMA (ICP)-ATOMIC EMISSION SPECTROSCOPY (AES) IN THE EXPLORATION, MINING, AND PROCESSING OF MATERIALS

, 1978
Velmer A. Fassel
openalex   +2 more sources

Complete analysis of hydrous minerals by inductively coupled plasma emission spectroscopy and electron probe X-ray microanalysis

, 1982
Miho HAMADA, Shigeo Tanuma, Kōzō Nagashima   +2 more
openalex   +2 more sources