Results 211 to 220 of about 246,221 (232)

Inductively coupled plasma etching of ZnO

SPIE Proceedings, 2007
The etching characteristics of ZnO epitaxial layers in Oxford Plasmalab 100 ICP 180 and 380 systems are investigated. Etch rates are studied as a function of gas composition, ICP power and RF bias power. Surface profilometry and scanning electron microscopy are used to characterize etch rates and surface morphologies.
Colin Welch, Mark Dineen, Karen J. Nordheden   +2 more
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Inductively coupled plasma etching of HgCdTe

Journal of Electronic Materials, 2003
The high-density inductively coupled plasma (ICP) etching technique has been applied to HgCdTe. The HgCdTe etch rate was studied as a function of key process variables commonly used in high-density plasma etching: chamber pressure, direct current (DC) bias, and ICP-source power. Mesa profiles were characterized using scanning electron microscopy (SEM),
L. T. Pham, J. K. Gleason, E. A. Patten, M. S. Welkowsky, Edward P. Smith   +4 more
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Inductively coupled plasma mass spectrometry

SCIENTIA SINICA Chimica, 2014
Fundamental and applied studies on ICP-MS conducted by the scientists in Mainland China in recent 10 years were briefly reviewed. Creative researches on novel sample introduction technique and ICP-MS based bioanalysis have been performed, playing a leading role in respective fields, and those in the fields of elemental speciation and metallomics are ...
Nannan Tang, LiMin Yang, QiuQuan Wang
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Stabilization of an inductively coupled plasma for inductively coupled plasma mass spectrometry with a flared torch extension

Journal of Analytical Atomic Spectrometry, 1992
An audio-frequency peak in noise power spectra of signals from emission and mass spectrometers, which use an inductively coupled plasma (ICP) as a source, has been associated by a number of workers with instability at the boundary of the plasma plume where it enters the surrounding atmosphere at the mouth of the torch.
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A microfabricated inductively coupled plasma generator

Journal of Microelectromechanical Systems, 2000
The design, fabrication, and characterization of a surface micromachined plasma generator is described for the first time in this paper. The plasma is sustained without electrodes by inductively coupling a /spl sim/150-MHz current into a region of low-pressure gas, Both argon and air plasmas have been generated over a range of gas pressures from 0.1 to
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[16] Inductively coupled plasma-emission spectrometry

1988
Publisher Summary This chapter discusses the inductively coupled plasma-emission spectrometry (ICP). The ICP owes its popularity as an emission source to a number of attractive features but primarily to the fact that it enables simultaneous or rapid sequential multielement determination of major, minor, trace, and ultratrace elemental sample ...
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Microfabrication of inductively coupled plasma reactors

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science (Cat. No.00CH37087), 2000
Summary form only given. Microelectromechanical systems (MEMS) hold promise for incorporating sensors, actuators, and microelectronics in a single, monolithic package. It is also useful to include plasma generation capability within some MEMS devices for applications such as spectroscopic chemical analysis, mass spectrometry, micropropulsion, lighting,
Y. Yin, Jeffrey Hopwood
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Inductively coupled plasmas

Analytical Chemistry, 1974
Velmer A. Fassel, Richard N. Kniseley
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Inductively Coupled Plasma [PDF]

, 2014
Toshiaki Makabe, Zoran Lj. Petrovic
openaire   +1 more source

Kinetics of etching in inductively coupled plasmas

Applied Surface Science, 2004
Abstract A modified Langmuir type surface kinetics model was developed in our previous work for interpreting the overall etching behavior of silicon based materials in fluorocarbon discharges using inductively coupled plasma (ICP) reactors. This kinetics model was tested for the global applicability to the ICP etching, either for the etching of non ...
openaire   +2 more sources