Results 301 to 310 of about 253,402 (327)

Inductively Coupled Plasmas (ICPs)

2003
Inductively Coupled Plasmas are so called because the RF electric field is induced in the plasma by an external antenna. ICPs have two main advantages: 1) no internal electrodes are needed as in capacitively coupled systems, and 2) no dc magnetic field is required as in ECR reactors.
Francis F. Chen, Jane P. Chang
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Induction coupled plasma processing

IEE Colloquium on Recent Advances in Micromaching Techniques, 1997
Summary form only given. Low pressure plasma micro-machining etches require rates and mask selectivities far greater than those normally associated with microelectronic device fabrication. Induction coupled plasma generation with separate rf bias applied to the substrate is an appropriate strategy for process pressures around 1 Pa.
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Induction-Coupled Plasma Torch

Journal of Applied Physics, 1961
A new method of generating a stable plasma at atmospheric pressure using inductive coupling at a frequency of several Mc is described. Methods of starting and operating this plasma in argon, and mixtures of argon with helium, hydrogen, oxygen, and air are discussed.
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Inductively coupled plasma—atomic emission spectrometry

1987
Optical emission spectrometry is a well proven analytical technique, in widespread use for the last 30 to 40 years. However, early devices available as optical emission sources (arc, spark or dc electrical discharges) had a number of disadvantages that prevented their widespread use for fully quantitative analysis of silicate samples.
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Inductively coupled plasmas

Analytical Chemistry, 1974
Velmer A. Fassel, Richard N. Kniseley
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Capillary Electrophoresis-Inductively Coupled Plasma Mass Spectrometry

2016
During the recent years, capillary electrophoresis (CE) has been fully established as a powerful tool in separation sciences as well as in element speciation. This road of success is based on the rapid analysis time, low sample requirements, high separation efficiency, and low operating costs of CE. Inductively coupled plasma mass spectrometry (ICP-MS)
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Inductively Coupled Plasma System (ICP)

2001
Abstract : This is the final technical report for contract number F49620-01-1-0307 with the Air Force Office of Scientific Research. The report provides information about the inductively coupled plasma system that was acquired under this contract.
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Inductively Coupled Plasma

2014
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Inductively Coupled Plasma

2006
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Inductively Coupled Plasmas

2001
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