Results 311 to 320 of about 491,465 (364)

Characterization of gold nanoparticle uptake by tomato plants using enzymatic extraction followed by single-particle inductively coupled plasma-mass spectrometry analysis.

Environmental Science and Technology, 2015
Plant uptake and accumulation of nanoparticles (NPs) represent an important pathway for potential human expose to NPs. Consequently, it is imperative to understand the uptake of accumulation of NPs in plant tissues and their unique physical and chemical ...
Yongbo Dan, Weilan Zhang, R. Xue, Xingmao Ma, C. Stephan, Honglan Shi   +5 more
semanticscholar   +1 more source

Bistability and Hysteresis in Inductively Coupled Plasmas

Physica Scripta, 2000
The transition between the two stable operation regimes (E and H discharge modes) in inductively coupled argon plasmas has been studied experimentally and theoretically. Analogy with other physical phenomena exhibiting hysteresis has been drawn. Analysis of power balance, electromagnetic field, plasma parameters, densities of the excited states, and ...
Ostrikov, K., Xu, S., Lee, S.
openaire   +3 more sources

Inductively coupled plasma mass spectrometry

Nature Reviews Methods Primers, 2023
long-lived radionuclides, Z. Varga
semanticscholar   +2 more sources

Inductively Coupled Plasmas (ICPs)

2003
Inductively Coupled Plasmas are so called because the RF electric field is induced in the plasma by an external antenna. ICPs have two main advantages: 1) no internal electrodes are needed as in capacitively coupled systems, and 2) no dc magnetic field is required as in ECR reactors.
Jane P. Chang, Francis F. Chen
openaire   +2 more sources

Inductively coupled plasma nitriding of aluminium

Applied Surface Science, 2002
Substrates of aluminium alloy 2011 were plasma nitrided using an inductively coupled plasma source. The plasma nitriding parameters of temperature, length of nitriding and negative dc bias of the substrates were varied in order to optimise the plasma nitriding process. Substrates were characterised by powder X-ray diffraction (XRD), X-ray photoelectron
Giuseppe P Cavallaro, Sabina Gredelj, Sunil Kumar, Andrea R. Gerson   +3 more
openaire   +3 more sources

Induction-Coupled Plasma Torch

Journal of Applied Physics, 1961
A new method of generating a stable plasma at atmospheric pressure using inductive coupling at a frequency of several Mc is described. Methods of starting and operating this plasma in argon, and mixtures of argon with helium, hydrogen, oxygen, and air are discussed.
openaire   +2 more sources

Inductively Coupled Plasma Torches

2013
We investigate in this chapter another type of application using eddy currents. An Inductively Coupled Plasma torch (commonly referred to as ICP) is a technical device used to analyze a given sample (gas, solid or liquid prepared as an aerosol) by injecting it in a plasma (generally made of argon) (see Fig. 10.1).
Jacques Rappaz, Rachid Touzani
openaire   +2 more sources

Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides.

ACS Applied Materials and Interfaces, 2015
Silicon-rich nitride films are developed and explored using an inductively coupled plasma chemical vapor deposition system at low temperature of 250 °C with an ammonia-free gas chemistry.
D. Ng, Qian Wang, Ting Wang, S. Ng, Y. Toh, K. Lim, Y. Yang, D. Tan   +7 more
semanticscholar   +1 more source

Induction coupled plasma processing

IEE Colloquium on Recent Advances in Micromaching Techniques, 1997
Summary form only given. Low pressure plasma micro-machining etches require rates and mask selectivities far greater than those normally associated with microelectronic device fabrication. Induction coupled plasma generation with separate rf bias applied to the substrate is an appropriate strategy for process pressures around 1 Pa.
openaire   +2 more sources

Single particle inductively coupled plasma mass spectrometry: a powerful tool for nanoanalysis.

Analytical Chemistry, 2014
Single particle inductively coupled plasma mass spectrometry is an emergent ICPMS method for detecting, characterizing, and quantifying nanoparticles.
F. Laborda, E. Bolea, J. Jiménez-Lamana
semanticscholar   +1 more source