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A comparison of plasma immersion ion implantation with conventional ion implantation
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993Abstract Plasma immersion ion implantation has a potential advantage over conventional line-of-sight ion implantation in being able to provide a uniform dose over a nonplanar surface. Operating regimes are different for each process leading to different surface modification characteristics.
Kenny, MJ +3 more
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Transport of ions during ion implantation
Physical Review E, 1996An efficient scheme for the description of long-mean-free-path particle transport at a kinetic level has been extended to a case where particle distributions are highly anisotropic: implantation of ions into a solid. The method calculates the scattering rate of particles throughout a region and obtains the particle distribution from the scattering rate.
, Parker, , Hitchon, , Keiter
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Ion implantation in superconductors
Radiation Effects, 1975The possibility to introduce controlled amounts of impurities into material with the additional advantage to overcome restrictions due to solubility and diffusibility offers an attractive research tool to study near surface properties of material in a systematic manner.
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2023
This chapter discusses the ion implantation process of silicon processing technology in depth. The chapter gives an in-depth insight into various aspects of the ion implantation process and ion-implanted silicon systems commonly encountered in a silicon process.
Sunipa Roy +3 more
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This chapter discusses the ion implantation process of silicon processing technology in depth. The chapter gives an in-depth insight into various aspects of the ion implantation process and ion-implanted silicon systems commonly encountered in a silicon process.
Sunipa Roy +3 more
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Ion implantation technology and ion sources
Review of Scientific Instruments, 2014Ion implantation (I/I) technology has been developed with a great economic success of industries of VLSI (Very Large-Scale Integrated circuit) devices. Due to its large flexibility and good controllability, the I/I technology has been assuming various challenging requirements of VLSI evolutions, especially in advanced evolutional characteristics of ...
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Ion implantation and catalysis: Electrochemical applications of ion implantation
Nuclear Instruments and Methods, 1981Abstract Electrochemical processes at solid-liquid interfaces and catalytic reactions at solid-gas interfaces are typical examples of surface reactions. Any changes in structure and composition of the solid surface should affect the rate and mechanism of these reactions.
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Ion Implantation for Biomaterials
Materials Science Forum, 1992Y. Corre, J. Rieu, L.M. Rabbe, A. Pichat
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