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Ion sources for ion machining applications
12th International Electric Propulsion Conference, 1976Ion sources with beam diameters of 2.5, 10, and 20 cm have been developed for ion machining applications. All three of these sources use carbon grids to minimize accelerator grid sputtering. A new starting circuit Is also employed that uses only passive components for initiation of the discharge. The two larger sources use a flat multipole chamber with
Harold R. Kaufman +2 more
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Ion implantation technology and ion sources
Review of Scientific Instruments, 2014Ion implantation (I/I) technology has been developed with a great economic success of industries of VLSI (Very Large-Scale Integrated circuit) devices. Due to its large flexibility and good controllability, the I/I technology has been assuming various challenging requirements of VLSI evolutions, especially in advanced evolutional characteristics of ...
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RF Negative Ion Sources and Polarized Ion Sources
2016The requirement of a neutral beam injection system with hydrogen or deuterium beam energy up to 1 MeV for the ITER project has recently triggered new research on negative ion sources, from production to acceleration and neutralization before the injection in the tokamak.
N. Ippolito +4 more
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Analysis of magnetron ion sources and PIG ion sources
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989Abstract Magnetron ion sources and PIG ion sources are sources of intense negative ion beams and multiply-charged positive and negative ion beams. They are composed of two electrodes, a sheath and a plasma. The author has classified them into magnetron (MG), inverse magnetron (IM), planar magnetron and Penning ionization gauge (PIG) ion sources.
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Liquid Metal Alloy Ion Sources—An Alternative for Focussed Ion Beam Technology
Applied Physics Reviews, 2016Lars Bruchhaus +2 more
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Ion Source Electronics and Microwave Generators for Ion Sources
2017H. Horneff, F. Bourg
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High Brightness Inductively Coupled Plasma Source for High Current Focused Ion Beam Applications
Journal of Vacuum Science & Technology B, 2006A Aanesland, R W Boswell
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