Transport of sputtered particles in capacitive sputter sources [PDF]
Journal of Applied Physics, 2015 The transport of sputtered aluminum inside a multi frequency capacitively coupled plasma chamber is simulated by means of a kinetic test multi-particle approach. A novel consistent set of scattering parameters obtained for a modified variable hard sphere collision model is presented for both argon and aluminum.
Jan Trieschmann, Thomas Mussenbrock
openaire +2 more sources
Sputtering yields exceeding 1000 by 80keV Xe irradiation of Au nanorods [PDF]
, 2014 Using experiments and computer simulations, we find that 80 keV Xe ion irradiation of Au nanorods can produce sputtering yields exceeding 1000, which to our knowledge are the highest yields reported for sputtering by single ions in the nuclear collision ...
Greaves, Graeme +17 more
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Preparation and characterization of the defect–conductivity relationship of Ga-doped ZnO thin films deposited by nonreactive radio-frequency–magnetron sputtering [PDF]
, 2010 Ga-doped ZnO (ZnO:Ga) thin films were prepared by radio-frequency–magnetron sputtering on conventional glass substrates at room temperature. The structural, electrical, and optical properties of these films as a function of argon pressure and film ...
Pasquet, Isabelle +11 more
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Fundamental Ion-Surface Interactions in Plasma Thrusters [PDF]
, 2007 Ion thrusters offer the potential to enable many future interplanetary robotic missions presently under consideration by NASA. To realize the benefits offered by these low thrust devices, the sputtering mechanisms that are responsible for the ...
Kolasinski, Robert David
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Magnetron sputtering. Milestones of 30 years
, 2022 S.1354-1359Since the introduction of the planar magnetron by J.S. Chapin in 1974 magnetron sputtering has become the most important technology for the deposition of thin films.
Szyszka, B. +3 more
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Charge-Exchange Collision Dynamics and Ion Engine Grid Geometry Optimization [PDF]
, 2007 The development of a new three-dimensional model for determining the absolute energy distribution of ions at points corresponding to spacecraft surfaces to the side of an ion engine is presented.
Morris, Bradford S.
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Dry etching and sputtering [PDF]
, 2003 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W. +3 more
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Enhanced Sputtering Yields from Single-Ion Impacts on Gold Nanorods
, 2013 Sputtering yields, enhanced by more than an order of magnitude, have been observed for 80 keV Xe ion irradiation of monocrystalline Au nanorods. Yields are in the range 100–1900 atoms/ion compared with values for a flat surface of ≈50.
Greaves, Graeme +8 more
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Improved Power Factor in Self-Substituted Fe2VAl Thermoelectric Thin Films Prepared by Co-sputtering
, 2023 We present a strong improvement of the electronic transport properties in the Fe2VAl Heusler alloy obtained in thin-film form by a co-sputtering process.
Sébastien Pairis +15 more
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Development of innovative coatings for sun protection glasses based on the theory of the optimal spectral transmittance [PDF]
, 2008 In this work new coatings for sun protection glasses for windows and glass facades were developed. These coatings improve the reduction of the energy input by solar radiation in comparison to the best sun protection glasses on the market. They reduce the
Mack, Iris
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