Results 11 to 20 of about 44,233 (267)

Effects of Cr Concentration on the Structure and the Electrical and Optical Properties of Ti-Al-Cr-N Thin Films Prepared by Means of Reactive Co-Sputtering

Crystals, 2022
Thin films of Ti-Al-Cr-N were deposited onto glass substrates by means of the reactive magnetron co-sputtering of pure Cr and TiAl alloy targets in an atmosphere of Ar and N2.
Gina Prieto-Novoa, Fabio Vallejo, Oscar Piamba, Jhon Olaya, Yaneth Pineda   +4 more
doaj   +1 more source

Pulsed Sputtering Preparation of InGaN Multi-Color Cascaded LED Stacks for Large-Area Monolithic Integration of RGB LED Pixels

Crystals, 2022
Micro-LEDs have been attracting attention as a potential candidate for the next generation of display technology. Here we demonstrate the feasibility of large-area monolithic integration of multi-color InGaN micro-LEDs via pulsed sputtering deposition ...
Soichiro Morikawa, Kohei Ueno, Atsushi Kobayashi, Hiroshi Fujioka   +3 more
doaj   +1 more source

Chemically Roughened, Sputtered Au Films with Trace-Loaded Manganese Oxide for both On-Chip and Off-Chip High Frequency Supercapacitors

Nanomaterials, 2021
High frequency supercapacitors (HFSCs) are promising in alternating current line filtering and adaptable storage of high-frequency pulse electrical energy.
Pai Lu, Haitao Xue, Wentao Liu, Zhongbao Feng, Qiang Sun   +4 more
doaj   +1 more source

Transport of sputtered particles in capacitive sputter sources [PDF]

Journal of Applied Physics, 2015
The transport of sputtered aluminum inside a multi frequency capacitively coupled plasma chamber is simulated by means of a kinetic test multi-particle approach. A novel consistent set of scattering parameters obtained for a modified variable hard sphere collision model is presented for both argon and aluminum.
Jan Trieschmann, Thomas Mussenbrock
openaire   +2 more sources

Production of Size-Controlled Gold Nanoclusters for Vapor–Liquid–Solid Method

Nanomaterials, 2022
This study demonstrated the deposition of size-controlled gold (Au) nanoclusters via direct-current magnetron sputtering and inert gas condensation techniques.
Alam Saj, Shaikha Alketbi, Sumayya M. Ansari, Dalaver H. Anjum, Baker Mohammad, Haila M. Aldosari   +5 more
doaj   +1 more source

The Surface Properties of Implant Materials by Deposition of High-Entropy Alloys (HEAs)

Nanomaterials, 2023
High-entropy alloys (HEAs) contain more than five alloying elements in a composition range of 5–35% and with slight atomic size variation. Recent narrative studies on HEA thin films and their synthesis through deposition techniques such as sputtering ...
Khalid Usman, Doori Kang, Geonwoo Jeong, Khurshed Alam, Athira Raveendran, Jinhui Ser, Woohyung Jang, Hoonsung Cho   +7 more
doaj   +1 more source

Design of Nanoscaled Surface Morphology of TiO₂–Ag₂O Composite Nanorods through Sputtering Decoration Process and Their Low-Concentration NO₂ Gas-Sensing Behaviors

Nanomaterials, 2019
TiO2−Ag2O composite nanorods with various Ag2O configurations were synthesized by a two-step process, in which the core TiO2 nanorods were prepared by the hydrothermal method and subsequently the Ag2O crystals were deposited by sputtering ...
Yuan-Chang Liang, Yen-Chen Liu
doaj   +1 more source

A correlation between fractal growth, water contact angle, and SERS intensity of R6G on ion beam nanostructured ultra-thin gold (Au) films

Frontiers in Physics, 2023
Introduction: This study focuses on the detection of rhodamine-6G using surface-enhanced Raman scattering (SERS) on gold nanostructures (AuNS) of different sizes.
Priya Jasrotia, Bhanu Priya, Raj Kumar, Priyanka Bishnoi, Ankush vij, Ankush vij, Tanuj Kumar   +6 more
doaj   +1 more source

Crystal Structure And Optical Properties Of TiO2 Thin Films Prepared By Reactive RF Magnetron Sputtering

Archives of Metallurgy and Materials, 2015
In sputtering deposition process of TiO2, metal Ti or sintered TiO2 target is used as deposition source. In this study, we have compared the characteristic of target materials.
Goto S., Adachi Y., Matsuda K., Nose M.
doaj   +1 more source

Low-Temperature and High-Speed Fabrication of Nanocrystalline Ge Films on Cu Substrates Using Sub-Torr-Pressure Plasma Sputtering

IEEE Open Journal of Nanotechnology, 2022
We fabricated nanocrystalline Ge films using radio-frequency (RF) magnetron plasma sputtering deposition under a high Ar-gas pressure. The Ge nanograins changed from amorphous to crystalline when the distance between the Ge sputtering target and the ...
Giichiro Uchida, Kenta Nagai, Ayaka Wakana, Yumiko Ikebe   +3 more
doaj   +1 more source