Results 11 to 20 of about 124,690 (262)

Sputtering yields exceeding 1000 by 80keV Xe irradiation of Au nanorods [PDF]

open access: yes, 2014
Using experiments and computer simulations, we find that 80 keV Xe ion irradiation of Au nanorods can produce sputtering yields exceeding 1000, which to our knowledge are the highest yields reported for sputtering by single ions in the nuclear collision ...
Greaves, Graeme   +17 more
core   +1 more source

Enhanced Sputtering Yields from Single-Ion Impacts on Gold Nanorods [PDF]

open access: yes, 2013
Sputtering yields, enhanced by more than an order of magnitude, have been observed for 80 keV Xe ion irradiation of monocrystalline Au nanorods. Yields are in the range 100–1900  atoms/ion compared with values for a flat surface of ≈50.
Greaves, Graeme   +15 more
core   +1 more source

Dry etching and sputtering [PDF]

open access: yes, 2003
Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W.   +3 more
core   +2 more sources

Effects of Cr Concentration on the Structure and the Electrical and Optical Properties of Ti-Al-Cr-N Thin Films Prepared by Means of Reactive Co-Sputtering

open access: yesCrystals, 2022
Thin films of Ti-Al-Cr-N were deposited onto glass substrates by means of the reactive magnetron co-sputtering of pure Cr and TiAl alloy targets in an atmosphere of Ar and N2.
Gina Prieto-Novoa   +4 more
doaj   +1 more source

Preparation and characterization of the defect–conductivity relationship of Ga-doped ZnO thin films deposited by nonreactive radio-frequency–magnetron sputtering [PDF]

open access: yes, 2010
Ga-doped ZnO (ZnO:Ga) thin films were prepared by radio-frequency–magnetron sputtering on conventional glass substrates at room temperature. The structural, electrical, and optical properties of these films as a function of argon pressure and film ...
Pasquet, Isabelle   +11 more
core   +1 more source

Pulsed Sputtering Preparation of InGaN Multi-Color Cascaded LED Stacks for Large-Area Monolithic Integration of RGB LED Pixels

open access: yesCrystals, 2022
Micro-LEDs have been attracting attention as a potential candidate for the next generation of display technology. Here we demonstrate the feasibility of large-area monolithic integration of multi-color InGaN micro-LEDs via pulsed sputtering deposition ...
Soichiro Morikawa   +3 more
doaj   +1 more source

Fundamental Ion-Surface Interactions in Plasma Thrusters [PDF]

open access: yes, 2007
Ion thrusters offer the potential to enable many future interplanetary robotic missions presently under consideration by NASA. To realize the benefits offered by these low thrust devices, the sputtering mechanisms that are responsible for the ...
Kolasinski, Robert David
core   +1 more source

Chemically Roughened, Sputtered Au Films with Trace-Loaded Manganese Oxide for both On-Chip and Off-Chip High Frequency Supercapacitors

open access: yesNanomaterials, 2021
High frequency supercapacitors (HFSCs) are promising in alternating current line filtering and adaptable storage of high-frequency pulse electrical energy.
Pai Lu   +4 more
doaj   +1 more source

Formation of silicon nanodots via ion beam sputtering of ultrathin gold thin film coatings on Si [PDF]

open access: yes, 2011
Ion beam sputtering of ultrathin film Au coatings used as a physical catalyst for self-organization of Si nanostructures has been achieved by tuning the incident particle energy.
El-Atwani, Osman   +7 more
core   +1 more source

Production of Size-Controlled Gold Nanoclusters for Vapor–Liquid–Solid Method

open access: yesNanomaterials, 2022
This study demonstrated the deposition of size-controlled gold (Au) nanoclusters via direct-current magnetron sputtering and inert gas condensation techniques.
Alam Saj   +5 more
doaj   +1 more source

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