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Diagnostics and experiments on LAPPS
IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th IEEE International Conference (Cat. No.99CH36297), 2003Summary form only given. NRL is developing a new plasma processing reactor called the 'Large Area Plasma Processing System' with applications to semiconductor processing and other forms of surface modification. The system consists of a planar plasma distribution generated by a magnetically collimated sheet of 2-5 kV, 10 mA/cm/sup 2/ electrons injected ...
D. Leonhardt +5 more
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