Results 91 to 100 of about 117,202 (206)

Optical proximity correction in IC production

Технологія та конструювання в електронній апаратурі, 2007
Methods and types of figures for optical proximity correction are considered. The lithography process was simulated using the discussed correction figures, and the modeling results were experimentally ...
I. A. Rodionov, V. V. Makarchuk
doaj  

Scalable and reproducible sub-5 nm manufacturing for next-generation devices

International Journal of Extreme Manufacturing
The capability to consistently manufacture structures with sub-5 nm features has greatly accelerated scientific advancements in nanoscience and nanotechnology. However, most current methods are serial processes that are time-consuming and impractical for
Lijuan Chen, Sihai Luo, Dongxu Yang, Qi Yuan, Yingfang Zhang, Bai Sun, Jian Lv, Xiaoliang Chen, Hongmiao Tian, Xiangming Li, Fenggang Ren, Yi Lv, Stefan A Maier, Jinyou Shao   +13 more
doaj   +1 more source

1. Part (15.05.2020): Lecture 5 - Extreme ultraviolet lithography, Extreme ultraviolet interference lithography and X-ray lithography

, 2020
Content: Electromagnetic spectrum; EUV process; Optics for EUV lithography; Masks for EUV; Image formation; Defects in masks; Stochastic issues; Interference lithography; Extreme UV interference lithography; EUV-IL with Diffraction Optics; Exitaxial Self-
Turchanin, Andrey, Stroganov, Vladislav
core  

Optimizing Josephson Junction Reproducibility in 30 kV E-Beam Lithography: An Analysis of Backscattered Electron Distribution

Nanomaterials
This paper explores methods to enhance the reproducibility of Josephson junctions, which are crucial elements in superconducting quantum technologies, when employing the Dolan technique in 30 kV e-beam processes.
Arthur M. Rebello, Lucas M. Ruela, Gustavo Moreto, Naiara Y. Klein, Eldues Martins, Ivan S. Oliveira, João P. Sinnecker, Francisco Rouxinol   +7 more
doaj   +1 more source

Lithography

American Journal Of Social Sciences And Humanity Research
This article examines the historical aspects of the emergence of lithography, its technical characteristics and influence on the development of art and polygraphy. Particular attention is paid to the role of lithography in the mass production of images in the 19th century and its transformation into modern offset printing.
openaire   +2 more sources

Single-cycle contact-interference hybrid lithography for scalable fabrication of arrayed quadrant micro-polarizer structures

International Journal of Extreme Manufacturing
The advantages of polarization imaging can be readily leveraged in remote sensing applications by applying subwavelength metal grating arrays in standard optical imaging systems.
Tianshi Lu, Fuyuan Deng, Yufeng Wei, Zhipeng Zeng, Xinghui Li   +4 more
doaj   +1 more source

Modification of Self‐Assembled Monolayers by Electron Irradiation as a Tool for Surface Engineering, Lithography, and Nanofabrication

Advanced Materials Interfaces
Self‐assembled monolayers (SAMs) have long become an important element of modern nanotechnology. Apart from their primary use in tailoring the chemical and physical properties of surfaces and interfaces, they can be modified by physical tools, with ...
Andreas Terfort, Michael Zharnikov
doaj   +1 more source

Pyrolyzed Photoresist as a Continuous-Tone Mask for Grayscale Lithography. [PDF]

Adv Sci (Weinh)
Creason TD, Gee GC, Piontkowski ZT, Ton-That T, Reyna R, Arata ER, Risley M, Boissiere JD, Kaehr B, Burckel DB.   +9 more
europepmc   +1 more source

Nanotechnology Principles Lab: Lithography

, 2015
Description:This Nanotechnology Principles Lab: Lithography is provided by SHINE: Seattle's Hub for Industry-driven Nanotechnology Education. This lab includes activities that are intended to teach students about lithography.

core   +1 more source

Mid-IR diffraction gratings fabricated via nanoimprint lithography for chirped pulse amplification. [PDF]

Discov Nano
Capraro G, Bashir D, Möller M, Schlachter F, Bolten J, Graf T, Abdou Ahmed M, Lemme MC.   +7 more
europepmc   +1 more source