Toward High-Resolution Polymeric Neural Interfaces: A Practical Guide for Electron Beam Lithography. [PDF]
Adv Sci (Weinh)Karlsson-Fernberg H, Asplund M.
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Highly Selective Wet Etching of Ge Over Ge<sub>1-</sub> <i><sub>x</sub></i> Sn <sub><i>x</i></sub> Enabling Fully Released Group IV Microstructures. [PDF]
ACS OmegaAyinde S, Myronov M.
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Applications of Nanofabrication Technologies in the Preparation of Biomimetic Structures. [PDF]
Biomimetics (Basel)Sun H +5 more
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Mechanisms of Film-Formation-Related Defects in EUV Photoresists for Sub-3 nm Nodes and Synergistic Materials-Process-Intelligence Co-Optimization. [PDF]
Micromachines (Basel)Wu J +12 more
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Profile Study on Different Patterns in PMMA Bilayer Resist Configurations Under 20 keV Electron Beam Exposure. [PDF]
Nanomaterials (Basel)Kostic I +5 more
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Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography. [PDF]
Chem SciChu TTH +13 more
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Heat-Suppressing Projection Two-Photon Lithography Enables High-Throughput Sub-Micrometer Manufacturing of Biopolymer Hydrogels for Tissue Engineering. [PDF]
Adv Sci (Weinh)Guan Q +11 more
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Lithography-Free Electrical Contact Method for Optoelectronic and Flexible Devices Based on Mechanically Exfoliated 2D Materials. [PDF]
Micromachines (Basel)Salvemme P, Vennarini D, Frisenda R.
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Metal-Ligand Coordination Enables Molecular Resist-Based Direct Write Lithography of Metal Halides. [PDF]
Adv MaterSarkar P +14 more
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