Results 151 to 160 of about 117,202 (206)
Some of the next articles are maybe not open access.
Journal of the American Chemical Society, 2022
Surfaces with patterned biomolecules have wide applications in biochips and biomedical diagnostics. However, most patterning methods are inapplicable to physiological conditions and incapable of creating complex structures. Here, we develop a mechanochemical lithography (MCL) method based on compressive force-triggered reactions.
Yuehai Mei +8 more
openaire +2 more sources
Surfaces with patterned biomolecules have wide applications in biochips and biomedical diagnostics. However, most patterning methods are inapplicable to physiological conditions and incapable of creating complex structures. Here, we develop a mechanochemical lithography (MCL) method based on compressive force-triggered reactions.
Yuehai Mei +8 more
openaire +2 more sources
Angewandte Chemie International Edition, 1998
Abstract Soft lithography represents a non-photolithographic strategy based on self-assembly and replica molding for carrying out micro- and nanofabrication. It provides a convenient, effective, and low-cost method for the formation and manufacturing of micro- and nanostructures.
Younan, Xia, George M, Whitesides
openaire +2 more sources
Abstract Soft lithography represents a non-photolithographic strategy based on self-assembly and replica molding for carrying out micro- and nanofabrication. It provides a convenient, effective, and low-cost method for the formation and manufacturing of micro- and nanostructures.
Younan, Xia, George M, Whitesides
openaire +2 more sources
2020
Lithography became an essential tool for materials research during the post-World War II computing revolution. Increasing computing power required shrinking circuits and packing transistors more tightly together. Lithography made it possible to write small, precise circuits on a semiconducting surface, setting the stage for modern computing and fueling
Martin, Joseph D., Mody, Cyrus C. M.
openaire +3 more sources
Lithography became an essential tool for materials research during the post-World War II computing revolution. Increasing computing power required shrinking circuits and packing transistors more tightly together. Lithography made it possible to write small, precise circuits on a semiconducting surface, setting the stage for modern computing and fueling
Martin, Joseph D., Mody, Cyrus C. M.
openaire +3 more sources
Proceedings of the IEEE, 2001
Lithography technology has been one of the key enablers and drivers for the semiconductor industry for the past several decades. Improvements in lithography are responsible for roughly half of the improvement in cost per function in integrated circuit (IC) technology.
L R Harriott
exaly +2 more sources
Lithography technology has been one of the key enablers and drivers for the semiconductor industry for the past several decades. Improvements in lithography are responsible for roughly half of the improvement in cost per function in integrated circuit (IC) technology.
L R Harriott
exaly +2 more sources
Diffractive Optics and Micro-Optics, 1996
The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs.
Völkel, R. +4 more
openaire +1 more source
The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs.
Völkel, R. +4 more
openaire +1 more source
Science, 2005
We report a high-throughput procedure for lithographically processing one-dimensional nanowires. This procedure, termed on-wire lithography, combines advances in template-directed synthesis of nanowires with electrochemical deposition and wet-chemical etching and allows routine fabrication of face-to-face disk arrays and gap structures in the range of ...
Lidong, Qin +3 more
openaire +2 more sources
We report a high-throughput procedure for lithographically processing one-dimensional nanowires. This procedure, termed on-wire lithography, combines advances in template-directed synthesis of nanowires with electrochemical deposition and wet-chemical etching and allows routine fabrication of face-to-face disk arrays and gap structures in the range of ...
Lidong, Qin +3 more
openaire +2 more sources
2007
Nanoimprint lithography (NIL) is an emerging highresolution parallel patterning method, mainly aimed towards fields in which electron-beam and high-end photolithography are costly and do not provide sufficient resolution at reasonable throughput. In a top-down approach, a surface pattern of a stamp is replicated in a material by mechanical contact and ...
Schift, Helmut, Kristensen, Anders
openaire +2 more sources
Nanoimprint lithography (NIL) is an emerging highresolution parallel patterning method, mainly aimed towards fields in which electron-beam and high-end photolithography are costly and do not provide sufficient resolution at reasonable throughput. In a top-down approach, a surface pattern of a stamp is replicated in a material by mechanical contact and ...
Schift, Helmut, Kristensen, Anders
openaire +2 more sources
Stamps for Submicrometer Soft Lithography Fabricated by Capillary Force Lithography [PDF]
Lithography, capillary force • Lithography, soft • Replica molding • Stamps
Jurriaan Huskens +2 more
exaly +2 more sources
Nature Nanotechnology, 2015
The optical and electrical properties of heterogeneous nanowires are profoundly related to their composition and nanoscale architecture. However, the intrinsic constraints of conventional synthetic and lithographic techniques have limited the types of multi-compositional nanowire that can be created and studied in the laboratory. Here, we report a high-
Tuncay, Ozel +2 more
openaire +2 more sources
The optical and electrical properties of heterogeneous nanowires are profoundly related to their composition and nanoscale architecture. However, the intrinsic constraints of conventional synthetic and lithographic techniques have limited the types of multi-compositional nanowire that can be created and studied in the laboratory. Here, we report a high-
Tuncay, Ozel +2 more
openaire +2 more sources

