Results 151 to 160 of about 228,991 (341)

Laser plasma X-ray source and its application to lithography.

, 1988
Sadao Nakai, Masahiro Nakatsuka, Masao Takahashi   +2 more
openalex   +2 more sources

High‐Performance, Paper‐Based Microelectronics via a Micromodular Fabrication Process

Advanced Materials Interfaces, EarlyView.
This study demonstrates high‐performance silicon micromodular transistors on cellulose nanomaterial‐coated paper, with interconnects formed via e‐jet printing. Transistors exhibit excellent electrical properties and maintain performance under applied strain.
Rebecca K. Banner, Hubert N. Elly, Kaifan Yue, Cyra Moobed, Siddharth Kurup, Daniel Aziz, Kira L. Barton, Victor Breedveld, Eric M. Vogel, Michael A. Filler   +9 more
wiley   +1 more source

The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints. [PDF]

Micromachines (Basel)
Chae H, Park H, Kang DJ.
europepmc   +1 more source

Mechanical Behavior Simulation of PMMA for Nano Imprint Lithography Using Molecular Dynamics

, 2007
Jung Yup Kim, Jae Hyun Kim, Byung Ik Choi   +2 more
openalex   +1 more source

Plasma‐Sequence‐Engineered Atomic Layer Deposition of Ultra‐Thin SiNx for Enhanced Etching Resistance in Extreme Ultraviolet Pellicles

Advanced Materials Interfaces, EarlyView.
Plasma‐sequence‐engineered ALD (PSE‐ALD), based on sequential NH3 and N2 plasma pulses, enables ultrathin, dense SiNx films. ToF‐MS analysis confirms ligand removal via HCl evolution, while increased film density indicates network densification. The resulting SiNx coating provides robust protection of graphite under H2 plasma exposure.
Hye‐Young Kim, Sung Kyu Jang, Jihun Kim, Jong‐Hyun Choi, Ji‐Beom Yoo, Hyun‐Mi Kim, Seul‐Gi Kim, Hyeongkeun Kim   +7 more
wiley   +1 more source

Asymmetric Diffusion Metasurface-Based Lensless Monitoring and Uniform Illumination Systems for Optical Lithography. [PDF]

Research (Wash D C)
Wang G, Shen Y, Pi Y, Kong W, Lai Y, Ma X, Zhou Y, Li F, Cao Z, Wang L, Yu S.   +10 more
europepmc   +1 more source

One‐Step Fabrication of Highly Transparent Superhydrophobic Coatings Via Atmospheric Pressure Radio Frequency Plasma Deposition

Advanced Materials Interfaces, EarlyView.
Atmospheric‐pressure RF plasma deposition enables the fabrication of transparent, superhydrophobic coatings with anti‐reflective functionality. Process optimization yields high optical transmittance, robust environmental stability, and self‐cleaning properties.
Sultan S. Ussenkhan, Baglan A. Kyrykbay, Almasbek U. Utegenov, Sagi A. Orazbayev, Assanali T. Sultanov, Maratbek T. Gabdullin, Tlekkabul S. Ramazanov, Yerassyl Yerlanuly   +7 more
wiley   +1 more source

Initiator-Free Recyclable Anthracene-Based Photocurable Resin Enabling Sustainable 3D Printing via Single- and Two-Photon Stereolithography. [PDF]

ACS Omega
Mukai M, Miyadai W, Matsubara S, Aoki T, Maruo S.   +4 more
europepmc   +1 more source

Spin‐On SiOx‐Assisted Inkjet Printing for Interdigitated n+ and p+ Poly‐Si/SiOx Contacts in Silicon Solar Cells With Suppressed Unintended Doping

Advanced Materials Technologies, EarlyView.
This work presents an innovative spin‐on SiOx‐assisted inkjet‐printed approach to form localized n+ and p+ poly‐Si/SiOx passivating contacts for high‐efficiency silicon solar cells within a single‐annealing step. The developed process results in a well‐defined interdigitated doping pattern, with unintended doping and cross‐doping concentrations ...
Jiali Wang, Jinlei Ren, Laura Creon, Paula Peres, Rene Chemnitzer, Pierre‐Yves Corre, Sieu Pheng Phang, Daniel Macdonald, AnYao Liu   +8 more
wiley   +1 more source

Grand Challenges in Nanofabrication: There Remains Plenty of Room at the Bottom

Frontiers in Nanotechnology, 2021
John T. Fourkas, John T. Fourkas, Jinwei Gao, Zheng Han, Haitao Liu, Benedetta Marmiroli, Michael J. Naughton, John S. Petersen, John S. Petersen, Yong Sun, Alex Vagilio Pret, Yuebing Zheng   +11 more
doaj   +1 more source