Results 161 to 170 of about 117,202 (206)
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IBM Journal of Research and Development, 1980
Advances in lithography rely largely on the capability of reducing overlay errors, which in turn depends on the capability to make two-dimensional overlay measurements. This paper describes a simple and accurate method of determining singular overlay errors of step-and-repeat exposure systems with a precision of ±0.01 µm (standard deviation).
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Advances in lithography rely largely on the capability of reducing overlay errors, which in turn depends on the capability to make two-dimensional overlay measurements. This paper describes a simple and accurate method of determining singular overlay errors of step-and-repeat exposure systems with a precision of ±0.01 µm (standard deviation).
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AFM lithography combined with optical lithography
Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387), 2002Reports on a hybrid method of AFM lithography and optical lithography that increases the drawing speed and decreases the drawing length. Advanced devices, such as quantum ones, have both nanometer-scale structures and large area structures, such as contact pads. It takes a long time to fabricate all the patterns using AFM lithography alone.
M. Ishibashi, S. Heike, T. Hashizume
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Lithography-Based Nanoelectrochemistry
Analytical Chemistry, 2011Lithographically fabricated nanostructures appear in an increasingly wide range of scientific fields, and electroanalytical chemistry is no exception. This article introduces lithography methods and provides an overview of the new capabilities and electrochemical phenomena that can emerge in nanostructures.
Rassaei, Liza +2 more
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Nanobiotechnology: Soft Lithography
2009An entirely new scientific and technological area has been born from the combination of nanotechnology and biology: nanobiotechnology. Such a field is primed especially by the strong potential synergy enabled by the integration of technologies, protocols, and investigation methods, since, while biomolecules represent functional nanosystems interesting ...
MELE E, PISIGNANO, Dario
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Nano Letters
As Moore's Law continues to push critical dimension (CD) scaling in integrated circuits, conventional photolithography approaches fundamental resolution limits. While alternative strategies such as self-aligned double patterning and directed self-assembly address these challenges, they introduce process complexity and manufacturing variability. Here we
Yuxiang Yin +4 more
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As Moore's Law continues to push critical dimension (CD) scaling in integrated circuits, conventional photolithography approaches fundamental resolution limits. While alternative strategies such as self-aligned double patterning and directed self-assembly address these challenges, they introduce process complexity and manufacturing variability. Here we
Yuxiang Yin +4 more
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Extended Abstracts of the 1998 International Conference on Solid State Devices and Materials, 1998
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Scanning Probe Lithography Using Self-Assembled Monolayers
Chemical Reviews, 2003Christopher B Gorman, Stephan Krämer
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