Results 191 to 200 of about 223,528 (342)

External Reflection From Two‐Photon Laser‐Printed Micromirrors Enables Photomechanical Actuation at a 90° Incident Angle

open access: yesAdvanced Functional Materials, EarlyView.
Light reflectance increases along incidence angle and transmittance significantly drops around 90‐degree incidence angle. Here, we report two‐photon laser printed micro mirrors that redirect the skimming light beam into normal light absorption. Using this technique, light‐driven micro walkers and grippers are demonstrated by using grazing incidence ...
Leilei Song, Jianfeng Yang, Hao Zeng
wiley   +1 more source

Intrinsic Nanopore‐Assisted SnP2S6 Memristors With Ti Ion Dynamics for Compact Logic‐In‐Memory Hardware

open access: yesAdvanced Functional Materials, EarlyView.
Tin hexathiophosphate memristors leverage intrinsic nanopores together with a guided filament formation strategy to regulate titanium ion motion and switching behavior. The devices support reliable nonvolatile memory and reconfigurable logic‐in‐memory, demonstrating 14 Boolean logic functions in a single cell.
Thaw Tint Te Tun   +7 more
wiley   +1 more source

Adolph Menzel rechargé

open access: yesPerspective, 2009
Gregor Wedekind
doaj   +1 more source

High flowability monomer resists for thermal nanoimprint lithography

open access: green, 2009
K. Perez Toralla   +4 more
openalex   +2 more sources

Novel Functional Materials via 3D Printing by Vat Photopolymerization

open access: yesAdvanced Functional Materials, EarlyView.
This Perspective systematically analyzes strategies for incorporating functionalities into 3D‐printed materials via Vat Photopolymerization (VP). It explores the spectrum of achievable functionalities in recently reported novel materials—such as conductive, energy‐storing, biodegradable, stimuli‐responsive, self‐healing, shape‐memory, biomaterials, and
Sergey S. Nechausov   +3 more
wiley   +1 more source

Beyond binary patterning: polypropylene carbonate as a versatile thermal resist for high-fidelity grayscale Nanofabrication. [PDF]

open access: yesMicrosyst Nanoeng
Li H   +12 more
europepmc   +1 more source

Next generation lithography——imprint lithography

open access: yesChinese Journal of Mechanical Engineering, 2007
openaire   +1 more source

157nm Lithography. Window of Opportunity.

open access: diamond, 2002
Harry Sewell   +5 more
openalex   +2 more sources

Home - About - Disclaimer - Privacy